Method of manufacturing diamond substrate, diamond substrate, and diamond composite substrate
A method of manufacturing a diamond substrate includes: forming an ion implantation layer at a side of a main surface of a diamond seed substrate by implanting ions into the main surface of the diamond seed substrate; producing a diamond structure by growing a diamond growth layer by a vapor phase synthesis method on the main surface of the diamond seed substrate, after implanting the ions; and performing heat treatment on the diamond structure. The performed heat treatment causes the diamond structure to be separated along the ion implantation layer into a first structure including the diamond seed substrate and failing to include the diamond growth layer, and a diamond substrate including the diamond growth layer. Thus, the method of manufacturing a diamond substrate is provided that enables a diamond substrate with a large area to be manufactured in a short time and at a low cost.
1. A diamond substrate of a single crystal,
a photoluminescence spectrum of the diamond substrate including
a first emission peak having an emission peak wavelength in a wavelength range of not less than 450 nm and not more than 650 nm, and
a second emission peak having an emission peak wavelength in a wavelength range of not less than 570 nm and not more than 580 nm,
the photoluminescence spectrum being obtained by applying, to the diamond substrate, excitation light having a peak wavelength in a wavelength range of not less than 315 nm and not more than 335 nm at a temperature in a temperature range of not less than 7 K and not more than 83 K,
the first emission peak having a full width at half maximum of not less than 50 nm,
the second emission peak having a full width at half maximum of not more than 10 nm, and
a peak height of the first emission peak being not less than 0.1 times as high as a peak height of the second emission peak.
2. The diamond substrate according to any one of claims 1 , wherein the diamond substrate includes: a first surface; and a second surface located opposite to the first surface, the second surface is a physically polished surface.
3. The diamond substrate according to claim 1 , wherein the diamond substrate has a thickness of not less than 100 μm and not more than 1500 μm.
4. The diamond substrate according to claim 1 , wherein the diamond substrate has a diameter of not less than 50.8 mm.
5. The diamond substrate according to claim 1 , wherein the diamond substrate includes a layer having a resistivity of not less than 10 −5 Ω·cm and not more than 10 9 Ω·cm, or the diamond substrate is a substrate having a resistivity of not less than 10 −5 Ω·cm and not more than 10 9 Ω·cm.
6. A diamond composite substrate comprising:
a diamond substrate as recited in claim 1 ; and
an epitaxial layer formed through epitaxial growth on at least one of a first surface of the diamond substrate and a second surface of the diamond substrate located opposite to the first surface.