Field curvature correction for multi-beam inspection systems

1. An apparatus, comprising:

an electron source; and

a multi-lens array configured to produce a plurality of beamlets utilizing electrons provided by the electron source, the multi-lens array further configured to shift a focus of at least one particular beamlet of the plurality of beamlets such that the focus of the at least one particular beamlet is different from a focus of at least one other beamlet of the plurality of beamlets, wherein the multi-lens array includes at least two electrostatic plates with openings defined therein to form an array of lenses, wherein the at least two electrostatic plates comprise a first electrostatic plate and a second electrostatic plate, wherein an insulating layer is positioned between the first electrostatic plate and the second electrostatic plate, wherein the first electrostatic plate and the second electrostatic plate each include a plurality of etched openings, wherein the etched openings are individually coated with a conductive material to allow individually addressable potentials to be applied to the etched openings via a contact pad, wherein the insulating layer includes a plurality of openings, wherein the size of the openings of the insulating layer is larger than the size of the etched openings of the first electrostatic plate and the second electrostatic plate, wherein the insulating layer includes charge drains to mitigate cross-talk between the first electrostatic plate and the second electrostatic plate.

2. The apparatus of claim 1 , wherein at least one of the first electrostatic plate or the second electrostatic plate comprise an oxidized silicon plate with the openings etched therein, wherein the openings are individually coated with the conductive material to allow the individually addressable potentials to be applied to the etched openings.

3. The apparatus of claim 1 , wherein the individually addressable potentials are determined at least partially based on the focus shift expected of at least one additional lens.

4. The apparatus of claim 1 , wherein the apparatus is adapted to serve as a multi-beam electron beam column in an inspection system.

5. An apparatus, comprising:

an electron source;

a multi-lens array configured to produce a plurality of beamlets utilizing electrons provided by the electron source, the multi-lens array further configured to shift a focus of at least one particular beamlet of the plurality of beamlets such that the focus of the at least one particular beamlet is different from a focus of at least one other beamlet of the plurality of beamlets; and

at least one additional lens configured to receive the plurality of beamlets and deliver the plurality of beamlets toward a target, wherein the multi-lens array includes at least two electrostatic plates with openings defined therein to form an array of lenses, wherein the at least two electrostatic plates comprise a first electrostatic plate and a second electrostatic plate, wherein an insulating layer is positioned between the first electrostatic plate and the second electrostatic plate, wherein the first electrostatic plate and the second electrostatic plate each include a plurality of etched openings, wherein the etched openings are individually coated with a conductive material to allow individually addressable potentials to be applied to the etched openings via a contact pad, wherein the insulating layer includes a plurality of openings, wherein the size of the openings of the insulating layer is larger than the size of the etched openings of the first electrostatic plate and the second electrostatic plate, wherein the insulating layer includes charge drains to mitigate cross-talk between the first electrostatic plate and the second electrostatic plate.

6. The apparatus of claim 5 , wherein the individually addressable potentials are determined at least partially based on the focus shift expected of the at least one additional lens.

7. An inspection system, comprising:

an electron source;

a multi-lens array configured to produce a plurality of beamlets utilizing electrons provided by the electron source, the multi-lens array further configured to shift a focus of at least one particular beamlet of the plurality of beam lets such that the focus of the at least one particular beamlet is different from a focus of at least one other beam let of the plurality of beam lets;

at least one additional lens configured to receive the plurality of beamlets and deliver the plurality of beamlets toward a subject of inspection; and

a detector configured to produce one or more images of the subject of inspection by scanning the subject of inspection with the plurality of beamlets, wherein the multi-lens array includes at least two electrostatic plates with openings defined therein to form an array of micro-einzel lenses, wherein the at least two electrostatic plates comprise a first electrostatic plate and a second electrostatic plate, wherein an insulating layer is positioned between the first electrostatic plate and the second electrostatic plate, wherein the first electrostatic plate and the second electrostatic plate each include a plurality of etched openings, wherein the etched openings are individually coated with a conductive material to allow individually addressable potentials to be applied to the etched openings via a contact pad, wherein the insulating layer includes a plurality of openings, wherein the size of the openings of the insulating layer is larger than the size of the etched openings of the first electrostatic plate and the second electrostatic plate, wherein the insulating layer includes charge drains to mitigate cross-talk between the first electrostatic plate and the second electrostatic plate.

8. The inspection system of claim 7 , wherein the individually addressable potentials are determined at least partially based on the focus shift expected of the at least one additional lens.