Method of forming a semiconductor device including forming a shield conductor overlying a gate conductor
In one embodiment, a semiconductor device is formed to include a gate structure extending into a semiconductor material that is underlying a first region of semiconductor material. The gate structure includes a conductor and also a gate insulator that has a first portion positioned between the gate conductor and a first portion of the semiconductor material that underlies the gate conductor. The first portion of the semiconductor material is configured to form a channel region of the transistor which underlies the gate conductor. The gate structure may also include a shield conductor overlying the gate conductor and having a shield insulator between the shield conductor and the gate conductor. The shield insulator may also have a second portion positioned between the shield conductor and a second portion of the gate insulator and a third portion overlying the shield conductor.
1. A method of forming a semiconductor device comprising:
providing a multi-layer semiconductor material having a first layer of a first conductivity type, having a first region of a second conductivity type overlying the first layer, having a plurality of openings that extend from a surface of the first region into the first layer wherein the plurality of openings have sidewalls, a gate insulator formed on the sidewalls of a first opening of the plurality of openings, and a gate conductor material within the first opening;
removing a first portion of the gate conductor material from the first opening and leaving a second portion of the gate conductor material within the first opening as a gate conductor wherein a portion of the first layer that underlies the gate conductor forms a channel region of the semiconductor device;
forming a shield insulator within the first opening and overlying the gate conductor;
forming a shield conductor within the first opening overlying the gate conductor; and
forming a source conductor on a portion of the shield conductor to form an electrical connection between the shield conductor and the first layer.
2. The method of claim 1 further including forming a source contact conductor to extend through the first region and into the first layer including forming the source contact conductor after forming the shield conductor and before forming an electrical connection between the source conductor and the shield conductor.
3. The method of claim 1 further including forming a source region of the second conductivity type in the first layer and proximal to the gate conductor.
4. The method of claim 3 further including forming the source conductor to electrically contact the source region.
5. The method of claim 1 further including forming a source contact conductor to extend through the first region and into the first layer including forming the source contact conductor prior to removing the first portion of the gate conductor material from the first opening.
6. The method of claim 1 including forming the shield insulator covering a top surface of the gate conductor and insulating the shield conductor from electrically contacting the gate conductor.
7. The method of claim 1 including forming the shield conductor on the shield insulator.
8. The method of claim 1 wherein forming the source conductor on a portion of the shield conductor to form the electrical connection between the shield conductor and the first layer includes forming the source conductor on a portion of the shield conductor to form a direct electrical connection between the shield conductor and the first layer.
9. A method of forming a semiconductor device comprising:
providing a multi-layer semiconductor material having a first layer of a first conductivity type, having a first region of a second conductivity type overlying the first layer, having a plurality of openings that extend from a surface of the first region into the first layer wherein the plurality of openings have sidewalls, a gate insulator formed on the sidewalls of a first opening of the plurality of openings, and a gate conductor material within the first opening;
removing a first portion of the gate conductor material from the first opening and leaving a second portion of the gate conductor material within the first opening as a gate conductor wherein a portion of the first layer that underlies the gate conductor forms a channel region of the semiconductor device;
forming a shield insulator within the first opening and overlying the gate conductor including forming the shield insulator with a second opening within the shield insulator with at least a portion of the second opening extending substantially parallel to the sidewalls of the first opening, and forming a shield conductor within the portion of the second opening;
forming the shield conductor overlying the gate conductor; and
forming a source conductor on a portion of the shield conductor to form an electrical connection between the shield conductor and the first layer.