IP Library Granted Patent US 10,729,871
Granted Patent B2
US 10,729,871 · App. 15/271,927 · Granted Aug 4, 2020

Vapor delivery system

Inventors: Dirk Niedermann (Bloomingdale, IL); Kin Wan Li (Fanling, HK); Poon Lap Chan (Shatin, HK); James G. Montagnino (St. Charles, IL)
Assignee: Crane USA Inc.
A61M16/109A61H33/12A61M11/005A61M11/042A61M16/022A61M16/06A61M16/16
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,729,871
App. No.
15/271,927
Granted
Aug 4, 2020
Kind
B2
Abstract

A vapor delivery system having: a) a base unit configured to generate a supply of vapor; and b) a vapor control system configured to allow a user to selectively: a) cause vapor generated by the base unit to be discharged primarily to a surrounding space within which the base unit resides to thereby increase vapor density in the surrounding space; and b) cause vapor generated by the base unit to be discharged primarily to a vapor guide structure configured to: i) be placed operatively with respect to a user's face; and ii) guide discharging vapor generated by the base unit into at least one of the user's nose and mouth with the vapor guide structure placed operatively with respect to the user's face.

Claims (35)

1. A vapor delivery system comprising:

a base unit comprising a vapor generator so that the base unit is configured to generate a supply of vapor; and

a vapor control system usable ire conjunction with the base unit and configured to allow a user to selectively: a) cause vapor generated by the base unit to be discharged primarily to a surrounding space within which the base unit resides to thereby increase vapor density in the surrounding space; and b) cause vapor generated by the base unit to be discharged primarily to a vapor guide structure configured to: i) be placed operatively with respect to a user's face; and ii) guide discharging vapor generated by the base unit into at least one of the user's nose and mouth with the vapor guide structure placed operatively with respect to the user's face,

wherein the vapor delivery system has first and second different states, with the vapor delivery system in the first state vapor generated by the base unit is discharged primarily to the surrounding space, and with the vapor delivery system in the second state vapor generated by the base unit is discharged primarily to the vapor guide structure,

wherein the vapor control system comprises a first subassembly and a second subassembly, the first and second subassemblies interchangeably operatively connected to the base unit, one in place of the other, to respect very place the delivery system in the first and second states,

wherein with the first subassembly operatively connected to the base unit, the first subassembly is configured to cause vapor generated by the base unit to be guided in a first manner into the surrounding space and wherein the first subassembly comprises a housing defining a reservoir for a supply of liquid to be delivered to the base unit.

2. The vapor delivery system according to claim 1 wherein the vapor guide structure comprises a mask housing that is configured to: a) conform at least nominally to the user's face with the vapor guide structure placed operatively with respect to the user's face; and b) define a chamber over the at least one of the user's nose and mouth configured to guide discharged vapor generated by the base unit into the at least one of the user's nose and mouth with the vapor guide structure placed operatively with respect to the user's face.

3. The vapor delivery system according to claim 1 wherein the base unit comprises a receptacle for a supply of liquid to be vaporized by the vapor delivery system.

4. The vapor delivery system according to claim 3 wherein the first subassembly comprises a housing defining a reservoir for a supply of liquid, the reservoir in fluid communication with the receptacle with the vapor delivery system in the first state.

5. The vapor delivery system according to claim 2 wherein the base unit comprises a receptacle for a supply of liquid to be vaporized by the vapor delivery system and the receptacle is in fluid communication with the chamber with the vapor delivery system in the second state.

6. The vapor delivery system according to claim 5 wherein the second subassembly is configured to allow a user to selectively control a rate of vapor delivery from the base unit to the mask housing chamber.

7. The vapor delivery system according to claim 6 wherein the mask housing has at least one vent opening through which fluid can discharge from the mask housing chamber to the surrounding space with the vapor guide structure placed operatively with respect to the user's face.

