Plasmon-excited electron beam array for complementary patterning
A system for generating an electron beam array, comprising a light source, a first substrate having a plurality of plasmonic lenses mounted thereon, the plasmonic lenses configured to received light from the light source and produce an electron emission, and a plurality of electrostatic microlenses configured to focus the electron emissions into a beam for focusing on a wafer substrate. A light source modulator and digital micro mirror may be included which captures light from the light source and projects light beamlets on the plasmonic lenses.
1. A system for generating an electron beam array, comprising:
a light source configured to provide a plurality of light beams;
a first substrate having a plurality of plasmonic lenses mounted thereon, the plasmonic lenses configured to the light beams from the light source and produce a plurality of corresponding electron emissions onto a wafer substrate, wherein the plasmonic lenses are configured to receive uninterrupted light beams from the light source, and wherein an entirety of each plasmonic lens of the plurality of plasmonic lenses comprise a metal layer.
2. The system of claim 1 , further comprising a plurality of electrostatic microlenses configured to focus the electron emissions into corresponding electron beams for focusing on the wafer substrate.
3. The system of claim 1 , further comprising a light source modulator operatively connected to the light source.
4. The system of claim 1 , further comprising a digital micro mirror which captures light from the light source and projects the light beamlets on the plasmonic lenses.
5. The system of claim 1 , further comprising a positioning platform, the positioning platform connected between the first substrate and the wafer substrate, the positioning device configured to move the wafer substrate in relation to the first substrate.
6. The system of claim 5 , wherein the positioning platform is a spinning positioning system.
7. The system of claim 5 , wherein the positioning platform is a linear translation positioning system.
8. The system of claim 2 , wherein the plurality of electrostatic microlenses are positioned between the plasmonic lenses and the wafer substrate.
9. The system of claim 5 , wherein the wafer substrate is coated with a resist material, and wherein the positioning system is configured to create a pattern in the resist due to interaction between the electron emissions and the resist material.
10. The system of claim 5 , wherein the positioning system is configured to maintain a gap of less than 100 nanometers between a bottom surface of the first substrate and a top surface of the wafer substrate.
11. The system of claim 10 , wherein the positioning system is configured to maintain a gap of less than 50 nanometers between a bottom surface of the first substrate and a top surface of the wafer substrate.
12. The system of claim 8 , wherein the positioning system is configured to maintain a gap of between 1 micrometer and 10 micrometers between a bottom surface of the first substrate and a top surface of the wafer substrate.
13. The system of claim 1 , wherein the plasmonic lenses comprise an outer ring reflector surrounding a center nanostructure.
14. The system of claim 1 , wherein the plasmonic lenses comprise mismatch semicircular gratings.
15. The system of claim 1 , wherein the plasmonic lenses are formed in an array on the first substrate.
16. The system of claim 1 , wherein the distance between centers of the plasmonic lenses is between 1 and 20 micrometers.
17. The system of claim 1 , wherein the metal layer comprises silver or gold.
18. The system of claim 1 , wherein the light source modulator comprises digital-micromirror-device (DMD) or planar light valve (PLV).