Semiconductor memory device
A semiconductor memory device according to an embodiment includes a memory cell array and a control circuit. The memory cell array includes: a plurality of first conductive layers that are stacked; a memory layer provided on a side surface of the plurality of the first conductive layers; and a second conductive layer that contacts the side surface of the plurality of the first conductive layers via the memory layer. A thickness of the first conductive layer disposed at the first position is larger than a thickness of the first conductive layer disposed at the second position. The control circuit is configured to apply a first voltage to a selected first conductive layer. The control circuit changes a value of the first voltage based on a position of the selected first conductive layer.
1. A semiconductor memory device, comprising a memory cell array and a control circuit,
the memory cell array including:
a plurality of first conductive layers that are stacked in a first direction perpendicular to a substrate and extend in a second direction parallel to the substrate;
a memory layer provided on a side surface of the plurality of the first conductive layers; and
a second conductive layer that extends in the first direction and includes a first side surface that contacts the side surface of the plurality of the first conductive layers via the memory layer,
a first width in the second direction of the first side surface of the second conductive layer at a first position in the first direction being larger than a second width in the second direction of the first side surface of the second conductive layer at a second position in the first direction nearer to the substrate than the first position, and a third width in the second direction of the first side surface of the second conductive layer at a third position in the first direction between the first position and the second position being smaller than the first width and larger than the second width,
a first thickness in the first direction of the first conductive layer disposed at the first position being smaller than a second thickness in the first direction of the first conductive layer disposed at the second position, and a third thickness in the first direction of the first conductive layer disposed at the third position being larger than the first thickness and smaller than the second thickness,
the control circuit being configured to apply a first voltage to a selected first conductive layer of the first conductive layers and provide a second voltage to the second conductive layer, and
the control circuit being configured to, when the control circuit applies the first voltage to the selected first conductive layer, change a value of the first voltage based on a relative position in the first direction of the selected first conductive layer.
2. The semiconductor memory device according to claim 1 , wherein
the control circuit is configured to, when the control circuit applies a third voltage to a non-selected first conductive layer of the first conductive layers, change a value of the third voltage based on a relative position in the first direction of the selected first conductive layer.
3. The semiconductor memory device according to claim 1 , wherein
a plurality of the second conductive layers are disposed in the second direction,
the control circuit is configured to apply the second voltage to a selected second conductive layer of the second conductive layers, and
the control circuit is configured to, when the control circuit applies a fourth voltage to a non-selected second conductive layer of the second conductive layers, change a value of the fourth voltage based on a relative position in the first direction of the selected first conductive layer.
4. The semiconductor memory device according to claim 1 , wherein
a plurality of the second conductive layers are disposed in the second direction,
the control circuit is configured to provide the second voltage to a selected second conductive layer of the second conductive layers, and
the control circuit is configured to, when the control circuit applies the first voltage to the selected first conductive layer, change a value of the first voltage based on a relative position in the second direction of the selected second conductive layer.
5. The semiconductor memory device according to claim 1 , wherein
the memory cell array further comprises:
a third conductive layer that extends in a third direction orthogonal to the first direction and the second direction; and
a select transistor that contacts an upper surface of the third conductive layer and a lower surface of the second conductive layer, and
the control circuit is configured to provide the second voltage to the second conductive layer by applying a fifth voltage to the third conductive layer.
6. The semiconductor memory device according to claim 1 , wherein
a magnitude relationship of thicknesses in the first direction of the first conductive layers are not reversed between the first position and the second position.
7. The semiconductor memory device according to claim 1 , wherein
the first conductive layers are disposed between the first position and the second position, the first conductive layers provided between the first position and the second position having thicknesses larger than the first thickness and smaller than the second thickness.
8. The semiconductor memory device according to claim 7 , wherein
each of the first conductive layers provided between the first position and the second position has a thickness not smaller than that of a first conductive layer adjacent from a nearest side to the first position.