Electron beam device
The present invention provides an electron beam device that achieves high spatial resolution and high luminance, while remaining insusceptible to the effects of external disturbance. The present invention relates to an electron beam device, wherein, between, e.g., an electron source for generating an electron beam and an objective lens for focusing the electron beam onto a sample, a high voltage beam tube is disposed close to the electron source and a low voltage beam tube is disposed close to the objective lens. This makes it possible to achieve high luminance while maintaining spatial resolution, even with an SEM that is provided with a type of objective lens that actively leaks a magnetic field onto a sample.
1. An electron beam device including
an electron source for generating an electron beam, and
an objective lens for focusing the electron beam onto a sample, the device comprising:
a first beam tube capable of setting a voltage close to the electron source, and a second beam tube capable of setting a voltage different from the first beam tube close to the objective lens between the electron source and an undersurface of the objective lens,
wherein the objective lens is a semi-in-lens type lens or a single-pole lens type lens,
an out-lens type objective lens is provided in addition to the semi-in-lens type or the single-pole lens type objective lens, and
the mode in which the voltage of the first beam tube becomes higher than the voltage of the second beam tube is selected when the semi-in-lens type or the single-pole lens type objective lens is used.
2. The electron beam device according to claim 1 ,
wherein the input device can select a mode in which the voltage of the first beam tube becomes the same as the voltage of the second beam tube when the out-lens type objective lens is used.
3. The electron beam device according to claim 1 ,
wherein the mode in which voltage is applied only to the first beam tube is selected when the semi-in-lens type or the single-pole lens type objective lens is used, and
the mode in which voltage is applied to the first and the second beam tubes is selected when the out-lens type objective type is used.
4. The electron beam device according to claim 3 ,
wherein the mode in which a potential of the first beam tube becomes the same potential as a potential of the second beam tube is selected when the out-lens type objective lens is used.
5. The electron beam device according to claim 1 , further comprising:
an ion beam device irradiating the sample with an ion beam.
6. The electron beam device according to claim 1 ,
wherein the second beam tube is arranged inside the objective lens.
7. The electron beam device according to claim 1 ,
wherein a potential of the second beam tube is a GND potential.
8. The electron beam device according to claim 1 ,
wherein a creepage distance between the first beam tube and the second beam tube is 5 mm or more.
9. An electron beam device comprising:
an electron source for generating an electron beam;
a first beam tube and a second beam tube through which the electron beam generated from the electron source passes;
a deceleration part for decelerating electrons generated from the electron source; and
an objective lens for focusing the electron beam onto a sample,
wherein the deceleration part is disposed between the electron source and a magnetic pole of the objective lens, and
the deceleration part is disposed between the first beam tube and second beam tube.
10. The electron beam device according to claim 9 ,
wherein a shape of electrodes in the deceleration part is a cone shape, a bowl shape or a frustum shape.
11. The electron beam device according to claim 9 ,
wherein the deceleration part includes two electrodes, having a shape in which one electrode covers the other electrode.
12. An electron beam device including
an electron source for generating an electron beam,
a condenser lens for focusing the electron beam generated from the electron source,
an objective lens for focusing the electron beam passing through the condenser lens onto a sample,
a first beam tube arranged between the electron source and the objective lens, and a second beam tube arranged between the first beam tube and the sample,
wherein the objective lens is a semi-in-lens type lens or a single-pole lens type lens,
an out-lens type objective lens is provided in addition to the semi-in-lens type or the single-pole lens type objective lens, and
the mode in which the voltage of the first beam tube becomes higher than the voltage of the second beam tube is selected when the semi-in-lens type or the single-pole lens type objective lens is used.
13. An electron beam device including
an electron source for generating an electron beam, and
an objective lens for focusing the electron beam generated from the electron source onto a sample, the device comprising:
a detector having a third beam tube through which the electron beam generated from the electron source passes, and an electron receiving surface through which the third beam tube penetrates, detecting electrons emitted from a sample; and
a first beam tube and a second beam tube in which energy generated when the electron beam generated from the electron source passes through the third beam tube is higher than energy of the electron beam generated when passing through the objective lens.
14. The electron beam device according to claim 13 ,
wherein the objective lens is a semi-in-lens type lens or a single-pole lens type lens which leaks a magnetic field onto the sample's side.
15. The electron beam device according to claim 14 ,
wherein an out-lens type objective lens which does not leak the magnetic field onto the sample's side is provided in addition to the semi-in-lens type or the single-pole lens type objective lens.
16. The electron beam device according to claim 14 , further comprising:
an ion beam device irradiating the sample with an ion beam.
17. An electron beam device comprising:
an electron source for generating an electron beam;
a first beam tube and a second beam tube through which the electron beam generated from the electron source passes;
an objective lens for focusing the electron beam generated from the electron source onto a sample;
a detector for detecting electrons emitted from the sample and arranged in the outside of an optical axis; and
a deflector for deflecting the electrons emitted from the sample toward the detector arranged in the outside of the optical axis,
wherein the first beam tube is arranged between the electron source and the detector, and the second beam tube is arranged between the detector and an undersurface of the objective lens, and
energy generated when the electron beam generated from the electron source passes through the first beam tube is higher than energy of the electron beam generated when passing through the second beam tube.
18. The electron beam device according to claim 17 ,
wherein the objective lens is a semi-in-lens type lens or a single-pole lens type lens which leaks a magnetic field onto the sample's side.
19. The electron beam device according to claim 18 ,
wherein an out-lens type objective lens which does not leak the magnetic field onto the sample's side is provided in addition to the semi-in-lens type or the single-pole lens type objective lens.
20. The electron beam device according to claim 18 , further comprising:
an ion beam device irradiating the sample with an ion beam.