IP Library Granted Patent US 10,018,578
Granted Patent B2
US 10,018,578 · App. 15/246,041 · Granted Jul 10, 2018

X-ray analysis device

Inventors: Satoshi Nakayama (Tokyo, JP); Keiichi Tanaka (Tokyo, JP); Atsushi Nagata (Tokyo, JP); Kazuo Chinone (Tokyo, JP)
Assignee: Hitachi High-Tech Science Corporation
G01N23/223
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Quick Facts
Patent No.
US 10,018,578
App. No.
15/246,041
Granted
Jul 10, 2018
Kind
B2
Abstract

An X-ray analysis device includes an electron gun, an X-ray optical member, a first detection unit and a second detection unit, and a distance changing mechanism. The X-ray optical member guides characteristic X-rays emitted from a sample to at least any one of the first detection unit or the second detection unit. The first detection unit is formed such that energy resolution is given relative priority over counting efficiency in contrast to the second detection unit. The second detection unit is formed such that counting efficiency is given relative priority over energy resolution in contrast to the first detection unit. The distance changing mechanism changes the distance between each of the first detection unit and the second detection unit and the X-ray optical member in an axial direction of an optical axis of the X-ray optical member.

Claims (22)

1. An X-ray analysis device comprising:

an excitation source which excites a sample to be analyzed to emit characteristic X-rays;

a plurality of detection units which detect the characteristic X-rays emitted from the sample;

an optical member which guides the characteristic X-rays emitted from the sample to at least any one of the plurality of detection units; and

a distance changing mechanism which changes a distance between each of the plurality of detection units and the optical member in an axial direction of an optical axis of the optical member,

wherein the plurality of detection units include at least a first detection unit and a second detection unit having different detection characteristics,

the first detection unit is formed such that energy resolution is given relative priority over counting efficiency in contrast to the second detection unit, and

the second detection unit is formed such that counting efficiency is given relative priority over energy resolution in contrast to the first detection unit.

2. The X-ray analysis device according to claim 1 ,

wherein either one of the first detection unit and the second detection unit is disposed at a position relatively close to the optical axis, and the other of the first detection unit and the second detection unit is disposed at a position relatively distant from the optical axis.

3. The X-ray analysis device according to claim 2 ,

wherein the second detection unit is disposed so that surroundings of the first detection unit are surrounded.

4. The X-ray analysis device according to claim 1 ,

wherein the distance changing mechanism realizes

a first state where the distance is set to a first distance such that an irradiation region of the characteristic X-rays guided by the optical member is included in an effective detection region of the first detection unit, and

a second state where the distance is set to a second distance such that the irradiation region of the characteristic X-rays guided by the optical member is included in an effective detection region of the second detection unit.

5. The X-ray analysis device according to claim 1 , further comprising:

a dead time acquisition unit which acquires a dead time for the detection of the characteristic X-rays in the plurality of detection units,

wherein the distance changing mechanism changes the distance so as to maintain the dead time to be less than a predetermined threshold.

6. The X-ray analysis device according to claim 1 , further comprising:

a frequency acquisition unit which acquires an overlap frequency of detection signals of the characteristic X-rays in the plurality of detection units,

wherein the distance changing mechanism changes the distance so as to maintain the overlap frequency of the detection signals to be less than a predetermined threshold.

Assignments (3)
CHANGE OF ADDRESS Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0555 →
CHANGE OF NAME Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072903/0648 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 26, 2016
From: NAKAYAMA, SATOSHI; TANAKA, KEIICHI; NAGATA, ATSUSHI; CHINONE, KAZUO
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 039556/0183 →
Priority Claims (1)
JP 2015-166549 · Aug 26, 2015 · national
Continuity (1)
Related Publication 20170062088A1 · Mar 2, 2017