Touch display panel, manufacturing method, display device and touch substrate
A touch display panel, a manufacturing method, a display device and a touch substrate are provided. The touch display panel, comprising a display region and a non-display region surrounding the display region; the display region includes a base substrate and a touch function layer arranged on the base substrate; the non-display region includes the base substrate, and a white light-shielding layer and a reflection enhancing layer which are sequentially arranged on the base substrate, and the reflection enhancing layer is configured for increasing reflectivity of the touch display panel with respect to incident rays; the touch function layer, the white light-shielding layer and the reflection enhancing layer are located on a same side of the base substrate. The touch display panel can improve brightness of appearance of a white OGS touch screen.
1. A touch display panel, comprising:
a display region and
a non-display region surrounding the display region, wherein
the display region comprises a base substrate and a touch function layer arranged on the base substrate;
the non-display region comprises the base substrate, and a white light-shielding layer and a reflection enhancing layer which are sequentially arranged on the base substrate, and the reflection enhancing layer is configured for increasing reflectivity of the touch display panel with respect to incident rays; and
the touch function layer, the white light-shielding layer and the reflection enhancing layer are located on a same side of the base substrate.
2. The touch display panel according to claim 1 , wherein the reflection enhancing layer comprises a first layer structure arranged on the base substrate and a second layer structure arranged on a side of the first layer structure away from the base substrate, and a reflective index of the first layer structure is greater than a reflective index of the second layer structure.
3. The touch display panel according to claim 1 , wherein the reflection enhancing layer comprises:
a first layer structure formed of niobium pentoxide, and
a second layer structure located on the first layer structure and formed of silicon dioxide.
4. The touch display panel according to claim 1 , wherein a reflective index of the reflection enhancing layer is 1.6 - 2.5.
5. The touch display panel according to claim 4 , wherein the reflection enhancing layer is a silicon oxynitride layer.
6. The touch display panel according to claim 1 , further comprising a black light-shielding layer, wherein the black light-shielding layer is arranged on the reflection enhancing layer.
7. The touch display panel according to claim 6 , wherein a material of the black light-shielding layer is a black photoresist material.
8. The touch display panel according to claim 7 , wherein a material of the white light-shielding layer is a white photoresist material.
9. The touch display panel according to claim 6 , wherein a material of the black light-shielding layer is black ink.
10. The touch display panel according to claim 9 , wherein a material of the white light-shielding layer is white ink.
11. The touch display panel according to claim 1 , wherein a material of the white light-shielding layer is a white photoresist material or white ink.
12. A display device, comprising the touch display panel according to claim 1 .
13. A manufacturing method of a touch display panel, comprising:
forming a white light-shielding layer on a base substrate, wherein the white light-shielding layer is located in a non-display region of the touch display panel;
forming a reflection enhancing layer on the white light-shielding layer, wherein the reflection enhancing layer is configured for increasing reflectivity of the touch display panel with respect to incident rays; and
forming a touch function layer on the base substrate by a patterning process, wherein the touch function layer is located in a display region of the touch display panel,
wherein the touch function layer, the white light-shielding layer and the reflection enhancing layer are located on a same side of the base substrate.
14. The method according to claim 13 , wherein the non-display region surrounds the display region.
15. The method according to claim 13 , wherein forming the reflection enhancing layer comprises:
forming a first structure layer with niobium pentoxide on the base substrate where the white light-shielding layer is formed; and
forming a second structure layer with silicon dioxide on the base substrate where the first structure layer is formed.
16. The method according to claim 13 , wherein, before forming the touch function layer, the method further comprises:
forming a black light-shielding layer on the base substrate where the reflection enhancing layer is formed.
17. The method according to claim 16 , wherein a layer of black photoresist material is formed on the base substrate where the reflection enhancing layer is formed, and the black light-shielding layer is formed by a photolithography process.
18. The method according to claim 13 , wherein a layer of white photoresist material is formed on the base substrate, and the white light-shielding layer is formed by a photolithography process.
19. The method according to claim 13 , wherein a layer of white photoresist material is formed on the base substrate, and the white light-shielding layer is formed by a photolithography process; or
white ink is printed on the base substrate by a screen printing process so as to form the white light-shielding layer.
20. A touch substrate, comprising:
a touch region and
a non-touch region surrounding the touch region, wherein
the touch region comprises a base substrate and a touch function layer arranged on the base substrate;
the non-touch region comprises a base substrate, and a white light-shielding layer and a reflection enhancing layer which are sequentially arranged on the base substrate, and the reflection enhancing layer is configured for increasing reflectivity of a touch display panel on an incident ray; and
the touch function layer, the white light-shielding layer and the reflection enhancing layer are located on a same side of the base substrate.