Non-planar semiconductor device having group III-V material active region with multi-dielectric gate stack
View Patent ↗Non-planar semiconductor devices having group III-V material active regions with multi-dielectric gate stacks are described. For example, a semiconductor device includes a hetero-structure disposed above a substrate. The hetero-structure includes a three dimensional group III-V material body with a channel region. A source and drain material region is disposed above the three-dimensional group III-V material body. A trench is disposed in the source and drain material region separating a source region from a drain region, and exposing at least a portion of the channel region. A gate stack is disposed in the trench and on the exposed portion of the channel region. The gate stack includes first and second dielectric layers and a gate electrode.
1. A semiconductor device, comprising:
a bottom barrier layer disposed above a substrate;
a three-dimensional group III-V material body having a channel region, the three-dimensional group III-V material body disposed above the bottom barrier layer;
a trench disposed in the bottom barrier layer below the channel region;
a gate stack comprising:
a first gate dielectric layer disposed on and completely surrounding the channel region;
a second gate dielectric layer disposed on and completely surrounding the first gate dielectric layer, the second gate dielectric layer separate and distinct from the first gate dielectric layer and further disposed along sidewalls of the trench; and
a gate electrode disposed on the second gate dielectric layer and filling the trench; and
source and drain region disposed on either side of the gate stack.
2. The semiconductor device of claim 1 , wherein the second gate dielectric layer has a higher dielectric constant than the first gate dielectric layer.
3. The semiconductor device of claim 2 , wherein the second gate dielectric layer has a dielectric constant greater than approximately 8 and the first gate dielectric layer has a dielectric constant approximately in the range of 4-8.
4. The semiconductor device of claim 2 , wherein the second gate dielectric layer comprises a material selected from the group consisting of tantalum silicon oxide (TaSiO x ), aluminum oxide (AlO x ), hafnium oxide (HfO 2 ), zirconium oxide (ZrO 2 ), and lanthanum oxide (La 2 O 3 ), and the first gate dielectric layer comprises a material selected from the group consisting of aluminum silicate (AlSiO x ), silicon oxynitride (SiON), silicon dioxide (SiO 2 ) and silicon nitride (Si 3 N 4 ).
5. The semiconductor structure of claim 1 , wherein the first gate dielectric layer has a thickness approximately in the range of 0.3-2 nanometers, and the second gate dielectric layer has a thickness approximately in the range of 0.5-3 nanometers.
6. The semiconductor structure of claim 1 , further comprising:
a top barrier layer disposed above and on either side of the channel region, wherein the second gate dielectric layer is further disposed along sidewalls of the top barrier layer.
7. A method of fabricating a semiconductor device, the method comprising:
forming a bottom barrier layer above a substrate;
forming a three-dimensional group III-V material body above the bottom barrier layer, the three-dimensional group III-V material body having a channel region;
forming a trench in the bottom barrier layer below the channel region;
forming a gate stack, the forming comprising:
forming a first gate dielectric layer on and completely surrounding the channel region;
forming a second gate dielectric layer on and completely surrounding the first gate dielectric layer, the second gate dielectric layer separate and distinct from the first gate dielectric layer and further formed along sidewalls of the trench; and
forming a gate electrode on the second gate dielectric layer and filling the trench; and
forming source and drain region on either side of the gate stack.
8. The method of claim 7 , wherein the second gate dielectric layer has a higher dielectric constant than the first gate dielectric layer.
9. The method of claim 8 , wherein the second gate dielectric layer has a dielectric constant greater than approximately 8 and the first gate dielectric layer has a dielectric constant approximately in the range of 4-8.
10. The method of claim 8 , wherein the second gate dielectric layer comprises a material selected from the group consisting of tantalum silicon oxide (TaSiO x ), aluminum oxide (AlO x ), hafnium oxide (HfO 2 ), zirconium oxide (ZrO 2 ), and lanthanum oxide (La 2 O 3 ), and the first gate dielectric layer comprises a material selected from the group consisting of aluminum silicate (AlSiO x ), silicon oxynitride (SiON), silicon dioxide (SiO 2 ) and silicon nitride (Si 3 N 4 ).
