Patent Assignment
Reel/Frame 055146/0536
Assignment of Assignor's Interest
Recorded: 2021-02-04
Pages: 19
Assignor
ASM AMERICA, INC.
Executed: 2020-12-15
Assignee
ASM IP HOLDING B.V.
VERSTERKERSTRAAT 8, ALMERE, 1322 AP, NETHERLANDS
Covered Properties
(35)
Thermocouple
PCT:
PCT/US2008/063919 ↗
Thermocouple
PCT:
PCT/US2008/074063 ↗
Thermocouple
PCT:
PCT/US2009/043454 ↗
Thermocouple
PCT:
PCT/US2009/066377 ↗
Semiconductor Processing Reactor and Components Thereof
PCT:
PCT/US2010/030126 ↗
Thermocouple Assembly with Guarded Thermocouple Junction
PCT:
PCT/US2010/033244 ↗
Smart Temperature Measuring Device
PCT:
PCT/US2010/033248 ↗
Thermocouple
PCT:
PCT/US2010/033252 ↗
Systems and Methods for Thin-Film Deposition of Metal Oxides Using Excited Nitrogen-Oxygen Species
PCT:
PCT/US2010/045368 ↗
Method and System for Using a Buffer to Track Robotic Movement
Patent:
6,594,550 →
Application:
10/113,197 →
Air Ventilation System
Application:
12/017,705 →
Publication:
US 2009/0186571
Thermocouple
Thermocouple
Thermocouple
Application:
12/193,924 →
Publication:
US 2009/0052498
Thermocouple
Atomic Layer Deposition of Hafnium Lanthanum Oxides
Thermocouple Assembly with Guarded Thermocouple Junction
Smart Temperature Measuring Device
Thermocouple
Semiconductor Processing Reactor and Components Thereof
Precursor Delivery System
Systems and Methods for Thin-Film Deposition of Metal Oxides Using Excited Nitrogen-Oxygen Species
Systems and Methods for Thin-Film Deposition of Metal Oxides Using Excited Nitrogen-Oxygen Species
Pressure Transmitter for a Semiconductor Processing Environment
Application:
13/187,300 →
Publication:
US 2013/0023129
Heater Jacket for a Fluid Line
Process Feed Management for Semiconductor Substrate Processing
Patent:
9,017,481 →
Application:
13/284,642 →
Deposition Valve Assembly and Method of Heating the Same
Systems and Methods for Thin-Film Deposition of Metal Oxides Using Excited Nitrogen-Oxygen Species
Thermocouple
Thermocouple Assembly with Guarded Thermocouple Junction
Systems and Methods for Thin-Film Deposition of Metal Oxides Using Excited Nitrogen-Oxygen Species
Process Feed Management for Semiconductor Substrate Processing
Semiconductor Processing Reactor and Components Thereof
Semiconductor Processing Reactor and Components Thereof
Pressure Transmitter for a Semiconductor Processing Environment
Related Assignments
(1)
Other recorded transfers of the patents in this record — the chain of ownership.