IP Library Granted Patent US 10,272,426
Granted Patent B2
US 10,272,426 · App. 15/133,202 · Granted Apr 30, 2019

Method of producing microfluidic device, microfluidic device, and photosensitive resin composition

Inventors: Isao Nishimura (Tokyo, JP); Kenji Hoshiko (Tokyo, JP); Masahiro Kaneko (Tokyo, JP)
Assignee: JSR CORPORATION
B01L3/502707B32B37/14B32B38/0008B81C1/00119G03F7/031B01L2200/12B01L2300/041B01L2300/0848B01L2300/0887B01L2300/12B81B2201/058B81C2203/032
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Quick Facts
Patent No.
US 10,272,426
App. No.
15/133,202
Granted
Apr 30, 2019
Kind
B2
Abstract

The present disclosure relates to a method of producing a microfluidic device, a microfluidic device, and a photosensitive resin composition, the method including the steps of: forming a resin layer on a support from a photosensitive resin composition that includes a compound having at least two radical-polymerizable groups, a photoradical generator, a compound having at least two cationically reactive groups, a photocation generator, and at least one compound selected from a protective group-containing amine, a photodegradable base, an imide structure-containing compound, an amide structure-containing compound and an urea structure-containing compound; partially UV-exposing and developing the resin layer; preparing a laminate by placing a cover material on the thus developed resin layer; and UV-exposing the thus obtained laminate.

Claims (16)

1. A method of producing a microfluidic device, said method comprising:

a step (1) of forming a resin layer on a support from a photosensitive resin composition that comprises a compound having at least two radical-polymerizable groups, a photoradical generator, a compound having at least two cationically reactive groups, a photocation generator, and a protective group-containing amine, wherein the protective group-containing amine is an N-t-butoxycarbonyl group-containing amine compound;

a step (2) of UV-exposing parts of said resin layer and developing said resin layer;

a step (3) of preparing a laminate by placing a cover material on the thus developed resin layer; and

a step (4) of UV-exposing the thus obtained laminate.

2. The method according to claim 1 , wherein said photosensitive resin composition further comprises an alkali-soluble resin.

3. The method according to claim 1 , wherein a dose of UV-exposure in said step (2) is less than a dose of UV-exposure in said step (4).

4. The method according to claim 1 , wherein a light source of said UV-exposure in said step (2) is the same as a light source of said UV-exposure in said step (4).

5. The method according to claim 1 , wherein the compound having at least two cationically reactive groups is selected from the group consisting of an active methylene-containing compound, an oxazoline compound, a cyclic ether compound, an isocyanate group-containing compound, an aldehyde group-containing phenol compound, a vinyl ether compound and a dipropenyl ether compound.

6. The method according to claim 1 , wherein the developing in step (2) comprises removing an unexposed portion of the resin layer.

7. A microfluidic device comprising a flow channel inside a member, said microfluidic device comprising:

a flow channel wall formed on a support using a photosensitive resin composition that comprises a compound having at least two radical-polymerizable groups, a photoradical generator, a compound having at least two cationically reactive groups, a photocation generator, and a protective group-containing amine, wherein the protective group-containing amine is an N-t-butoxycarbonyl group-containing amine compound; and

a cover material that covers a groove formed by said support and said flow channel wall.

8. The microfluidic device according to claim 7 , wherein the compound having at least two cationically reactive groups is selected from the group consisting of an active methylene-containing compound, an oxazoline compound, a cyclic ether compound, an isocyanate group-containing compound, an aldehyde group-containing phenol compound, a vinyl ether compound and a dipropenyl ether compound.

9. A photosensitive resin composition comprising: a compound having at least two radical-polymerizable groups; a photoradical generator; a compound having at least two cationically reactive groups; a photocation generator; and a protective group-containing amine, wherein the protective group-containing amine is an N-t-butoxycarbonyl group-containing amine compound.

10. The photosensitive resin composition according to claim 9 , wherein the compound having at least two cationically reactive groups is selected from the group consisting of an active methylene-containing compound, an oxazoline compound, a cyclic ether compound, an isocyanate group-containing compound, an aldehyde group-containing phenol compound, a vinyl ether compound and a dipropenyl ether compound.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 26, 2016
From: NISHIMURA, ISAO; HOSHIKO, KENJI; KANEKO, MASAHIRO
To: JSR CORPORATION
Reel/Frame 038389/0006 →
Priority Claims (3)
JP 2015-086664 · Apr 21, 2015 · national
JP 2015-256813 · Dec 28, 2015 · national
JP 2016-045869 · Mar 9, 2016 · national
Continuity (1)
Related Publication 20160310944A1 · Oct 27, 2016