Method for manufacturing optical member and method for manufacturing semiconductor laser device
A method for manufacturing an optical member includes providing a silicon substrate having a first main surface of a {110} plane, forming a mask pattern having an opening extending in a <100> direction on the first main surface of the silicon substrate, and forming a sloped surface of a {100} plane in the silicon substrate by wet etching the silicon substrate from a first main surface side using the mask pattern as a mask. A method for manufacturing a semiconductor laser device includes fixing the optical member formed by the method for manufacturing the optical member and a semiconductor laser element to a mounting board so that laser light emitted from the semiconductor laser element is irradiated to a reflective film of the optical member.
1. A method for manufacturing an optical member adapted to be irradiated by laser light, the method comprising:
providing a silicon substrate having a first main surface of a {110} plane;
forming a mask pattern having an opening extending in a <100> direction on the first main surface of the silicon substrate;
forming a sloped surface of {100} plane in the silicon substrate by wet-etching the silicon substrate from a first main surface side using the mask pattern as a mask; and
forming a reflective film on a second main surface of the silicon substrate, which is parallel to the first main surface, the reflective film being configured to reflect substantially all the laser light irradiated thereon.
2. The method for manufacturing an optical member according to claim 1 , wherein
the forming of the reflective film on the second main surface of the silicon substrate is performed after the forming of the sloped surface.
3. The method for manufacturing an optical member according to claim 1 , further comprising
dividing the silicon substrate from a lower end of the sloped surface in the <100> direction, after the forming of the sloped surface.
4. The method for manufacturing an optical member according to claim 3 , wherein
the forming of the mask pattern includes forming the mask pattern having an opening extending in a <110> direction in addition to the opening extending in the <100> direction.
5. The method for manufacturing an optical member according to claim 4 , further comprising
dividing the silicon substrate in the <110> direction, after the forming of the sloped surface.
6. A method for manufacturing a semiconductor laser device, comprising:
manufacturing an optical member by the method according to claim 1 ; and
fixing the optical member and a semiconductor laser element on a mounting board so that laser light emitted from the semiconductor laser element is irradiated to the reflective film of the optical member.
7. The method for manufacturing a semiconductor laser device according to claim 6 , wherein
the fixing of the optical member includes fixing the optical member on the mounting board so that an angle defined by a main surface of the mounting board and a surface of the optical member on which the reflective film is formed is 45 degrees.
8. The method for manufacturing a semiconductor laser device according to claim 6 , wherein
the fixing of the semiconductor laser element includes fixing the semiconductor element on the mounting board via a submount.
9. The method for manufacturing a semiconductor laser device according to claim 8 , wherein
the fixing of the semiconductor laser element includes arranging the semiconductor laser element so that a portion of the semiconductor laser element protrudes from an end of the submount toward the optical member.
10. The method for manufacturing a semiconductor laser device according to claim 6 , further comprising
arranging a cap on the mounting board so as to hermetically seal the semiconductor laser element and the optical member.
11. The method for manufacturing a semiconductor laser device according to claim 8 , wherein
the semiconductor laser clement is junction-down mounted on the submount.
12. The method for manufacturing an optical member according to claim 1 , wherein
the forming of the sloped surface includes forming a pair of sloped surfaces facing each other to define a groove having a substantially V-shape in cross section.
13. The method for manufacturing, an optical member according to claim 12 , wherein
the forming of the pair of sloped surfaces includes forming each of the sloped surfaces to form an angle of 135 degrees with respect to the first main surface of the silicon substrate.
14. The method for manufacturing an optical member according to claim 3 , wherein
the forming of the sloped surfaces includes forming a plurality of pairs of sloped surfaces facing each other so that each of the pair of sloped surfaces defines a groove having a substantially V-shape in cross section,
the dividing of the silicon substrate includes dividing the silicon substrate from the lower end of the groove defined by each of the pairs of sloped surfaces so that the sloped surfaces are respectively arranged on both sides of the optical member after the dividing.
15. The method for manufacturing an optical member according to claim 1 , wherein
the forming of the sloped surface includes wet-etching the silicon substrate by using tetramethylammonium hydroxide as an etchant.