Symmetric plasma process chamber
Embodiments of the present invention provide a plasma chamber design that allows extremely symmetrical electrical, thermal, and gas flow conductance through the chamber. By providing such symmetry, plasma formed within the chamber naturally has improved uniformity across the surface of a substrate disposed in a processing region of the chamber. Further, other chamber additions, such as providing the ability to manipulate the gap between upper and lower electrodes as well as between a gas inlet and a substrate being processed, allows better control of plasma processing and uniformity as compared to conventional systems.
1. A plasma processing apparatus, comprising:
a lid assembly and a chamber body enclosing a processing region; and
a substrate support assembly having a central axis disposed in the chamber body, wherein the substrate support assembly comprises:
a support pedestal disposed in the chamber body and fluidly sealable from the processing region;
a lower electrode supported by the support pedestal; and
a first actuation device disposed within a central region and configured to vertically move the lower electrode a distance, the first actuation device having a motor disposed within the central region, and wherein the central region is fluidly sealable from the processing region and an evacuation region, and the evacuation region is disposed in the chamber body below the central region along the central axis of the substrate support assembly; and
an annular shaped central support coupled to the chamber body and disposed within the central region, wherein the first actuation device is attached to the annular shaped central support.
2. The plasma processing apparatus of claim 1 , wherein the substrate support assembly further comprises a plurality of lift pins disposed therein.
3. The plasma processing apparatus of claim 2 , further comprising a second actuation device disposed within the central region and configured to vertically move the plurality of lift pins.
4. The plasma processing apparatus of claim 3 , wherein the plurality of lift pins are coupled to a lift pin plate.
5. The plasma processing apparatus of claim 4 , wherein the second actuation device comprises:
a lead screw coupled to the lift pin plate; and
an actuator configured to advance and retract the lead screw.
6. The plasma processing apparatus of claim 1 , further comprising a vacuum tube for fluidly coupling to one or more lift pin holes disposed within the lower electrode.
7. The plasma processing apparatus of claim 6 , further comprising a gas supply line for fluidly coupling to a gas port disposed in the lower electrode.
8. The plasma processing apparatus of claim 6 , wherein the vacuum tube is for fluidly coupling to the evacuation region of the chamber body.
9. The plasma processing apparatus of claim 1 , wherein the lid assembly comprises:
an upper electrode having one or more fluid inlets and one or more fluid outlets each having a conductive fitting; and
a plurality of conductive plugs, wherein the conductive fittings and the conductive plugs are arranged symmetrically about the central axis of the substrate support assembly.
10. The plasma processing apparatus of claim 1 , wherein the lid assembly comprises:
an upper electrode having a central manifold configured to distribute processing gas into the processing region and one or more outer manifolds configured to distribute processing gas into the processing region; and
a ring manifold coupled to the one or more outer manifolds via a plurality of gas tubes arranged symmetrically about the central axis of the substrate support assembly.
11. The plasma processing apparatus of claim 1 , wherein a plurality of lift pins are disposed within an opening within the lower electrode, wherein one or more lift pin holes is disposed between the opening within the lower electrode and the processing region, and
wherein a vacuum tube is fluidly coupling the opening within the lower electrode with an evacuation region of the chamber body, wherein the vacuum tube is routed centrally through the support pedestal and out the chamber body through one of a plurality of access tubes to the evacuation region.
12. The plasma processing apparatus of claim 1 , further comprising:
a plasma screen supported by the lower electrode and extending along the periphery of the substrate support assembly; and
an upper liner having an inner wall that maintains an overlap with the plasma screen as the first actuation device moves the lower electrode to protect the substrate support assembly during processing.
13. A substrate support assembly within a plasma processing chamber, comprising:
a support pedestal having a central axis; a lower electrode coupled to the support pedestal; and
a first actuation device within a central region and coupled to the support pedestal and configured to vertically move the lower electrode a distance, the first actuation device having a motor disposed within the central region, and wherein the substrate support assembly is fluidly sealed from an evacuation region located within the plasma processing chamber below the substrate support assembly along the central axis of the support pedestal; and
an annular shaped central support disposed within the central region, wherein the first actuation device is attached to the annular shaped central support.
14. The substrate support assembly of claim 13 , wherein the substrate support assembly further comprises a plurality of lift pins coupled to a lift pin plate.
15. The substrate support assembly of claim 14 , further comprising a second actuation device coupled to the lift pin plate and configured to vertically move the plurality of lift pins.
16. A plasma processing apparatus, comprising:
a lid assembly and a chamber body enclosing a processing region; a substrate support assembly disposed in the chamber body, wherein the substrate support assembly comprises:
a support pedestal disposed in a central region of the chamber body fluidly sealed from the processing region;
a lower electrode supported by the support pedestal; and
a first actuation device disposed within a central region and configured to vertically move the lower electrode a distance, the first actuation device having a motor disposed within the central region; and
an exhaust assembly defining an evacuation region located within the chamber body below the central region along a central axis of the substrate support assembly, fluidly sealed from the central region, wherein the chamber body includes a plurality of passages symmetrically disposed about the central axis of the substrate support assembly fluidly connecting the processing region with the evacuation region; and
an annular shaped central support coupled to the chamber body and disposed within the central region, wherein the first actuation device is attached to the annular shaped central support.
17. The plasma processing apparatus of claim 16 , wherein the chamber body has an exhaust port formed therethrough that is symmetric about the central axis of the substrate support assembly.