IP Library › Granted Patent US 10,016,877
Granted Patent B2
US 10,016,877 · App. 15/243,571 · Granted Jul 10, 2018

Printed chemical mechanical polishing pad having abrasives therein and system for printing

Inventors: Kasiraman Krishnan (Milpitas, CA); Nag B. Patibandla (Pleasanton, CA); Periya Gopalan (San Jose, CA)
Assignee: Applied Materials, Inc.
B24D18/0054B24B37/245B24D3/28B29C64/112B29C64/165B29C64/386B33Y10/00B33Y30/00B33Y50/02B33Y80/00B29K2101/10B29K2101/12B29K2105/0067B29K2105/16B29L2031/736
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Quick Facts
Patent No.
US 10,016,877
App. No.
15/243,571
Granted
Jul 10, 2018
Kind
B2
Abstract

A method of fabricating a polishing layer of a polishing pad includes determining a desired distribution of particles to be embedded within a polymer matrix of the polishing layer. A plurality of layers of the polymer matrix is successively deposited with a 3D printer, each layer of the plurality of layers of polymer matrix being deposited by ejecting a polymer matrix precursor from a nozzle. A plurality of layers of the particles is successively deposited according to the desired distribution with the 3D printer. The polymer matrix precursor is solidified into a polymer matrix having the particles embedded in the desired distribution.

Claims (18)

1. An apparatus for fabricating a polishing layer of a polishing pad, comprising:

a support;

a printer to form the polishing layer on the support, the printer including at least one nozzle, wherein the printer is configured successively deposit a plurality of layers of a polymer matrix by ejecting droplets of a liquid polymer matrix precursor and dispensing particles to be embedded in the polymer matrix to form the polishing layer; and

a computer coupled to the printer and configured to receive a computer-readable file containing data setting a desired distribution of particles to be embedded within the polymer matrix of the polishing layer, and control the printer in response to the data setting the desired distribution of particles so that successively depositing the plurality of layers includes distributing the particles in the plurality of layers according to the desired distribution with the printer.

2. The apparatus of claim 1 , comprising a supply of liquid polishing pad material precursor and a supply of the particles.

3. The apparatus of claim 2 , wherein the particles are abrasive particles.

4. The apparatus of claim 2 , wherein the particles have a hollow core such that the polishing layer comprises pores formed by the hollow core of particles.

5. The apparatus of claim 1 , comprising a mixer to mix the particles with the liquid polymer matrix precursor to form a mixture that is ejected by the at least one nozzle.

6. The apparatus of claim 1 , wherein the printer comprises a first printhead to eject the liquid polymer matrix precursor and a second printhead to eject the particles.

7. The apparatus of claim 6 , wherein the printer is configured such that the first printhead ejects the liquid polymer matrix precursor before the second printhead dispenses the particles into the liquid polymer matrix precursor.

8. The apparatus of claim 1 , comprising a radiation source to cure the polymer matrix precursor to form a solidified polymer matrix having the particles embedded in the desired distribution.

9. The apparatus of claim 8 , wherein the radiation source comprises a UV radiation source.

10. The apparatus of claim 8 , wherein the radiation source is configured to cure the polymer matrix precursor immediately upon deposition.

11. The apparatus of claim 8 , wherein the radiation source is configured to cure an entire layer of polymer matrix precursor simultaneously after deposition of the entire layer.

12. The apparatus of claim 8 , comprising a supply of the polymer matrix precursor, wherein the polymer matrix precursor is a liquid thermoset polymer precursor.

13. The apparatus of claim 1 , comprising a supply of the polymer matrix precursor, wherein the polymer matrix precursor is a molten thermoplastic polymer.

14. The apparatus of claim 1 , wherein the nozzle is configured to translate across the support.

15. The apparatus of claim 1 , wherein the support forms a portion of the polishing pad.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 2, 2016
From: KRISHNAN, KASIRAMAN; PATIBANDLA, NAG B.; GOPALAN, PERIYA
To: APPLIED MATERIALS, INC.
Reel/Frame 039626/0452 →
Continuity (3)
Continuation 14511057 · Oct 9, 2014
Provisional Application 61899754 · Nov 4, 2013
Related Publication 20160354901A1 · Dec 8, 2016