Semiconductor processing reactor and components thereof
A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber.
1. A diffuser for distributing at least one process gas, said diffuser comprising:
an inlet portion having a channel formed therethrough for receiving said at least one process gas; and
a distribution portion coupled to said inlet portion, said distribution portion comprising a mounting surface disposed on a mounting surface plane, wherein a first distribution surface, a second distribution surface, a third distribution surface, and deflecting surface of the distribution portion define at least one boundary of a diffuser volume,
wherein said first, second, and third distribution surfaces, and the deflecting surface extend between a first curved side surface, a second curved side surface, and a third curved side surface, wherein a plurality of lateral boundaries of the diffuser volume is defined by the first curved side surface, the second curved side surface, and the third curved side surface, wherein the third curved side surface extends between the first curved side surface and the second curved side surface, and wherein a centerline splits the third curved side surface and the first, second, and third distribution surfaces,
wherein the third distribution surface comprises a slope in a lateral direction from the centerline toward each of the first curved side surface and the second curved side surface, such that the third distribution surface proximate each of the first curved side surface and the second curved side surface is spaced further from the mounting surface plane than the third distribution surface proximate the centerline,
and wherein said first and second side surfaces extend between, on one side, said first, second, and third distribution surfaces and the deflecting surface, and on another side, said mounting surface.
2. The diffuser of claim 1 , wherein said first distribution surface is adjacent to said inlet portion, said second distribution surface is adjacent to said first distribution surface, said third distribution surface is adjacent to said second distribution surface, and said deflecting surface is adjacent to said third distribution surface.
3. The diffuser of claim 1 , wherein said first distribution surface is sloped about 4° downward toward the third curved side surface with respect to said mounting surface plane, said second distribution surface is sloped about 10° downward toward the third curved side surface with respect to said mounting surface plane, and said deflecting surface is sloped about 26° downward toward the third curved side surface with respect to said mounting surface plane.
4. The diffuser of claim 1 , wherein said third distribution surface has a constant slope between said centerline and said first and second side surfaces.
5. The diffuser of claim 1 , wherein the third distribution surface at the centerline is vertically spaced apart from the mounting surface plane between about 1.0 mm and 3.0 mm, and the third distribution surface adjacent to said first and second side surfaces is vertically spaced apart from the mounting surface plane between about 3.0 mm and 5.0 mm.
6. The diffuser of claim 1 , wherein the third distribution surface at said centerline is vertically spaced apart from said mounting surface plane about 2.24 mm, and said third distribution surface adjacent to said first and second side surfaces is vertically spaced apart from said mounting surface plane between about 4.0 mm.
7. The diffuser of claim 1 , wherein the inlet portion comprises a first inlet surface having a substantially conical shape.
8. The diffuser of claim 7 , wherein the inlet portion comprises a second inlet surface having a substantially cylindrical shape.
9. The diffuser of claim 7 , wherein the inlet portion comprises a second inlet surface having a substantially conical shape.
10. The diffuser of claim 1 , wherein the first distribution surface and the second distribution surface have a decreasing height moving toward the third curved side surface relative to the mounting surface plane.
11. The diffuser of claim 1 , wherein said first distribution surface is sloped between about between about 3-7 degrees downward toward the third curved side surface with respect to said mounting surface plane.
12. The diffuser of claim 1 , wherein said second distribution surface is sloped between about between about between about 5-20 degrees downward toward the third curved side surface with respect to said mounting surface plane.