IP Library Granted Patent US 10,290,672
Granted Patent B2
US 10,290,672 · App. 15/168,828 · Granted May 14, 2019

Image sensor semiconductor packages and related methods

Inventors: Larry Kinsman (Boise, ID); Yusheng Lin (Phoenix, AZ); Yu-Te Hsieh (Taoyuan, TW); Oswald Skeete (San Jose, CA); Weng-Jin Wu (Hsinchu, TW); Chi-Yao Kuo (Taipei, TW)
Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
H01L27/14643H01L21/4853H01L21/565H01L23/49816H01L23/49838H01L27/1469H01L27/14618H01L27/14634H01L27/14636H04N5/374
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Quick Facts
Patent No.
US 10,290,672
App. No.
15/168,828
Granted
May 14, 2019
Kind
B2
Abstract

An image sensor semiconductor package (package) includes a printed circuit board (PCB) having a first surface and a second surface opposite the first surface. A complementary metal-oxide semiconductor (CMOS) image sensor (CIS) die has a first surface with a photosensitive region and a second surface opposite the first surface of the CIS die. The second surface of the CIS die is coupled with the first surface of the PCB. A transparent cover is coupled over the photosensitive region of the CIS die. An image signal processor (ISP) is embedded within the PCB. One or more electrical couplers electrically couple the CIS die with the PCB. A plurality of electrical contacts on the second surface of the PCB are electrically coupled with the CIS die and with the ISP. The ISP is located between the plurality of electrical contacts of the second surface of the PCB and the CIS die.

Claims (22)

1. An image sensor semiconductor package, comprising:

a printed circuit board (PCB) comprising a first surface and a second surface opposite the first surface;

an interposer comprising a first surface and a second surface opposite the first surface of the interposer, the interposer comprising a recess in its second surface and comprising one or more electrical vias passing through the interposer from the first surface of the interposer to the second surface of the interposer;

a complementary metal-oxide semiconductor (CMOS) image sensor (CIS) die comprising a first surface comprising a photosensitive region and a second surface opposite the first surface of the CIS die, the second surface of the CIS die directly coupled with the first surface of the interposer;

an image signal processor (ISP) coupled within the recess of the interposer;

one or more electrical couplers electrically coupling the CIS die with the PCB through the one or more electrical vias of the interposer;

one or more redistribution layers (RDLs) fanning out one or more electrical contacts of the ISP by electrically coupling the one or more electrical contacts of the ISP with one or more of a plurality of electrical contacts comprised at the second surface of the PCB, and;

the plurality of electrical contacts comprised at the second surface of the PCB and electrically coupled with the CIS die and with the ISP;

wherein the recess comprised in the interposer does not extend to the first surface of the interposer; and

wherein the second surface of the interposer is coupled to the first surface of the PCB.

2. The package of claim 1 , wherein the package does not comprise an image signal processor at the second surface of the PCB.

3. A method of forming an image sensor semiconductor package, comprising:

providing an interposer comprising a first surface and a second surface opposite the first surface of the interposer, the second surface of the interposer comprising a recess therein;

forming one or more electrical vias through the interposer from the first surface of the interposer to the second surface of the interposer;

coupling an image signal processor (ISP) within the recess of the interposer and electrically coupling the ISP with the one or more electrical vias;

coupling the interposer with a first surface of a printed circuit board (PCB), the PCB also having a second surface opposite the first surface of the PCB;

coupling a complementary metal-oxide semiconductor (CMOS) image sensor (CIS) die with the interposer, the CIS die comprising a first surface comprising a photosensitive region and a second surface opposite the first surface of the CIS die, the second surface of the CIS die directly coupled with the first surface of the interposer;

electrically coupling the CIS die with one or more electrical contacts located at the second surface of the PCB through the one or more electrical vias of the interposer;

electrically coupling the ISP with the CIS die through the one or more electrical vias of the interposer; and

forming one or more redistribution layers (RDLs) electrically coupling one or more electrical contacts of the ISP with one or more of the plurality of electrical contacts comprised at the second surface of the PCB;

wherein the recess comprised in the interposer does not extend to the first surface of the interposer.

4. The method of claim 3 , further comprising at least partially encapsulating the CIS die in an encapsulant.

Assignments (3)
RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT REEL 041187, FRAME 0295 Recorded Jun 22, 2023
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC; FAIRCHILD SEMICONDUCTOR CORPORATION
Reel/Frame 064151/0203 →
SECURITY INTEREST Recorded Dec 23, 2016
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH
Reel/Frame 041187/0295 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 31, 2016
From: KINSMAN, LARRY; LIN, YUSHENG; SKEETE, OSWALD; HSIEH, YU-TE; WU, WENG-JIN; KUO, CHI-YAO
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Reel/Frame 038751/0692 →
Continuity (1)
Related Publication 20170345864A1 · Nov 30, 2017
Cited By (1)
US 12,412,810