Charged particle beam apparatus

1. A charged particle beam apparatus comprising:

a charged particle source;

an off-axis illumination aperture;

a lens;

a computer; and

a memory,

wherein a signal, generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture and the lens, is detected, so as to acquire an image, and

wherein the computer comprises

a beam-computing-processor configured to perform a beam computation process to estimate a beam profile of the charged particle beam; and

a sharpening processor configured to perform a sharpening process to sharpen the image using the estimated beam profile,

using a first image acquired on a first illumination condition, and a second image acquired on a second illumination condition, by

calculating a first optical transfer function corresponding to the first illumination condition with the sharpening process unit using the first image acquired on the first illumination condition;

calculating a Fourier image of the first image with the sharpening processor;

calculating a second optical transfer function corresponding to the second illumination condition with the sharpening processor using the second image acquired on the second illumination condition;

calculating a Fourier image of the second image with the sharpening processor; and

forming a sharpened Fourier image by selecting the first Fourier image or the second Fourier image, corresponding to the first optical transfer function or the second optical transfer function, with a higher gain, and combining the selected images,

wherein the first illumination condition or the second illumination condition is obtained by changing any of optical system magnification of the charged particle beam apparatus, rotation of the off-axis illumination aperture in a direction parallel to the sample, and the aperture shape of the off-axis illumination aperture.

2. The charged particle beam apparatus according to claim 1 ,

wherein the beam computation process is processing to estimate the beam profile by computation with an illumination condition determined with an optical condition including any of an aperture shape of the off-axis illumination aperture, an optical system magnification of the charged particle beam apparatus, accelerating voltage of the charged particle beam, and power of the lens, as an input value,

wherein the sharpening process is deconvolution processing of the image using the estimated beam profile, and

wherein the memory holds the estimated beam profile.

3. The charged particle beam apparatus according to claim 1 , wherein the sharpening process is processing to convert the estimated beam profile into a second beam profile assumed separately from the estimated beam profile.

4. The charged particle beam apparatus according to claim 3 , wherein the second beam profile is any one of a circular beam profile using a circular aperture, a Gaussian beam profile in use of a Gaussian beam, and a pixel beam profile in size one to five times a pixel size of the image.

5. The charged particle beam apparatus according to claim 1 , wherein the sharpening processor is further configured to:

calculate, using the sharpening processor, a spatial frequency at a point where the first optical transfer function and the second optical transfer function intersect;

segment the optical transfer function into plural regions with the spatial frequency as a border;

form the sharpened Fourier image by selecting the first Fourier image or the second Fourier image in the plural regions; and

perform inverse Fourier transformation on the sharpened Fourier image.

6. The charged particle beam apparatus according to claim 1 , further comprising:

a circular aperture separately from the off-axis illumination aperture; and

a movable mechanism that withdraws the off-axis illumination aperture to a position not irradiated with the charged particle beam.

7. The charged particle beam apparatus according to claim 1 ,

wherein the off-axis illumination aperture has a plurality of types of off-axis illumination apertures on the same plane, and

wherein a selector that selects one of the plurality of types of apertures is further provided.

8. The charged particle beam apparatus according to claim 7 , wherein the selector is a movable mechanism for the off-axis illumination aperture.

9. The charged particle beam apparatus according to claim 7 , wherein the selector includes a first deflector provided upstream of the off-axis illumination aperture and a second deflector provided downstream of the off-axis illumination aperture.

10. The charged particle beam apparatus according to claim 1 ,

wherein the computer includes a comparison processor, and

wherein the comparison processor makes comparison between a first reconstructed image, obtained by performing the sharpening process with respect to a first input image acquired with the charged particle beam apparatus on the first illumination condition, with the first illumination condition as an input value, using the first estimated beam profile obtained with the beam-computing-processor, and a second reconstructed image, obtained by performing the sharpening process with respect to a second input image acquired with the charged particle beam application apparatus on the second illumination condition, with the second illumination condition as an input value, using the second estimated beam profile obtained with the beam-computing-processor, as to whether the input images are the same or not.

11. A charged particle beam apparatus comprising:

a charged particle source;

an off-axis illumination aperture;

an objective lens;

a controller including a computer and a memory; and

an input/output unit including a display,

wherein an image is acquired by detecting a signal, generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture and the objective lens,

wherein the computer comprises

a beam-computing-processor configured to perform a beam computation process to estimate a beam profile of the charged particle beam; and

a sharpening processor configured to perform a sharpening process to sharpen the image using the estimated beam profile,

using a first image acquired on a first illumination condition, and a second image acquired on a second illumination condition, by

calculating a first optical transfer function corresponding to the first illumination condition with the sharpening process unit using the first image acquired on the first illumination condition;

calculating a Fourier image of the first image with the sharpening processor;

calculating a second optical transfer function corresponding to the second illumination condition with the sharpening processor using the second image acquired on the second illumination condition;

calculating a Fourier image of the second image with the sharpening processor; and

forming a sharpened Fourier image by selecting the first Fourier image or the second Fourier image, corresponding to the first optical transfer function or the second optical transfer function, with a higher gain, and combining the selected images,

wherein the first illumination condition or the second illumination condition is obtained by changing any of optical system magnification of the charged particle beam apparatus, rotation of the off-axis illumination aperture in a direction parallel to the sample, and the aperture shape of the off-axis illumination aperture, and

wherein the display displays a reconstructed image of the image sharpened using the estimated beam profile.

12. The charged particle beam apparatus according to claim 11 , wherein the display displays a first reconstructed image corresponding to the first image acquired on the first illumination condition, a second reconstruction image corresponding to the second image acquired on the second illumination condition, and a result of comparison between the first reconstructed image and the second reconstructed image.

13. A charged particle beam apparatus comprising:

a charged particle source;

an off-axis illumination aperture;

an objective lens;

a controller including a computer and a memory; and

an input/output unit including a display,

wherein an image is acquired by detecting a signal, generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture and the objective lens,

wherein the computer comprises

a beam-computing-processor configured to perform a beam computation process to estimate a beam profile of the charged particle beam; and

a sharpening processor configured to perform a sharpening process to sharpen the image using the estimated beam profile,

using a first image acquired on a first illumination condition, and a second image acquired on a second illumination condition, by

calculating a first optical transfer function corresponding to the first illumination condition with the sharpening process unit using the first image acquired on the first illumination condition;

calculating a Fourier image of the first image with the sharpening processor;

calculating a second optical transfer function corresponding to the second illumination condition with the sharpening processor using the second image acquired on the second illumination condition;

calculating a Fourier image of the second image with the sharpening processor; and

forming a sharpened Fourier image by selecting the first Fourier image or the second Fourier image, corresponding to the first optical transfer function or the second optical transfer function, with a higher gain, and combining the selected images,

wherein the first illumination condition or the second illumination condition is obtained by changing any of optical system magnification of the charged particle beam apparatus, rotation of the off-axis illumination aperture in a direction parallel to the sample, and the aperture shape of the off-axis illumination aperture, and

wherein the display displays the image and a sharpened image of the image sharpened using the estimated beam profile.

14. The charged particle beam apparatus according to claim 11 , wherein the display displays the first image acquired on the first illumination condition and the second image acquired on the second illumination condition, and a sharpened image obtained using a high gain part of optical transfer functions of the first image and the second image in respective spatial frequency regions.