Method for fabricating non-volatile memory with ONO stack
A method for fabricating semiconductor device is disclosed. A substrate having a first gate layer and a first dielectric layer thereon is provided. A shallow trench isolation (STI) is formed in the substrate and surrounds the first gate layer and the first dielectric layer. The first dielectric layer is removed. A first spacer is formed on the sidewall of the STI above the first gate layer. Using the first spacer as mask, part of the first gate layer and part of the substrate are removed for forming a first opening while defining a first gate structure and a second gate structure.
1. A method for fabricating semiconductor device, comprising:
providing a substrate having a first gate layer, a first dielectric layer thereon, a second gate layer between the first gate layer and the first dielectric layer, and a shallow trench isolation (STI) in the substrate and surrounding the first gate layer and the first dielectric layer;
removing the first dielectric layer;
forming a first spacer on the sidewall of the STI above the first gate layer; and
using the first spacer as mask to remove part of the first gate layer and part of the substrate for forming a first opening while defining a first gate structure and a second gate structure.
2. The method of claim 1 , wherein the first gate layer comprises undoped polysilicon.
3. The method of claim 1 , wherein the second gate layer comprises doped polysilicon.
4. The method of claim 1 , further comprising:
forming the first spacer on the sidewall of the STI above the second gate layer;
using the first spacer as mask to remove part of the second gate layer, part of the first gate layer, and part of the substrate for forming the first opening and defining the first gate structure and the second gate structure on the substrate and a third gate structure and a fourth gate structure on the first gate structure and the second gate structure respectively;
forming a second spacer in the first opening;
forming a third spacer on the second spacer;
removing part of the STI;
removing the first spacer and the third spacer; and
forming an oxide-nitride-oxide (ONO) stack on the STI, the second spacer, the first gate structure, and the second gate structure.
5. The method of claim 4 , wherein the second spacer comprises silicon oxide.
6. The method of claim 4 , wherein the third spacer comprises silicon nitride.
7. The method of claim 1 , further comprising:
forming a second dielectric layer to fill the first opening;
removing part of the STI, part of the second dielectric layer, and part of the first spacer so that the STI is even with the surface of the first spacer;
removing part of the STI and part of the second dielectric layer;
removing the remaining first spacer; and
forming an oxide-nitride-oxide (ONO) stack on the STI, the second dielectric layer, the first gate structure, and the second gate structure.
8. The method of claim 7 , further comprising using a chemical mechanical polishing (CMP) process or an etching process for removing part of the STI, part of the second dielectric layer, and part of the first spacer.
9. The method of claim 1 , wherein the first spacer comprises polysilicon.
10. The method of claim 1 , further comprising:
forming a second dielectric layer to fill the first opening;
removing the first spacer to form a second opening and a third opening exposing the first gate structure and the second gate structure; and
forming a polysilicon layer to fill the second opening and the third opening.