11. The method of claim 7 , wherein the first gate dielectric layer is formed to a thickness approximately in the range of 0.3-2 nanometers, and the second gate dielectric layer is formed to a thickness approximately in the range of 0.5-3 nanometers.
12. The method of claim 7 , further comprising:
forming a top barrier layer above and on either side of the channel region, wherein the second gate dielectric layer is further formed along sidewalls of the top barrier layer.
13. A semiconductor device, comprising:
a plurality of three-dimensional group III-V material bodies disposed above a substrate;
a gate stack disposed on and completely surrounding channel regions of each of the three-dimensional group III-V material bodies, the gate stack comprising:
a first gate dielectric layer disposed on each of the channel regions;
a second gate dielectric layer disposed on the first gate dielectric layer, the second gate dielectric layer separate and distinct from the first gate dielectric layer, wherein the first gate dielectric layer has a thickness approximately in the range of 0.3-2 nanometers, and the second gate dielectric layer has a thickness approximately in the range of 0.5-3 nanometers; and
a gate electrode disposed on the second gate dielectric layer; and
source and drain regions disposed adjacent to the channel regions of each of the plurality of three-dimensional group III-V material bodies, on either side of the gate stack.
14. The semiconductor structure of claim 13 , wherein portions of the source and drain regions are formed within the plurality of three-dimensional group III-V material bodies.
15. The semiconductor structure of claim 13 , further comprising:
a bottom barrier layer disposed between the substrate and the plurality of three-dimensional group III-V material bodies.
16. The semiconductor structure of claim 15 , wherein a bottom portion of the gate stack is disposed on the bottom barrier layer.
17. The semiconductor device of claim 13 , wherein the second gate dielectric layer has a higher dielectric constant than the first gate dielectric layer.
18. The semiconductor device of claim 17 , wherein the second gate dielectric layer has a dielectric constant greater than approximately 8, and the first gate dielectric layer has a dielectric constant approximately in the range of 4-8.
19. The semiconductor device of claim 17 , wherein the second gate dielectric layer comprises a material selected from the group consisting of tantalum silicon oxide (TaSiO x ), aluminum oxide (AlO x ), hafnium oxide (HfO 2 ), zirconium oxide (ZrO 2 ), and lanthanum oxide (La 2 O 3 ), and the first gate dielectric layer comprises a material selected from the group consisting of aluminum silicate (AlSiO x ), silicon oxynitride (SiON), silicon dioxide (SiO 2 ) and silicon nitride (Si 3 N 4 ).
20. A semiconductor device, comprising:
a plurality of three-dimensional group III-V material bodies disposed above a substrate;
a bottom barrier layer disposed between the substrate and the plurality of three-dimensional group III-V material bodies;
a gate stack disposed on and completely surrounding channel regions of each of the three-dimensional group III-V material bodies, the gate stack comprising:
a first gate dielectric layer disposed on each of the channel regions;
a second gate dielectric layer disposed on the first gate dielectric layer, the second gate dielectric layer separate and distinct from the first gate dielectric layer; and
a gate electrode disposed on the second gate dielectric layer; and
source and drain regions disposed adjacent to the channel regions of each of the plurality of three-dimensional group III-V material bodies, on either side of the gate stack.
21. The semiconductor structure of claim 20 , wherein a bottom portion of the gate stack is disposed on the bottom barrier layer.
22. The semiconductor device of claim 20 , wherein the second gate dielectric layer has a higher dielectric constant than the first gate dielectric layer.
23. The semiconductor device of claim 22 , wherein the second gate dielectric layer has a dielectric constant greater than approximately 8, and the first gate dielectric layer has a dielectric constant approximately in the range of 4-8.
24. The semiconductor device of claim 22 , wherein the second gate dielectric layer comprises a material selected from the group consisting of tantalum silicon oxide (TaSiO x ), aluminum oxide (AlO x ), hafnium oxide (HfO 2 ), zirconium oxide (ZrO 2 ), and lanthanum oxide (La 2 O 3 ), and the first gate dielectric layer comprises a material selected from the group consisting of aluminum silicate (AlSiO x ), silicon oxynitride (SiON), silicon dioxide (SiO 2 ) and silicon nitride (Si 3 N 4 ).
25. The semiconductor structure of claim 20 , wherein portions of the source and drain regions are formed within the plurality of three-dimensional group III-V material bodies.