Focused ion beam apparatus

1. A focused ion beam apparatus comprising:

an ion source that emits an ion beam;

an extraction electrode that extracts ions from a tip end of an emitter of the ion source, the extraction electrode comprising a first extraction electrode having a first hole diameter and a second extraction electrode having a second hole diameter, the first hole diameter being smaller than the second hole diameter; and

a first lens electrode that configures a condenser lens by a potential difference with the extraction electrode, the condenser lens facing the extraction electrode and being configured to focus the ions extracted by the extraction electrode,

wherein a strong lens action is generated between the extraction electrode and the first lens electrode so as to focus all ions extracted from the ion source to pass through the condenser lens including the first lens electrode.

2. The focused ion beam apparatus according to claim 1 , wherein, even when an accelerating voltage applied to the emitter is changed, a potential difference between the emitter and the extraction electrode is maintained to be a predetermined value, and a potential difference between the emitter and the first lens electrode is controlled to become a constant voltage difference.

3. The focused ion beam apparatus according to claim 1 ,

wherein the focused ion beam apparatus further comprises a control electrode between the first extraction electrode and the second extraction electrode, and

wherein the first hole diameter is smaller than a size of a hole of the control electrode.

4. The focused ion beam apparatus according to claim 3 ,

wherein a potential of the first extraction electrode and a potential of the second extraction electrode are the same, and

wherein a ratio Vcon/Vext is in a range of 0.01 to 0.5, where Vext is a potential difference between the emitter and the first extraction electrode, and Vcon is a potential difference between the emitter and the control electrode.

5. The focused ion beam apparatus according to claim 1 , wherein a potential difference between the emitter and the first lens electrode is 30000 V or more and 90000 V or less.

6. The focused ion beam apparatus according to claim 1 , further comprising:

a second lens electrode and a third lens electrode that are provided on a subsequent stage of the first lens electrode with respect to a traveling direction of the ion beam,

wherein the third lens electrode is grounded, and

wherein the second lens electrode adjusts a trajectory of the ion beam focused by the first lens electrode according to a potential difference between the first lens electrode and the third lens electrode.

7. The focused ion beam apparatus according to claim 1 , wherein a potential difference between the extraction electrode and the first lens electrode is 23500V or more and 83500V or less.

8. The focused ion beam apparatus according to claim 1 , wherein the extraction electrode is separate from and not a part of the condenser lens.

9. A focused ion beam apparatus comprising:

an ion source that emits an ion beam;

an extraction electrode that extracts the ion beam from a tip end of an emitter of the ion source; and

a condenser lens that focuses the ions extracted by the extraction electrode in a beam shape by a potential difference with the extraction electrode,

wherein the extraction electrode comprises a first extraction electrode and a second extraction electrode,

wherein the focused ion beam apparatus further comprises a control electrode, between the first extraction electrode and the second extraction electrode,

wherein a potential of the first extraction electrode and a potential of the second extraction electrode are the same,

wherein the ion beam radiated from the second extraction electrode becomes a parallel beam by adjusting a voltage of the control electrode so that all of the ions emitted from the ion source passes through a hole of the condenser lens without coming into contact with an electrode configuring the condenser lens, and

wherein a hole diameter of the condenser lens is equal to or more than 1 mm to less than 10 mm.

10. The focused ion beam apparatus according to claim 9 ,

wherein a hole diameter of the first extraction electrode is smaller than a hole diameter of the control electrode, and

wherein a hole diameter of the control electrode is smaller than the hole diameter of the second extraction electrode.

11. The focused ion beam apparatus according to claim 8 ,

wherein a potential of the first extraction electrode and a potential of the second extraction electrode are the same, and

wherein a ratio Vcon/Vext is in a range of 0.01 to 0.5, where Vext is a potential difference between the emitter and the first extraction electrode, and Vcon is a potential difference between the emitter and the control electrode.

12. A focused ion beam apparatus comprising:

an ion source that emits an ion beam;

an extraction electrode that extracts the ion beam from a tip end of an emitter of the ion source, the extraction electrode comprising a first extraction electrode having a first hole diameter and a second extraction electrode having a second hole diameter, the first hole diameter being smaller than the second hole diameter;

a condenser lens that focuses the ions extracted by the extraction electrode in a beam shape by a potential difference with the extraction electrode, the condenser lens comprising:

a first lens electrode facing the extraction electrode; and

a second lens electrode provided on a subsequent stage of the first lens electrode with respect to a traveling direction of the ion beam; and

a control device configured to control a potential difference between the extraction electrode and the first lens electrode to be in a range of between 23500V and 83500V so as to focus the ion beam into a beam state.

13. The focused ion beam apparatus according to claim 12 ,

wherein the focused ion beam apparatus further comprises a control electrode between the first extraction electrode and the second extraction electrode, and

wherein the control device is further configured to:

control a potential of the first extraction electrode and a potential of the second extraction electrode to be the same; and

control the ion beam radiated from the second extraction electrode to become a parallel beam by adjusting a voltage of the control electrode so that all of the ions emitted from the ion source passes through a hole of the condenser lens without coming into contact with an electrode configuring the condenser lens.

14. The focused ion beam apparatus according to claim 12 , wherein the control device is further configured to control a potential difference between the emitter and the first lens electrode to be in a range of 30000 V or more and 90000 V or less.

15. The focused ion beam apparatus according to claim 9 , wherein the emitter is applied with accelerating voltage in a range of from 1000 V to 30000 V.

16. The focused ion beam apparatus according to claim 12 , wherein the emitter is applied with accelerating voltage in a range of from 1000 V to 30000 V.

17. The focused ion beam apparatus according to claim 12 , wherein the hole diameter of the condenser lens is equal to or more than 1 mm to less than 10 mm.

18. The focused ion beam apparatus according to claim 13 ,

wherein a hole diameter of the control electrode is smaller than the second hole diameter of the second extraction electrode.

19. The focused ion beam apparatus according to claim 13 ,

wherein a potential of the first extraction electrode and a potential of the second extraction electrode are the same, and

wherein a ratio Vcon/Vext is in a range of 0.01 to 0.5, where Vext is a potential difference between the emitter and the first extraction electrode, and Vcon is a potential difference between the emitter and the control electrode.