Charged particle beam device and detection method using said device
View Patent ↗In the present invention, a charged particle beam device has a charged particle source ( 1 ), a first condenser lens ( 4 ) arranged downstream from the charged particle source ( 1 ), an aperture ( 5 ) arranged downstream from the first condenser lens ( 4 ), and a second condenser lens ( 6 ) arranged downstream from the aperture ( 5 ), wherein, when a sample ( 12 ) is to be irradiated at a second charged particle beam amount which is greater than a first charged particle beam amount, the first and second condenser lenses are controlled such that a charged particle beam is formed downstream from the aperture ( 5 ), and such that the focal point of the second condenser lens does not vary between the first charged particle beam amount and the second charged particle beam amount.
1. A charged particle beam apparatus comprising:
a charged particle source;
a first condenser lens that is provided on a downstream side of the charged particle source;
a diaphragm that is provided on a downstream side of the first condenser lens;
a second condenser lens that is provided on a downstream side of the diaphragm;
an objective lens that is provided on a downstream side of the second condenser lens;
a detector that detects an information signal generated from a sample due to irradiation with a charged particle beam; and
a controller that controls the first and second condenser lenses so that a charged particle beam is imaged on the downstream side of the diaphragm in a case where the sample is irradiated with a second charged particle dose larger than a first charged particle dose, and a focal point position of the second condenser lens is not changed at the first charged particle dose and the second charged particle dose.
2. The charged particle beam apparatus according to claim 1 ,
wherein the controller controls the first condenser lens so that a charged particle beam is imaged on an upstream side of the diaphragm in a case where the sample is irradiated with the first charged particle dose.
3. The charged particle beam apparatus according to claim 1 ,
wherein the controller obtains a control value of the second condenser lens through computation according to a control value of the first condenser lens.
4. The charged particle beam apparatus according to claim 1 ,
wherein the controller obtains a control value of the second condenser lens corresponding to a control value of the first condenser lens by retrieving a table in which a correspondence relationship between the control value of the first condenser lens and the control value of the second condenser lens is stored.
5. The charged particle beam apparatus according to claim 1 ,
wherein the controller obtains a control value of the first condenser lens and a control value of the second condenser lens on the basis of a charged particle dose or an optical mode to be used.
6. The charged particle beam apparatus according to claim 1 ,
wherein the controller controls the first condenser lens by using a control value corresponding to a charged particle dose or an optical mode to be used.
7. The charged particle beam apparatus according to claim 1 ,
wherein the controller controls the first condenser lens by using a control value which is common to a plurality of charged particle doses or optical modes, and controls the second condenser lens by using a control value corresponding to a charged particle dose or an optical mode to be used.
8. The charged particle beam apparatus according to claim 1 ,
wherein, in a case where the sample is irradiated with the second charged particle dose, the controller controls the first and second condenser lenses so as to suppress an increase in an opening angle of a charged particle beam applied to the sample.
9. The charged particle beam apparatus according to claim 1 ,
wherein the controller displays, on a screen, an input column for individually designating an electron dose used for observation for each of two or more observation locations in the sample.
10. The charged particle beam apparatus according to claim 1 ,
wherein the controller displays, on a screen, an input column for individually designating an electron dose used for observation for each of two or more partial regions in the same visual field.
11. An inspection method for a charged particle beam apparatus including a charged particle source; a first condenser lens that is provided on a downstream side of the charged particle source; a diaphragm that is provided on a downstream side of the first condenser lens; a second condenser lens that is provided on a downstream side of the diaphragm; an objective lens that is provided on a downstream side of the second condenser lens; a detector that detects an information signal generated from a sample due to irradiation with a charged particle beam; and a controller, the method comprising:
causing the controller to perform process of controlling the first and second condenser lenses so that a charged particle beam is imaged on the downstream side of the diaphragm in a case where the sample is irradiated with a second charged particle dose larger than a first charged particle dose, and a focal point position of the second condenser lens is not changed at the first charged particle dose and the second charged particle dose.
12. The inspection method according to claim 11 ,
wherein a process of controlling the first condenser lens is performed so that a charged particle beam is imaged on an upstream side of the diaphragm in a case where the sample is irradiated with the first charged particle dose.
13. The inspection method according to claim 11 ,
wherein, in a case where the sample is irradiated with the second charged particle dose, a process of controlling the first and second condenser lenses is performed so that an increase in an opening angle of a charged particle beam applied to the sample is suppressed.
14. The inspection method according to claim 11 ,
wherein a process of displaying, on a screen, an input column for individually designating an electron dose used for observation for each of two or more observation locations in the sample, is performed.
15. The inspection method according to claim 11 ,
wherein a process of displaying, on a screen, an input column for individually designating an electron dose used for observation for each of two or more partial regions in the same visual field, is performed.