Process kit including flow isolator ring
A process chamber is provided including a sidewall, a substrate support having an outer ledge, and a gas inlet beneath the substrate support. The process chamber further includes a first liner disposed around a bottom surface of the outer ledge of the substrate support. The first liner has an inner surface separated from the outer ledge of the substrate support by a first gap. The process chamber further includes a flow isolator ring having an inner bottom surface disposed on the outer ledge of the substrate support and an outer bottom surface extending outwardly relative to the inner bottom surface, the outer bottom surface overlying the first gap.
1. A process chamber comprising:
a sidewall;
a substrate support having an outer ledge;
a gas inlet beneath the substrate support;
a first liner having an annular inner surface separated from the outer ledge of the substrate support by a first gap, the first liner further having an outer angled surface; and
a flow isolator ring having an inner bottom surface configured to be disposed on the outer ledge of the substrate support when the substrate support is in a raised position and an outer bottom surface extending outwardly relative to the inner bottom surface, the outer bottom surface overlying the first gap, wherein the flow isolator ring further comprises:
a top surface located inwardly relative to an outer edge of the outer bottom surface; and
an outer angled surface between the top surface and the outer bottom surface, the outer angled surface oriented inwardly towards the top surface, wherein
the outer bottom surface of the flow isolator ring is configured to be disposed on the first liner when the substrate support is in a lowered position, and
the outer angled surface of the flow isolator ring and the outer angled surface of the first liner are configured to be collinear when the substrate support is in the lowered position.
2. The process chamber of claim 1 , wherein a top surface of the first liner is above a bottom surface of the outer ledge.
3. The process chamber of claim 2 , wherein the outer bottom surface of the flow isolator ring overlies at least half of the top surface of the first liner.
4. The process chamber of claim 2 , wherein the outer bottom surface of the flow isolator ring overlies all of the top surface of the first liner.
5. The process chamber of claim 1 , wherein the outer angled surface of the flow isolator ring is oriented at an angle from about 40 degrees to about 50 degrees relative to a horizontal plane.
6. The process chamber of claim 1 , further comprising a second liner disposed outwardly relative to the flow isolator ring, the second liner having an inner angled surface spaced apart from the outer angled surface of the flow isolator ring, wherein the inner angled surface of the second liner and the outer angled surface of the flow isolator ring are substantially parallel to each other.
7. The process chamber of claim 1 , wherein the outer bottom surface of the flow isolator ring is spaced apart from the top surface of the first liner by a distance from about 200 mils to about 400 mils.
8. The process chamber of claim 7 , wherein the flow isolator ring includes a protrusion extending down from the outer bottom surface.
9. The process chamber of claim 1 , wherein the first gap is from about 50 mils to about 100 mils.
10. The process chamber of claim 1 , wherein the outer ledge of the substrate support is lower than a substrate supporting surface of the substrate support.
11. The process chamber of claim 10 , wherein a top surface of the flow isolator ring is substantially flush with the substrate supporting surface.
12. The process chamber of claim 1 , further comprising a gas distribution plate disposed above the substrate support.
13. A process kit for processing a substrate comprising:
a first liner having an annular body, a top surface, and an outer angled surface;
a flow isolator ring comprising:
an outer bottom surface disposed on the top surface of the first liner;
an inner bottom surface extending inwardly relative to the first liner; and
an outer angled surface oriented at angle between 40 and 50 degrees relative to a horizontal plane; and
a second liner surrounding at least the top surface of the first liner, the second liner having an inner angled surface disposed above the flow isolator ring, wherein
the inner angled surface of the second liner and the outer angled surface of the flow isolator ring are substantially parallel to each other, and
the outer angled surface of the flow isolator ring and the outer angled surface of the first liner are collinear.
14. The process kit of claim 13 , further comprising a third liner surrounding the first liner, wherein the second liner is disposed on a top of the third liner.
15. The process kit of claim 13 , wherein the flow isolator ring includes a protrusion extending down from the outer bottom surface.
16. The process chamber of claim 8 , wherein
the substrate support includes a recess, and
the protrusion extending down from the outer bottom surface of the flow isolator ring is configured to fit into the recess.
17. The process chamber of claim 16 , wherein
the first liner further includes an inner angled surface,
the substrate support further includes an outer angled surface,
the inner angled surface of the first liner is substantially parallel to the outer angled surface of the substrate support, and
the inner angled surface of the first liner and the outer angled surface of the substrate support are configured to be disposed at same vertical location when the substrate support is in the raised position.
18. The process chamber of claim 17 , further comprising a second liner disposed outwardly relative to the flow isolator ring, the second liner having an inner angled surface spaced apart from the outer angled surface of the flow isolator ring, wherein the inner angled surface of the second liner and the outer angled surface of the flow isolator ring are substantially parallel to each other.