Fin field effect transistor (FET) (FinFET) complementary metal oxide semiconductor (CMOS) circuits employing single and double diffusion breaks for increased performance
Fin Field Effect Transistor (FET) (FinFET) complementary metal oxide semiconductor (CMOS) circuits with single and double diffusion breaks for increased performance are disclosed. In one aspect, a FinFET CMOS circuit employing single and double diffusion breaks includes a P-type FinFET that includes a first Fin formed from a semiconductor substrate and corresponding to a P-type diffusion region. The FinFET CMOS circuit includes an N-type FinFET that includes a second Fin formed from the semiconductor substrate and corresponding to an N-type diffusion region. To electrically isolate the P-type FinFET, first and second single diffusion break (SDB) isolation structures are formed in the first Fin on either side of a gate of the P-type FinFET. To electrically isolate the N-type FinFET, first and second double diffusion break (DDB) isolation structures are formed in the second Fin on either side of a gate of the N-type FinFET.
1. A Fin Field Effect Transistor (FinFET) complementary metal oxide semiconductor (CMOS) circuit, comprising:
a semiconductor substrate;
a P-type FinFET comprising a first Fin formed from the semiconductor substrate and corresponding to a P-type semiconductor material (P-type) diffusion region;
an N-type FinFET comprising a second Fin formed from the semiconductor substrate and corresponding to an N-type semiconductor material (N-type) diffusion region;
a first single diffusion break (SDB) isolation structure formed in the first Fin on a first side of a gate of the P-type FinFET;
a second SDB isolation structure formed in the first Fin on a second side of the gate of the P-type FinFET opposite of the first side of the gate of the P-type FinFET;
a first double diffusion break (DDB) isolation structure formed in the second Fin on a first side of a gate of the N-type FinFET; and
a second DDB isolation structure formed in the second Fin on a second side of the gate of the N-type FinFET opposite of the first side of the gate of the N-type FinFET,
wherein the first SDB isolation structure and the second SDB isolation structure each have a width approximately equal to a gate length of the P-type FinFET and wherein the first DDB isolation structure and the second DDB isolation structure each have a width approximately equal to a gate pitch of the FinFET CMOS circuit.
2. The FinFET CMOS circuit of claim 1 , wherein:
the first SDB isolation structure is formed in the first Fin a first defined distance from the first side of the gate of the P-type FinFET;
the second SDB isolation structure is formed in the first Fin the first defined distance from the second side of the gate of the P-type FinFET;
the first DDB isolation structure is formed in the second Fin a second defined distance from the first side of the gate of the N-type FinFET, wherein the second defined distance is different than the first defined distance; and
the second DDB isolation structure is formed in the second Fin the second defined distance from the second side of the gate of the N-type FinFET.
3. The FinFET CMOS circuit of claim 2 , wherein:
the first defined distance comprises a minimum SDB distance; and
the second defined distance comprises a minimum DDB distance.
4. The FinFET CMOS circuit of claim 3 , wherein:
the gate length of the P-type FinFET is approximately equal to twenty (20) nm; and
a gate length of the N-type FinFET is approximately equal to 20 nm.
5. The FinFET CMOS circuit of claim 4 , wherein:
the first defined distance comprises the minimum SDB distance approximately equal to forty-four (44) nanometers (nm); and
the second defined distance comprises the minimum DDB distance approximately equal to fifty-four (54) nm.
6. The FinFET CMOS circuit of claim 1 , wherein:
the first SDB isolation structure comprises:
a first SDB trench etched into the first Fin; and
an SDB dielectric material disposed in the first SDB trench; and
the second SDB isolation structure comprises:
a second SDB trench etched into the first Fin; and
the SDB dielectric material disposed in the second SDB trench.
7. The FinFET CMOS circuit of claim 6 , wherein the SDB dielectric material disposed in the first SDB trench and the second SDB trench comprises silicon dioxide.
8. The FinFET CMOS circuit of claim 1 , wherein:
the first DDB isolation structure comprises:
a first DDB trench etched into the second Fin: and
a DDB dielectric material disposed in the first DDB trench; and
the second DDB isolation structure comprises:
a second DDB trench etched into the second Fin; and
the DDB dielectric material disposed in the second DDB trench.
9. The FinFET CMOS circuit of claim 8 , wherein the DDB dielectric material disposed in the first DDB trench and the second DDB trench comprises silicon dioxide.
10. The FinFET CMOS circuit of claim 1 , further comprising:
a third SDB isolation structure formed in the first Fin on a first side of the first SDB isolation structure opposite of a second side of the first SDB isolation structure on which the gate of the P-type FinFET is formed; and
a fourth SDB isolation structure formed in the first Fin on a second side of the second SDB isolation structure opposite of a first side of the second SDB isolation structure on which the gate of the P-type FinFET is formed.
11. The FinFET CMOS circuit of claim 10 , further comprising:
a second P-type FinFET comprising the first Fin;
a second N-type FinFET comprising the second Fin;
a fifth SDB isolation structure formed in the first Fin on a second side of a gate of the second P-type FinFET, wherein the fourth SDB isolation structure is on a first side of the gate of the second P-type FinFET opposite of the second side of the gate of the second P-type FinFET;
a sixth SDB isolation structure formed in the first Fin on a second side of the fifth SDB isolation structure opposite of a first side of the fifth SDB isolation structure on which the gate of the second P-type FinFET is formed; and
a third DDB isolation structure formed in the second Fin on a second side of a gate of the second N-type FinFET, wherein the second DDB isolation structure is on a first side of the gate of the second N-type FinFET opposite of the second side of the gate of the second N-type FinFET.
12. The FinFET CMOS circuit of claim 1 integrated into an integrated circuit (IC).
13. The FinFET CMOS circuit of claim 1 integrated into a device selected from the group consisting of: a set top box; an entertainment unit; a navigation device; a communications device; a fixed location data unit; a mobile location data unit; a mobile phone; a cellular phone; a smart phone; a tablet; a phablet; a server; a computer; a portable computer; a desktop computer; a personal digital assistant (PDA); a monitor; a computer monitor; a television; a tuner; a radio; a satellite radio; a music player; a digital music player; a portable music player; a digital video player; a video player; a digital video disc (DVD) player; a portable digital video player; and an automobile.