Electrode structure for touch panel and method of fabricating the same
The present invention provides an electrode structure for a touch panel and a method for fabricating the same, in which a unit wire and another unit wire continued thereto are continued while the contact area between the unit wires decreases from the entire line width, thereby achieving irregular patterns. In the electrode structure for the touch panel and the method for fabricating the same, a metal wire formed with continuous unit wires has an irregular pattern where the contact area between any one unit wire and another unit wire continued thereto decreases, from the entire line width, by a non-contact size value k obtained by dividing a line width by an arbitrary real number.
1. An electrode structure for a touch panel, wherein the electrode structure comprises a metal wire having an irregular pattern,
wherein the metal wire consists of continuous unit wires, wherein respective unit wires have a length L and a width W m and have a first contact portion and a second contact portion that is opposite to the first contact portion, and wherein respective unit wires are in partial contact with their adjacent unit wires at the first contact portion and at the second contact portion, respectively, in lengthwise direction to form the continuous unit wires,
wherein the continuous unit wires comprise a first unit wire, and a second unit wire of which the first contact portion is in partial contact with the second contact portion of the first unit wire,
wherein an amount of the partial contact between the first contact portion of the second unit wire and the second contact portion of the first unit wire is W m −k,
wherein
k=W m /r
wherein the k is consistent throughout the continuous unit wires; and
wherein when W m ≤3 μm: 1.33≤r≤5 and 0.25≤(W m −k)/W m ≤0.8 are satisfied, and
when W m >3 μm: 1.35≤r≤4 and 0.26≤(W m −k)/W m ≤0.75 are satisfied.
2. The electrode structure of claim 1 , wherein the metal wire repeatedly intersects another metal wires, thereby forming a mesh pattern.
3. The electrode structure of claim 1 , wherein the respective unit wires are a regular square having a side length equal to the width W m of the metal wire.
4. The electrode structure of claim 1 , wherein the continuous unit wires further comprise a third unit wire of which first contact portion is in partial contact with the second contact portion of the second unit wire, wherein the partial contact between the third unit wire and the second unit wire exist in a side opposite from the partial contact between the first unit wire and the second unit wire so as to form a zig-zag configuration of the continuous unit wires.
5. The electrode structure of claim 1 , wherein the continuous unit wires further comprise a third unit wire of which first contact portion is in partial contact with the second contact portion of the second unit wire, wherein the partial contact between the third unit wire and the second unit wire exist in a same side as the partial contact between the first unit wire and the second unit wire so as to form a tilted line configuration of the continuous unit wires.
6. The electrode structure of claim 1 , wherein the continuous unit wires comprises a first region and a second region, and
in the first region, the continuous unit wires further comprise a third unit wire of which first contact portion is in partial contact with the second contact portion of the second unit wire, wherein the partial contact between the third unit wire and the second unit wire exist in a same side as the partial contact between the first unit wire and the second unit wire so as to form one tilted line configuration of the continuous unit wires, and
in the second region, the continuous unit wires comprise another tilted line configuration opposite from the one tilted line configuration in the first region.
7. A method for fabricating an electrode structure for a touch panel, the method comprising:
forming a metal layer on a substrate; and
forming metal wires constituting a mesh pattern by patterning the metal layer using a photomask in which a mesh pattern is formed,
wherein a metal wire consisting of continuous unit wires has an irregular pattern, wherein respective unit wires have a length L and a width W m and are in contact with their adjacent unit wires in lengthwise direction to form the continuous unit wires,
wherein the continuous unit wires comprise a first unit wire, and a second unit wire of which the first contact portion is in partial contact with the second contact portion of the first unit wire,
wherein an amount of the partial contact between the first contact portion of the second unit wire and the second contact portion of the first unit wire is W m −k,
wherein
k=W m /r,
wherein the k is consistent throughout the continuous unit wires; and
wherein when W m ≤3 μm: 1.33≤r≤5 and 0.25≤(W m −k)/W m ≤0.8 are satisfied, and
when W m >3 μm: 1.35≤r≤4 and 0.26≤(W m −k)/W m ≤0.75 are satisfied.
8. The method of claim 7 , wherein, in the forming of the metal wires constituting the mesh pattern by patterning the metal layer, the metal layer is patterned so that the continuous unit wires further comprise a third unit wire of which first contact portion is in partial contact with the second contact portion of the second unit wire, wherein the partial contact between the third unit wire and the second unit wire exist in a side opposite from the partial contact between the first unit wire and the second unit wire so as to form a zig-zag configuration of the continuous unit wires.
9. The method of claim 7 , wherein, in the forming of the metal wires constituting the mesh pattern by patterning the metal layer, the metal layer is patterned so that the continuous unit wires further comprise a third unit wire of which first contact portion is in partial contact with the second contact portion of the second unit wire, wherein the partial contact between the third unit wire and the second unit wire exist in a same side as the partial contact between the first unit wire and the second unit wire so as to form a tilted line configuration of the continuous unit wires.
10. The method of claim 7 , wherein, in the forming of the metal wires constituting the mesh pattern by patterning the metal layer, the metal layer is patterned so that the continuous unit wires comprise a first region and a second region, and in the first region, the continuous unit wires further comprise a third unit wire of which first contact portion is in partial contact with the second contact portion of the second unit wire, wherein the partial contact between the third unit wire and the second unit wire exist in a same side as the partial contact between the first unit wire and the second unit wire so as to form one tilted line configuration of the continuous unit wires, in the second region, the continuous unit wires comprise another tilted line configuration opposite from the one tilted line configuration in the first region.