Integrated circuits with selectively strained device regions and methods for fabricating same
Integrated circuits and methods for fabricating integrated circuits are provided. An exemplary method for fabricating an integrated circuit includes providing a substrate including a semiconductor layer over an insulator layer. The method includes selectively replacing portions of the semiconductor layer with insulator material to define an isolated semiconductor layer region. Further, the method includes selectively forming a relaxed layer on the isolated semiconductor layer region. Also, the method includes selectively forming a strained layer on the relaxed layer. The method forms a device over the strained layer.
1. A method of fabricating an integrated circuit, the method comprising:
providing a substrate including a semiconductor layer over an insulator layer, wherein the semiconductor layer has an upper surface;
thinning a selected portion of the semiconductor layer to form a thinned region of the semiconductor layer, wherein thinning the selected portion of the semiconductor layer comprises converting an upper portion of the semiconductor layer into a sacrificial layer;
selectively replacing portions of the semiconductor layer with insulator material to isolate the thinned region of the semiconductor layer, wherein selectively replacing the portions of the semiconductor layer with the insulator material comprises:
selectively forming a hard mask over a second device region, wherein the portions of the semiconductor layer are not covered by the sacrificial layer or the hard mask;
etching the portions of the semiconductor layer to form trenches exposing surface portions of the insulator layer;
depositing the insulator material over the sacrificial layer, the hard mask, and the surface portions of the insulator layer; and
performing a planarization process to remove the insulator material, the hard mask, and portions of the sacrificial layer located higher than the upper surface of the semiconductor layer;
after selectively replacing the portions of the semiconductor layer with the insulator material, selectively etching the sacrificial layer;
after selectively etching the sacrificial layer, selectively forming a relaxed layer on the thinned region of the semiconductor layer;
selectively forming a strained layer on the relaxed layer; and
forming a device over the strained layer.
2. The method of claim 1 wherein forming the device over the strained layer comprises:
forming a switch field effect transistor device or a high-electron mobility transistor (HEMT) device over the strained layer.
3. The method of claim 1 wherein the insulator material forms a first isolation region and a second isolation region, and wherein the method further comprises:
removing the sacrificial layer to uncover the thinned region of the semiconductor layer.
4. The method of claim 3 wherein the relaxed layer extends from the first isolation region to the second isolation region.
5. The method of claim 1 wherein thinning the selected portion of the semiconductor layer comprises:
selectively oxidizing the upper portion of the semiconductor layer to provide the sacrificial layer and the thinned region of the semiconductor layer.
6. The method of claim 1 wherein a buried portion of the sacrificial layer is located lower than the upper surface of the semiconductor layer, and wherein the method further comprises:
etching the buried portion of the sacrificial layer before selectively forming the relaxed layer on the thinned region of the isolated semiconductor layer.
7. The method of claim 1 wherein thinning the selected portion of the semiconductor layer comprises:
selectively oxidizing the upper portion of the semiconductor layer to form an oxide mask overlying the thinned portion region of the semiconductor layer, and
wherein selectively replacing the portions of the semiconductor layer with the insulator material further comprises:
etching the semiconductor layer to form trenches adjacent the oxide mask and extending to the insulator layer; and
depositing the insulator material in the trenches.
8. A method of fabricating an integrated circuit, the method comprising:
providing a substrate including a semiconductor layer over an insulator layer;
thinning a selected portion of the semiconductor layer to form a thinned region of the semiconductor layer, wherein thinning the selected portion of the semiconductor layer comprises converting an upper portion of the semiconductor layer into a sacrificial layer;
selectively forming a hard mask over a second device region, wherein uncovered portions of the semiconductor layer are not covered by the sacrificial layer or the hard mask;
etching the uncovered portions to form trenches exposing surface portions of the insulator layer;
depositing insulator material over the sacrificial layer, the hard mask, and the surface portions of the insulator layer; and
performing a planarization process to remove the insulator material, the hard mask, and portions of the sacrificial layer located higher than an upper surface of the semiconductor layer to form isolate the thinned region of the semiconductor layer with the insulator material.
9. The method of claim 8 further comprising:
selectively forming a relaxed layer on the thinned region of the semiconductor layer;
selectively forming a strained layer on the relaxed layer; and
forming a device over the strained layer.