Compound semiconductor film structure
A compound semiconductor film structure includes a substrate, a first compound semiconductor epitaxial layer and a second compound semiconductor epitaxial layer. The substrate has a top surface. The first compound semiconductor epitaxial layer is formed on the top surface and has an epitaxial interface and at least one recess, wherein the epitaxial interface is disposed on one side of the first compound semiconductor epitaxial layer opposite to the side of the first compound semiconductor epitaxial layer facing the top surface, and the at least one recess is formed in the first compound semiconductor epitaxial layer. The second compound semiconductor epitaxial layer formed on the epitaxial interface. The top surface and the bottom of recess are separated by a distance substantially ranging between 0.8 μm and 1.3 μm.
1. A compound semiconductor film structure, comprising:
a substrate having a top surface without patterned holes or protrusions;
a first compound semiconductor epitaxial layer formed on the top surface, wherein an epitaxial interface is disposed one side of the first compound semiconductor epitaxial layer opposite to one side of the first compound semiconductor epitaxial layer facing the top surface, and at least one recess is formed in the first compound semiconductor epitaxial layer; and
a second compound semiconductor epitaxial layer formed on the epitaxial interface to cover the at least one recess but not completely fill up the at least one recess;
wherein the top surface and a bottom of the recess are separated by a distance substantially ranging between 0.8 and 1.3 micrometers (μm).
2. The compound semiconductor film structure according to claim 1 , wherein the recess has a cross-sectional profile which is wider at the top but narrower at the bottom.
3. The compound semiconductor film structure according to claim 1 , wherein the first compound semiconductor epitaxial layer further has a plurality of irregularly arranged recesses.
4. The compound semiconductor film structure according to claim 1 , wherein the first compound semiconductor epitaxial layer and the second compound semiconductor epitaxial layer both comprise an aluminum containing semiconductor material.
5. The compound semiconductor film structure according to claim 4 , wherein the aluminum containing semiconductor material is selected from a group consisting of aluminum nitride (AlN), aluminum gallium nitride (AlGaN), aluminum indium gallium nitride (AlInGaN) and arbitrary combinations thereof.
6. The compound semiconductor film structure according to claim 1 , wherein the substrate is an AlN precursor layer disposed on a base board.
7. The compound semiconductor film structure according to claim 1 , wherein the first compound semiconductor epitaxial layer has a thickness substantially ranging between 1 μm and 1.5 μm.
8. The compound semiconductor film structure according to claim 1 , wherein the first compound semiconductor epitaxial layer has a honeycomb shaped profile in a plan view.
9. The compound semiconductor film structure according to claim 1 , wherein the first compound semiconductor epitaxial layer has a plurality of irregularly arranged island structures, and each of the island structures has a diameter substantially ranging between 2 μm and 4 μm.
10. The compound semiconductor film structure according to claim 1 , wherein the recess has an opening width substantially ranging between 0.1 μm and 0.5 μm.
11. A compound semiconductor film structure, comprising:
a substrate having a top surface;
a first compound semiconductor epitaxial layer formed on the top surface, wherein an epitaxial interface is disposed one side of the first compound semiconductor epitaxial layer opposite to one side of the first compound semiconductor epitaxial layer facing the top surface, and at least one recess is formed in the first compound semiconductor epitaxial layer; and
a second compound semiconductor epitaxial layer formed on the epitaxial interface to cover the at least one recess but not completely fill up the at least one recess;
wherein the top surface and a bottom of the recess are separated by a distance substantially ranging between 0.8 and 1.3 micrometers (μm); the first compound semiconductor epitaxial layer and the second compound semiconductor epitaxial layer are formed in situ.