8. The vapor delivery system according to claim 7 wherein the second subassembly comprises an adaptor that is configured to be supported on the base unit with the vapor delivery system in the second state and the second subassembly further comprises a first unit that is releasably connected to the adaptor and defines the mask housing.

9. The vapor delivery system according to claim 8 wherein the first unit is made from a formed flexible material.

10. The vapor delivery system according to claim 4 wherein the first subassembly comprises an adaptor that is configured to be supported on the base unit with the vapor delivery system in the first state.

11. The vapor delivery system according to claim 10 wherein the adaptor is configured to be separated from the housing.

12. The vapor delivery system according to claim 10 wherein the adaptor defines an upwardly converging surface around a vapor passage/space that guides upward vapor flow from the base unit.

13. The vapor delivery system according to claim 8 wherein the adaptor is configured to vertically overlie a portion of the receptacle.

14. A vapor delivery system comprising:

a base unit configured to generate a supply of vapor; and

a vapor control system configured to allow a user to selectively: a) cause vapor generated by the base unit to be discharged primarily to a surrounding space within which the base unit resides to thereby increase vapor density in the surrounding space with the vapor delivery system in a first state; and b) cause vapor generated by the base unit to be discharged primarily to a vapor guide structure configured to: i) be placed operatively with respect to a user's face; and ii) guide discharging vapor generated by the base unit into at least one of the user's nose and mouth with the vapor guide structure placed operatively with respect to the user's face with the vapor delivery system in a second state,

wherein the base unit comprises a receptacle for a supply of liquid to be vaporized by the vapor delivery system,

wherein the vapor control system comprises a first subassembly comprising a housing defining a reservoir for a supply of liquid, the reservoir in fluid communication with the receptacle with the vapor delivery system in the first state,

wherein the first subassembly comprises an adaptor that is configured to be supported on the base unit with the vapor delivery system in the first state,

wherein the adaptor defines an upwardly converging surface around a vapor passage/space that guides upward vapor flow from the base unit,

wherein the reservoir has a vertical depth and the upwardly converging surface extends over at least a part of the vertical depth of the reservoir.

15. The vapor delivery system according to claim 14 wherein the housing defines a downwardly converging collection surface that is configured to funnel liquid downwardly into the vapor passage.

16. The vapor delivery system according to claim 15 wherein the downwardly converging collection surface extends over at least a part of the vertical depth of the reservoir.

17. A vapor delivery system comprising:

a base unit comprising a receptacle for a supply of liquid and configured to generate a supply of vapor from liquid in the receptacle; and

a vapor control system configured to allow a user to selectively: a) cause vapor generated by the base unit to be discharged primarily to a surrounding space within which the base unit resides to thereby increase vapor density in the surrounding space with the vapor delivery system in the first state; and b) cause vapor generated by the base unit to discharged primarily to a vapor guide structure configured to: i) be placed operatively with respect to a user's face, and ii) guide discharging generated by the base unit into at least one of the user nose and mouth with the vapor guide structure placed operatively with respect to the user's face with the vapor delivery system in a second state,

wherein a first subassembly of the vapor control system comprises a housing defining a reservoir or a supply of liquid, the reservoir in fluid communication with the receptacle with the fluid delivery system in the first state,

wherein the first subassembly comprises an adaptor that is configured to be supported on the base unit with the vapor delivery system in the first state,

wherein the adaptor is configured to be separated from the housing,

wherein the base unit and adaptor are configured to cause environmental air and vapor generated by the base unit to be mixed in a space bounded by a surface on the adaptor.

Assignments (2)
SECURITY INTEREST Recorded Dec 8, 2020
From: CRANE USA INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 054579/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 14, 2020
From: NIEDERMANN, DIRK; LI, KIN WAN; CHAN, POON LAP
To: CRANE USA INC.
Reel/Frame 052388/0917 →
Continuity (1)
Related Publication 20180078729A1 · Mar 22, 2018
Cited By (3)
US 1,146,010 US 12,208,200 US 12,678,367