IP Library › Granted Patent US 10,337,096
Granted Patent B2
US 10,337,096 · App. 15/179,829 · Granted Jul 2, 2019

Method for manufacturing deposition mask and deposition mask

Inventor: Michinobu Mizumura (Yokohama, JP)
Assignee: V TECHNOLOGY CO., LTD.
C23C14/042B23K26/066B23K26/073C23C14/24C23C14/50C23C16/042
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Quick Facts
Patent No.
US 10,337,096
App. No.
15/179,829
Granted
Jul 2, 2019
Kind
B2
Abstract

The present invention provides a method for manufacturing a deposition mask, which irradiates laser light L to a resin film 20 to form an opening pattern 4 having a polygonal shape in a plan view, the method including a step of irradiating the laser light L that is shaped using a beam-shaping mask 10 having a light transmissive window 18 that allows the laser light L to pass therethrough with light transmittance gradually reducing with distance from an edge of the light transmissive window 18 on at least one of opposing sides thereof within an area outside the light transmissive window 18 to thereby form the opening pattern 4 having at least one pair of opposing side walls 4 a that are inclined to open wide toward a surface of the film 20 to be irradiated with the laser light L, from a surface opposite to the irradiated surface.

Claims (6)

1. A method for manufacturing a deposition mask, comprising a step of irradiating, on a resin film, laser light that is shaped using a first beam-shaping mask having a first light transmissive window that allows the laser light to pass therethrough with light transmittance gradually reducing with distance from an edge of the first light transmissive window on at least one of opposing sides of the first light transmissive window within an area outside the first light transmissive window to thereby form an opening pattern having a polygonal shape in a plan view having at least one pair of opposing side walls that are inclined to open wide toward a surface to be irradiated with the laser light,

wherein the opening pattern is formed by performing a step of irradiating first laser light shaped by the first beam-shaping mask to form a recess at a predetermined depth in an area assigned to the opening pattern on the resin film and a step of irradiating, on a resin film inside the recess, second laser light shaped by a second shaping mask having a second light transmissive window of a shape similar to the opening pattern and a light shielding portion formed outside the second light transmissive window to thereby form a through hole penetrating the resin film.

2. The method for manufacturing a deposition mask according to claim 1 , wherein the opening pattern has a plurality of pairs of opposing side walls that incline at different angles at least at the surface to be irradiated with the laser light.

3. The method for manufacturing a deposition mask according to claim 1 , wherein the bottom area of the recess is wider than an opening area of the through hole.

4. The method for manufacturing a deposition mask according to claim 1 , wherein a metal mask is laminated on the surface of the resin film to be irradiated with the laser light, and the metal mask has a through hole capable of accommodating the opening pattern.

5. The method for manufacturing a deposition mask according to claim 4 , wherein a laminate of the resin film and the metal mask is stretched over one end surface of a frame and held thereto prior to formation of the opening pattern.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 15, 2016
From: MIZUMURA, MICHINOBU
To: V TECHNOLOGY CO., LTD.
Reel/Frame 038923/0086 →
Priority Claims (1)
JP 2013-264326 · Dec 20, 2013 · national
Continuity (2)
Continuation PCTJP2014082121 · Dec 4, 2014
Related Publication 20160281209A1 · Sep 29, 2016