Pattern optical similarity determination

1. A method comprising:

simulating a lithography process of a first set of layout features and a second set of layout features using a lithography model, wherein the lithography model is expressed as a plurality of functions that indicate light intensity on an image plane, wherein the simulating produces a first plurality of values representing respective contributions of the plurality of functions to imaging the first set of layout features and produces a second plurality of values representing respective contributions of the plurality of functions to imaging the second set of layout features;

determining optical similarity values between the first set of layout features and the second set of layout features based on the first plurality of values and the second plurality of values wherein each of the optical similarity values indicate a degree of similarity between one or more layout features in the first set of layout features and one or more layout features in the second set of layout features; and

changing the first set of layout features based on the optical similarity values.

2. The method of claim 1 , further comprising determining calibration weight values of the lithography model, for the first set of layout features, based on the optical similarity values.

3. The method of claim 2 , further comprising determining model parameters based on the calibration weight values.

4. The method of claim 1 , further comprising determining weighted calibration weight values of the lithography model for the first set of layout features based on magnitudes of the optical similarity values.

5. The method of claim 4 , wherein the determining the weighted calibration weight values comprises calculating a difference between an optical similarity value and a predetermined threshold.

6. The method of claim 1 , further comprising determining verification weight values, for the second set of layout features, based on the optical similarity values.

7. The method of claim 6 , wherein the determining the verification weight values comprises calculating a number of layout features in the second set of layout features having a respective optical similarity value above a predetermined threshold value.

8. The method of claim 6 , wherein the changing the first set of layout features comprises changing, based on the verification weight values, the first set of layout features.

9. The method of claim 1 , wherein the simulating comprises producing the first plurality of values by calculating respective peak-to-valley intensity contributions of the plurality of functions to imaging a layout feature of the first set of layout features.

10. The method of claim 9 , wherein the plurality of functions comprises respectively a plurality of eigenfunctions of the lithography model, and wherein the respective peak-to-valley intensity contributions are unscaled by eigenvalues corresponding to the plurality of eigenfunctions.

11. The method of claim 1 , wherein the determining the optical similarity values comprises calculating normalized cross-correlation values between the first plurality of values and the second plurality of values.

12. The method of claim 1 , wherein the changing the first set of layout features comprises adding, to the first set of layout features, one or more layout features that are within a predetermined threshold optical similarity value of a layout feature in the first set of layout features.

13. One or more non-transitory computer-readable media with processor-executable instructions stored thereon, that, when executed by one or more processors, causes the one or more processors to:

simulate a lithography process of a first set of layout features and a second set of layout features using a lithography model, wherein the lithography model is expressed as a plurality of functions that indicate light intensity on an image plane, wherein the simulating produces a first plurality of values representing respective contributions of the plurality of functions to imaging the first set of layout features and produces a second plurality of values representing respective contributions of the plurality of functions to imaging the second set of layout features;

determine optical similarity values between the first set of layout features and the second set of layout features based on the first plurality of values and the second plurality of values wherein each of the optical similarity values indicate a degree of similarity between one or more layout features in the first set of layout features and one or more layout features in the second set of layout features; and

change the first set of layout features based on the optical similarity values.

14. The one or more non-transitory computer-readable media of claim 13 , wherein the processor-executable instructions, when executed by the one or more processors, cause the one or more processors to determine calibration weight values of the lithography model for the first set of layout features based on the optical similarity values.

15. The one or more non-transitory computer-readable media of claim 13 , wherein the processor-executable instructions, when executed by the one or more processors, cause the one or more processors to determine verification weight values, for the second set of layout features, based on the optical similarity values.

16. The one or more non-transitory computer-readable media of claim 15 , wherein the processor-executable instructions that, when executed by the one or more processors, cause the one or more processors to change the first set of layout features comprise processor-executable instructions that cause the one or more processors to change, based on the verification weight values, the first set of layout features.

17. The one or more non-transitory computer-readable media of claim 15 , wherein the processor-executable instructions that, when executed by the one or more processors, cause the one or more processors to change the first set of layout features comprise processor-executable instructions that cause the one or more processors to add, to the first set of layout features, one or more layout features that are within a predetermined threshold optical similarity value of a layout feature in the first set of layout features.

18. A system, comprising:

computer memory having software instructions stored thereon; and

one or more computer processors that, when executing the software instructions, cause the system to:

simulate a lithography process of a first set of layout features and a second set of layout features using a lithography model, wherein the lithography model is expressed as a plurality of functions that indicate light intensity on an image plane, wherein the simulating produces a first plurality of values representing respective contributions of the plurality of functions to imaging the first set of layout features and produces a second plurality of values representing respective contributions of the plurality of functions to imaging the second set of layout features;

determine verification weight values of the second set of layout features; and

change the first set of layout features based on the verification weight values.

19. The system of claim 18 , wherein the instructions that cause the system to change the first set of layout features comprise instructions that cause the system to:

add one or more layout features to the first set of layout features, or

delete one or more layout features from the first set of layout features.

20. The method of claim 1 , further comprising modifying, based on the optical similarity values, design layout data for a photolithographic mask.