IP Library Granted Patent US 10,196,754
Granted Patent B2
US 10,196,754 · App. 15/231,085 · Granted Feb 5, 2019

Conversion of carbon into n-type and p-type doped diamond and structures

Inventor: Jagdish Narayan (Raleigh, NC)
Assignee: NORTH CAROLINA STATE UNIVERSITY
C30B13/10C01B21/064C01B21/0648C01B32/05C01B32/188C01B32/25C23C14/0605C23C14/0647C23C14/28C30B13/24C30B19/08C30B23/025C30B23/066C30B29/04C30B29/403C30B29/62C30B31/06C30B31/22G01R33/032G01R33/1284H01F1/42H01L21/0254H01L21/0259H01L21/02527H01L21/02595H01L21/02603H01L21/02609H01L21/02631H01L21/02686H01L21/268H03B15/006C01P2002/02C01P2004/03C01P2006/40C01P2006/42C01P2006/90H01L43/10
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Quick Facts
Patent No.
US 10,196,754
App. No.
15/231,085
Granted
Feb 5, 2019
Kind
B2
Abstract

Using processes disclosed herein, materials and structures are created and used. For example, processes can include melting boron nitride or amorphous carbon into an undercooled state followed by quenching. Exemplary new materials disclosed herein can be ferromagnetic and/or harder than diamond. Materials disclosed herein may include dopants in concentrations exceeding thermodynamic solubility limits. A novel phase of solid carbon has structure different than diamond and graphite.

Claims (24)

1. A single crystal film comprising n-type doped diamond having a concentration of n-type dopants that exceeds thermodynamic solubility limits and p-type doped diamond having a concentration of p-type dopants that exceeds thermodynamic solubility limits, the n-type dopants comprising one or more selected from a group consisting of Ni, P, As, and Sb—.

2. The single crystal film of claim 1 , wherein the p-type dopants consist of one or more selected from another group consisting of boron and boron compounds.

3. The single crystal film of claim 1 , further comprising a p-n junction.

4. The single crystal film of claim 1 , wherein the n-type and p-type dopants are incorporated into electrically active substitutional sites of the n-type and p-type doped diamond, respectively.

5. A structure comprising the single crystal film of claim 1 and a substrate, the single crystal film being a film grown epitaxially on the substrate, the substrate being a template for epitaxial growth of the n-type and/or p-type doped diamond.

6. The single crystal film of claim 1 , wherein the n-type dopants are incorporated into electrically active substitutional sites of the n-type doped diamond.

7. A structure comprising the single crystal film of claim 1 and a substrate, the single crystal film being a film grown epitaxially on the substrate, the substrate being a template for epitaxial growth of the n-type doped diamond.

8. A single crystal film comprising:

a p-n junction comprising:

n-type doped diamond having a concentration of n-type dopants that exceeds thermodynamic solubility limits, and

p-type doped diamond having a concentration of p-type dopants that exceeds thermodynamic solubility limits.

9. The single crystal film of claim 8 , wherein the p-type dopants consist of one or more selected from a group consisting of boron and boron compounds.

10. The single crystal film of claim 9 , wherein the n-type dopants consist of one or more selected from another group consisting of Ni, P, As, and Sb—.

11. The single crystal film of claim 8 , wherein the n-type and p-type dopants are incorporated into electrically active substitutional sites of the n-type and p-type doped diamond, respectively.

12. A structure comprising the single crystal film of claim 8 and a substrate, the single crystal film being a film grown epitaxially on the substrate, the substrate being a template for epitaxial growth of the n-type and/or p-type doped diamond.

13. A single crystal film comprising:

n-type doped diamond having a concentration of n-type dopants that exceeds thermodynamic solubility limits; and

p-type doped diamond having a concentration of p-type dopants that exceeds thermodynamic solubility limits.

14. The single crystal film of claim 13 , wherein the p-type dopants consist of one or more selected from a group consisting of boron and boron compounds.

15. The single crystal film of claim 13 , wherein the p-type dopants are incorporated into electrically active substitutional sites of the p-type doped diamond.

16. The single crystal film of claim 13 , wherein the n-type dopants are incorporated into electrically active substitutional sites of the n-type doped diamond.

17. The single crystal film of claim 13 , further comprising a p-n junction.

18. The single crystal film of claim 17 , wherein the n-type dopants consist of one or more selected from another group consisting of Ni, P, As, and Sb—.

19. A structure comprising the single crystal film of claim 13 and a substrate, the single crystal film being a film grown epitaxially on the substrate, the substrate being a template for epitaxial growth of the n-type and/or p-type doped diamond.

Assignments (2)
CONFIRMATORY LICENSE Recorded May 3, 2022
From: NORTH CAROLINA STATE UNIVERSITY RALEIGH
To: NATIONAL SCIENCE FOUNDATION
Reel/Frame 059846/0951 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 19, 2016
From: NARAYAN, JAGDISH
To: NORTH CAROLINA STATE UNIVERSITY
Reel/Frame 040072/0146 →
Continuity (5)
Provisional Application 62355681 · Jun 28, 2016
Provisional Application 62331217 · May 3, 2016
Provisional Application 62245018 · Oct 22, 2015
Provisional Application 62202202 · Aug 7, 2015
Related Publication 20170037532A1 · Feb 9, 2017