Tumbling device for the separation of granular polysilicon and polysilicon powder

1. A tumbling device for separating granular polysilicon and polysilicon powder, the tumbling device comprising:

a tumbler drum comprising:

a first end wall,

a second end wall,

a side wall that extends between the end walls and together with the end walls defines a chamber, and

a port extending through the side wall, the port being configured to provide access to the chamber for introducing a polysilicon material into the chamber and for removing the polysilicon material from the chamber,

the side wall, the first end wall, the second end wall, or a combination thereof defining a gas inlet and a gas outlet, with the gas inlet and the gas outlet being at spaced apart locations;

a source of sweep gas in fluid communication with the gas inlet;

a water vapor source that is in fluid communication with the source of sweep gas; and

a source of motive power operable to rotate the tumbler drum about an axis of rotation that extends longitudinally through the chamber.

2. The tumbling device of claim 1 , wherein the water vapor source is positioned between the source of sweep gas and the gas inlet, the water vapor source being in fluid communication with the source of sweep gas and the gas inlet.

3. The tumbling device of claim 1 , further comprising a dust collection assembly in fluid communication with the outlet.

4. A tumbling device for separating granular polysilicon and polysilicon powder, the tumbling device comprising:

a tumbler drum comprising:

a first end wall,

a second end wall,

a side wall that extends between the end walls and together with the end walls defines a chamber, and

the side wall, the first end wall, the second end wall, or a combination thereof defining a gas inlet and a gas outlet, with the gas inlet and the gas outlet being at spaced apart locations, wherein the gas inlet extends through the first end wall and the gas outlet extends through the second end wall;

a source of sweep gas in fluid communication with the inlet;

a water vapor source that is in fluid communication with the source of sweep gas;

a source of motive power operable to rotate the tumbler drum about an axis of rotation that extends longitudinally through the chamber; and

a dust collection assembly in fluid communication with the outlet,

an exhaust duct positioned between the dust collection assembly and the outlet, the exhaust duct being in fluid communication with the dust collection assembly and the outlet; and

one or more helical vanes located within the exhaust duct.

5. The tumbling device of claim 1 , wherein:

the water vapor source has a water inlet; and

a water source is fluidly connected to the water inlet of the water vapor source.

6. The tumbling device of claim 1 , wherein the side wall has a generally cylindrical interior surface, and the tumbler drum further comprises one or more lifting vanes attached to the side wall, spaced apart from one another and extending longitudinally along the interior surface of the side wall.

7. A method for separating polysilicon powder from a mixture of granular polysilicon and polysilicon powder, comprising:

introducing a polysilicon material that is a mixture of granular polysilicon and polysilicon powder into the chamber of a tumbling device according to claim 1 via the port extending through the side wall;

closing the port;

rotating the tumbler drum about an axis of rotation at for a period of time;

flowing sweep gas through the water vapor source to produce humidified sweep gas;

flowing the humidified sweep gas through the tumbling device from a gas inlet to an outlet while the tumbling device is rotating, thereby entraining separated polysilicon powder in the humidified sweep gas; and

separating at least a portion of the humidified sweep gas and the entrained polysilicon powder through the outlet from the granular polysilicon.

8. The method of claim 7 , wherein the humidified sweep gas has a relative humidity of at least 2%.

9. The method of claim 7 , wherein the humidified sweep gas is produced by contacting the sweep gas with water vapor prior to introducing the sweep gas into the chamber.

10. The tumbling device of claim 1 , wherein the source of sweep gas is a source of nitrogen, argon, or helium.