Low cost substrates
A mask is formed over a first conductive portion of a conductive layer to expose a second conductive portion of the conductive layer. An electrolytic process is performed to remove conductive material from a first region and a second region of the second conductive portion. The second region is aligned with the mask relative to an electric field applied by the electrolytic process. The second region separates the first region of the second conductive portion from the first conductive portion. The electrolytic process is concentrated relative to the second region such that removal occurs at a relatively higher rate in the second region than in the first region.
1. An interposer, comprising:
an interconnect structure having a first surface and a second surface opposite the first surface, including:
at least two electrically conductive vias extending from the first surface to the second surface;
an embedded region extending between adjacent ones of the at least two electrically conductive vias, the embedded region being a thermal conductor, the embedded region and the at least two electrically conductive vias comprising a common metal and formed from a common metallic layer, the common metal of the embedded region being a continuous metal layer that completely surrounds each of the adjacent ones of the at least two electrically conductive vias;
an electrically insulative layer separating thermally conductive material of the embedded region from the at least two electrically conductive vias.
2. The interposer of claim 1 , wherein the electrically insulative layer insulates the common metal of the electrically conductive vias from the common metal of the embedded region.
3. The interposer of claim 2 , wherein the common metal is copper, nickel, aluminum, molybdenum, titanium tungsten, silver, tin, gold, or any alloy thereof.
4. The interposer of claim 1 , where the electrically insulative layer extends continuously between adjacent ones of the at least two electrically conductive vias and along a side of the embedded region.
5. A system comprising the interposer of claim 1 , wherein the at least two conductive vias are configured to provide an conductive path from a first microelectronic element associated with the first surface to a second microelectronic element associated with the second surface and wherein the embedded region is configured to provide a thermal path for heat to be removed from the system.
6. The interposer of claim 1 , wherein the common metal of the embedded region extends from the first surface to a second height lower than a height of the at least two electrically conductive vias.
7. The interposer of claim 6 , wherein the common metal of the embedded region reaches a common height in each of a plurality of areas surrounding the individual electrically conductive vias of the adjacent ones of the electrically conductive vias.
8. The interposer of claim 6 , wherein the electrically insulative layer comprises an electrically insulative coating contacting sidewalls of the electrically conductive vias and the common metal of the embedded region.
9. The interposer of claim 8 , further comprising a heat conducting matrix contacting and extending between surfaces of the electrically insulative coating on the electrically conductive vias and on the common metal of the embedded region.
10. The interposer of claim 9 , wherein the heat conducting matrix comprises at least one of heat conductive particles, particulates or flakes of heat conducting or heat dispersing material in a mold matrix.
11. The interposer of claim 10 , wherein the at least one of heat conductive particles, particulates or flakes of heat conducting or heat dispersing material comprise metallic particles or flakes.
12. The interposer of claim 1 , wherein the first and second surfaces are major surfaces defined by surfaces of the electrically insulative layer.
13. The interposer of claim 12 , wherein the electrically insulative layer has portions at the second surface which overlie top surfaces of the common metal of the embedded region.
14. The interposer of claim 13 , further comprising a redistribution layer overlying one or more of the first or second surfaces, the redistribution layer including a wiring layer electrically coupled with the electrically conductive vias.