SUBSTRATE PROCESSING APPARATUS AND FURNACE OPENING COVER
Provided is a technique capable of suppressing the occurrence of by-products by suppressing adhesion of the by-products. A substrate processing apparatus includes: a reaction tube where a substrate is processed; a furnace opening unit disposed at a lower end of the reaction tube and having an upper surface and an inner circumferential surface, the furnace opening unit including: a concave portion disposed on the upper surface; and a convex portion having at least one notch connecting the concave portion to the inner circumferential surface; a cover covering at least the inner circumferential surface with a predetermined gap therebetween; and a gas supply unit configured to supply a gas to the concave portion.
1 . A substrate processing apparatus comprising:
a reaction tube where a substrate is processed;
a furnace opening unit disposed at a lower end of the reaction tube and having an upper surface and an inner circumferential surface, the furnace opening unit comprising: a concave portion disposed on the upper surface; and a convex portion having at least one notch connecting the concave portion to the inner circumferential surface;
a cover covering at least the inner circumferential surface with a predetermined gap therebetween; and
a gas supply unit configured to supply a gas to the concave portion.
2 . The substrate processing apparatus of claim 1 , further comprising a cap dosing a lower end of the furnace opening unit with a gap between the cap and the cover.
3 . The substrate processing apparatus of claim 1 , wherein the cover comprises: a side surface portion disposed along the inner circumferential surface; and a horizontal portion perpendicular to the side surface portion.
4 . The substrate processing apparatus of claim 3 , wherein the horizontal portion is disposed between the convex portion and the reaction tube and extends toward the furnace opening unit.
5 . The substrate processing apparatus of claim 3 , wherein the furnace opening unit further comprises a projection for mounting the cover, and the cover further comprises an opening where the projection is hooked, the opening disposed at the side surface portion.
6 . The substrate processing apparatus of claim 5 , wherein the horizontal portion extends toward a center of the furnace opening unit.
7 . The substrate processing apparatus of claim 3 , wherein the cover further comprises a trench spatially connected to the concave portion at the horizontal portion.
8 . The substrate processing apparatus of claim 5 , wherein the cover further comprises a protrusion disposed on the side surface portion and protruding toward the inner circumferential surface.
9 . The substrate processing apparatus of claim 1 , wherein the cover comprises a plurality of cover members disposed along a circumferential direction.
10 . The substrate processing apparatus of claim 5 , wherein the cover further comprises a plurality of projections having unequal distances therebetween.
11 . The substrate processing apparatus of claim 1 , wherein the gas supply unit comprises; a first gas supply unit connected to a first location of the furnace opening unit; and a second gas supply unit connected to a second location of the furnace opening unit opposed to the first location.
12 . The substrate processing apparatus of claim 1 , further comprising a cleaning gas supply unit configured to supply a cleaning gas to the furnace opening unit.
13 . A furnace opening cover covering an inner circumferential surface of a furnace opening unit disposed at a lower end of a reaction tube of a substrate processing apparatus, the furnace opening cover comprising:
an opening hooked to a projection disposed on the inner circumferential surface; and
a protrusion protruding toward the inner circumferential surface.