IP Library › Granted Patent US 9,910,353
Granted Patent B2
US 9,910,353 · App. 15/223,822 · Granted Mar 6, 2018

Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom

Inventors: Phillip D. Hustad (Midland, MI); Jong Park (Marlborough, MA); Jieqian Zhang (Marlborough, MA); Vipul Jain (Marlborough, MA); Jin Wuk Sung (Marlborough, MA)
Assignees: DOW GLOBAL TECHNOLOGIES LLC; ROHM AND HAAS ELECTRONIC MATERIALS LLC
G03F7/094C08F293/00C08F293/005C09D153/00G03F7/0382G03F7/16G03F7/165G03F7/168G03F7/20G03F7/325G03F7/40H01L21/0274H01L21/3081
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Quick Facts
Patent No.
US 9,910,353
App. No.
15/223,822
Granted
Mar 6, 2018
Kind
B2
Abstract

Disclosed herein is a multi-layered article, comprising a substrate; and two or more layers disposed over the substrate, wherein each said layer comprises a block copolymer comprising a first block and a second block, wherein the first block comprises a repeat unit containing a hydrogen acceptor or a hydrogen donor, and the second block comprises a repeat unit containing a hydrogen donor when the repeat unit of the first block contains a hydrogen acceptor, or a hydrogen acceptor when the repeat unit of the first block contains a hydrogen donor; wherein the first block of an innermost of said two or more layers is bonded to the substrate, and the first block of each layer disposed over the innermost layer is bonded to the second block of a respective underlying layer; and wherein the hydrogen donor or hydrogen acceptor of the second block of an outermost said two or more layers is blocked.

Claims (13)

1. A multi-layered article, comprising:

a substrate; and

two or more layers disposed over the substrate, wherein each said layer comprises a block copolymer comprising a first block and a second block, wherein the first block comprises a repeat unit containing a hydrogen acceptor or a hydrogen donor, and the second block comprises a repeat unit containing a hydrogen donor when the repeat unit of the first block contains a hydrogen acceptor, or a hydrogen acceptor when the repeat unit of the first block contains a hydrogen donor;

wherein the first block of an innermost of said two or more layers is bonded to the substrate, and the first block of each layer disposed over the innermost layer is bonded to the second block of a respective underlying layer; and wherein the hydrogen donor or hydrogen acceptor of the second block of an outermost said two or more layers is blocked.

2. The multi-layered article of claim 1 , wherein the two or more layers comprise a first layer and a second layer, wherein the first layer is the innermost layer and is bonded to the substrate, and the second layer is the outermost layer and is bonded to the first layer.

3. The multi-layered article of claim 1 , wherein the repeat unit of the first block contains a hydrogen acceptor.

4. The multi-layered article of claim 3 , wherein the repeat unit of the first block containing a hydrogen acceptor comprises a nitrogen-containing group.

5. The multi-layered article of claim 4 , wherein the nitrogen-containing group is chosen from amine, amide and pyridine groups.

6. The multi-layered article of claim 1 , wherein the repeat unit of the first block contains a hydrogen donor.

7. The multi-layered article of claim 1 , wherein one or more of the block copolymers further comprises a block of a neutral polymer disposed between the first block and the second block.

8. The multi-layered article of claim 1 , wherein the substrate is a semiconductor substrate.

9. The multi-layered article of claim 8 , where the substrate comprises a photoresist pattern on which the two or more layers are disposed, wherein the first block of the block copolymer of the innermost layer is bonded to the photoresist pattern.

10. The multi-layered article of claim 9 , wherein the photoresist pattern comprises carboxylic acid and/or hydroxyl groups on a surface thereof.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 1, 2016
From: HUSTAD, PHILLIP D.
To: DOW GLOBAL TECHNOLOGIES LLC
Reel/Frame 039302/0598 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 1, 2016
From: PARK, JONG KEUN; ZHANG, JIEQIAN; JAIN, VIPUL; SUNG, JIN WUK
To: ROHM AND HAAS ELECTRONIC MATERIALS LLC
Reel/Frame 039302/0662 →
Continuity (1)
Related Publication 20180031971A1 · Feb 1, 2018