Susceptor for holding a semiconductor wafer having an orientation notch, a method for depositing a layer on a semiconductor wafer, and semiconductor wafer
View Patent ↗A semiconductor wafer processing susceptor for holding a wafer having an orientation notch during deposition of a layer on the wafer, having a placement surface for supporting the semiconductor wafer in the rear edge region of the wafer, the placement surface having a stepped outer delimitation, and an indentation of the outer delimitation of the placement surface for placement of the partial region of the edge region of the rear side of the wafer in which the orientation notch is located onto a partial region of the placement surface delimited by the indentation of the outer delimitation of the placement surface. The susceptor is used in a method for depositing a layer on a wafer having an orientation notch, and wafers made of monocrystalline silicon upon which layers are deposited using the susceptor have greater local flatness on both front and rear sides proximate the orientation notch.
1. A semiconductor wafer comprising monocrystalline silicon having a diameter, a front side, a rear side, an edge region, an orientation notch in the edge region, and a deposited epitaxial layer comprising silicon on the front side, wherein the epitaxial layer has a thickness of not less than 1.5 μm and not greater than 5 μm, the semiconductor wafer having a local flatness in a region of the orientation notch, expressed by ESFQR, of not less than 5 nm and not greater than 20 nm.
2. The semiconductor wafer of claim 1 , which has a diameter of not less than 200 mm.
3. The semiconductor wafer of claim 1 , with a material deposition on the rear side of the semiconductor wafer on a rectangular evaluation area enclosing the orientation notch, wherein the thickness of the material deposition is not greater than 15 nm.
4. The semiconductor wafer of claim 2 , with a material deposition on the rear side of the semiconductor wafer on a rectangular evaluation area enclosing the orientation notch, wherein the thickness of the material deposition is not greater than 15 nm.