Semiconductor device and manufacturing method thereof

1. A semiconductor device comprising:

channel layers arranged in a first direction and a second direction intersecting the first direction;

stacked insulating layers surrounding sidewalls of the channel layers;

stacked gate electrodes interposed between the insulating layers, the gate electrodes respectively surrounding the channel layers; and

stacked gate lines interposed between the insulating layers, wherein each of the gate lines is electrically coupled to corresponding gate electrodes so that an interface exists between each of the gate lines and the corresponding gate electrodes.

2. The semiconductor device of claim 1 , wherein each of the gate electrodes has a cylindrical shape.

3. The semiconductor device of claim 1 , wherein each of the gate lines electrically connects gate electrodes positioned in the same level to each other.

4. The semiconductor device of claim 1 , wherein a distance between neighboring channel layers in the first direction is wider than a distance between neighboring channel layers in the second direction.

5. A semiconductor device comprising:

channel layers arranged in a first direction and a second direction intersecting the first direction:

stacked insulating layers surrounding sidewalls of the channel layers:

stacked gate electrodes interposed between the insulating layers, the gate electrodes respectively surrounding the channel layers; and

stacked gate lines interposed between the insulating layers, the gate lines electrically connecting the gate electrodes to each other,

wherein neighboring gate electrodes in the first direction are spaced apart from each other, and neighboring gate electrodes in the second direction are contacted with each other.

6. The semiconductor device of claim 5 , wherein each of the gate lines fills between the gate electrodes spaced apart from each other in the first direction, and extends in the first direction.

7. The semiconductor device of claim 1 , wherein the neighboring gate electrodes in the first direction and the second direction are contacted with each other.

8. The semiconductor device of claim 1 , wherein the gate electrodes and the gate lines include a metal.

9. A semiconductor device comprising:

semiconductor pillars arranged in a first direction and a second direction intersecting the first direction;

stacked insulating layers surrounding sidewalls of the semiconductor pillars; and

metal layers alternately stacked with the insulating layers,

wherein each of the metal layers includes cylindrical metal patterns respectively surrounding the sidewalls of the semiconductor pillars and a metal line surrounding sidewalls of the metal patterns so that each of the metal layers includes an interface between the metal line and the cylindrical metal patterns.

10. The semiconductor device of claim 9 , wherein the metal line electrically connects metal patterns positioned in the same level to each other.

11. The semiconductor device of claim 9 , wherein a distance between neighboring semiconductor pillars in the first direction is wider than a distance between neighboring semiconductor pillars in the second direction.

12. The semiconductor device of claim 9 , wherein neighboring metal patterns in the first direction are spaced apart from each other, and neighboring metal patterns in the second direction are contacted with each other.

13. The semiconductor device of claim 12 , wherein the metal line fills between the metal patterns spaced apart from each other in the first direction, and extends in the first direction.

14. The semiconductor device of claim 9 , wherein the neighboring metal patterns in the first direction and the second direction are contacted with each other.

15. The semiconductor device of claim 9 , wherein the metal patterns and the metal line include tungsten.

16. The semiconductor device of claim 9 , wherein the semiconductor pillars are arranged in a zigzag form.

17. The semiconductor device of claim 9 , wherein the first direction and the second direction intersect each other at an angle smaller than 90 degrees.

18. The semiconductor device of claim 9 , further comprising:

memory patterns interposed between the semiconductor pillars and the metal patterns; and

barrier patterns interposed between the memory patterns and the metal patterns.

19. The semiconductor device of claim 18 , wherein the memory patterns are charge blocking patterns.

20. The semiconductor device of claim 18 , further comprising: memory layers surrounding the sidewalls of the semiconductor pillars, the memory layers interposed between the semiconductor pillars and the memory patterns and between the semiconductor pillars and the insulating layers.