Support apparatus, lithographic apparatus and device manufacturing method
A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
1. A support apparatus for a lithographic apparatus, the support apparatus comprising:
an object holder configured to support an object; and
an extraction body outward of the object holder and arranged to partially extend under a peripheral edge of the object when supported by the object holder, the extraction body comprising a first opening and a second opening, each of the first and second openings configured to extract fluid through a gap, at an upper surface of the support apparatus, between the extraction body and the object when supported on the object holder, wherein the extraction body is essentially mechanically and thermally decoupled from the object holder.
2. The support apparatus of claim 1 , wherein the second opening is in fluid communication with an under pressure.
3. The support apparatus of claim 1 , wherein the first opening is arranged inward, relative to a center of the object holder, of the second opening and located underneath the object when supported on the object holder.
4. The support apparatus of claim 1 , wherein the extraction body is spaced from the object holder by a gap such that the extraction body is essentially mechanically and thermally decoupled from the object holder.
5. The support apparatus of claim 1 , wherein the extraction body is connected to the object holder by a seal material.
6. The support apparatus of claim 1 , wherein the extraction body is connected to the object holder by a plurality of peripherally spaced joints.
7. The support apparatus of claim 1 , wherein an extent of overlap between an inner peripheral region of the extraction body and an outer peripheral region of the object, when supported on the object holder, is in a range from about 0.5 mm to about 3 mm.
8. The support apparatus of claim 1 , wherein the extraction body further comprises a thermal conditioning system configured to control a temperature of the extraction body.
9. A device manufacturing method using a lithographic apparatus, the method comprising:
supporting a substrate on a support apparatus, the support apparatus comprising an object holder supporting the substrate, and an extraction body outward of the object holder and partially extending under a peripheral edge of the substrate, the extraction body comprising a first opening and a second opening and the extraction body is essentially mechanically and thermally decoupled from the object holder;
extracting fluid using the first and second openings through a gap, at an upper surface of the support apparatus, between the extraction body and the substrate; and
projecting a beam onto the substrate.
10. The method of claim 9 , wherein the first opening is arranged inward, relative to a center of the object holder, of the second opening and located underneath the substrate.
11. The method of claim 9 , wherein the extraction body is spaced from the object holder by a gap such that the extraction body is essentially mechanically and thermally decoupled from the object holder.
12. The method of claim 9 , further comprising controlling a temperature of the extraction body using a thermal conditioning system of the extraction body.
13. The method of claim 9 , wherein the extraction body is connected to the object holder by a plurality of peripherally spaced joints.
14. A lithographic apparatus, comprising:
a pattern transfer system configured to transfer a pattern onto a substrate;
a fluid handling system configured to provide a fluid to a space between the projection system and the substrate;
an object holder configured to support an object; and
an extraction body outward of the object holder and arranged to partially extend under a peripheral edge of the object when supported by the object holder, the extraction body comprising a first opening and a second opening, each of the first and second openings configured to extract fluid through a gap, at an upper surface, between the extraction body and the object when supported on the object holder, wherein the extraction body is essentially mechanically and thermally decoupled from the object holder.
15. The apparatus of claim 14 , wherein the second opening is in fluid communication with an under pressure.
16. The apparatus of claim 14 , wherein the first opening is arranged inward, relative to a center of the object holder, of the second opening and located underneath the object when supported on the object holder.
17. The apparatus of claim 14 , wherein the extraction body is spaced from the object holder by a gap such that the extraction body is essentially mechanically and thermally decoupled from the object holder.
18. The apparatus of claim 14 , wherein the extraction body is connected to the object holder by a seal material.
19. The apparatus of claim 14 , wherein the extraction body is connected to the object holder by a plurality of peripherally spaced joints.
20. The apparatus of claim 14 , wherein the extraction body further comprises a thermal conditioning system to control a temperature of the extraction body.