Oxide dielectric and method for manufacturing same, and solid state electronic device and method for manufacturing same
There are provided an oxide dielectric having excellent properties and a solid state electronic device (e.g., a capacitor, a semiconductor device, or a small electromechanical system) having such an oxide dielectric. An oxide layer 30 includes an oxide dielectric (possibly including inevitable impurities) including bismuth (Bi) and niobium (Nb) and having a first crystal phase of a pyrochlore-type crystal structure and a second crystal phase of a β-BiNbO 4 -type crystal structure. The oxide layer 30 has a controlled content of the first crystal phase and a controlled content of the second crystal phase, in which the first crystal phase has a dielectric constant that decreases with increasing temperature of the oxide layer 30 in a temperature range of 25° C. or more and 120° C. or less, and the second crystal phase has a dielectric constant that increases with increasing temperature of the oxide layer 30 in the temperature range.
1. An oxide dielectric being an oxide (possibly including inevitable impurities) consisting essentially of bismuth (Bi), niobium (Nb), and oxygen, the oxide dielectric comprising:
a first crystal phase of a pyrochlore-type crystal structure; and
a second crystal phase of a β-BiNbO 4 -type crystal structure,
the oxide dielectric having a controlled content of the first crystal phase and a controlled content of the second crystal phase,
wherein the first crystal phase has a dielectric constant that decreases with increasing temperature of the oxide in a temperature range of 25° C. or more and 120° C. or less, and
the second crystal phase has a dielectric constant that increases with increasing temperature of the oxide in the temperature range.
2. An oxide dielectric being an oxide (possibly including inevitable impurities) consisting essentially of bismuth (Bi), niobium (Nb), and oxygen, the oxide dielectric comprising:
a first crystal phase of a pyrochlore-type crystal structure; and
a second crystal phase of a β-BiNbO 4 -type crystal structure,
wherein a content of the second crystal phase is 1.43 or more and 4.67 or less when a content of the first crystal phase is assumed to be 1.
3. The oxide dielectric according to claim 1 , further comprising:
a third crystal phase of a Bi 3 NbO 7 -type crystal structure and an amorphous phase,
wherein a sum of the contents of the first and second crystal phases is more than 40% of a whole of the oxide.
4. The oxide dielectric according to claim 1 , which has a dielectric constant of 54 or more and 140 or less.
5. A solid state electronic device comprising the oxide dielectric according to claim 1 .
6. The solid state electronic device according to claim 5 , which is one selected from the group consisting of a capacitor, a semiconductor device, and a small electromechanical system.
7. A method for manufacturing an oxide dielectric, the method comprising:
a heating step of heating, in an oxygen-containing atmosphere, a precursor derived from a precursor solution, as a starting material, comprising a bismuth (Bi)-containing precursor and a niobium (Nb)-containing precursor as solutes, to form an oxide (possibly including inevitable impurities) consisting essentially of bismuth (Bi), niobium (Nb), and oxygen, and to control contents of a first crystal phase of a pyrochlore-type crystal structure and a second crystal phase of a β-BiNbO 4 -type crystal structure, the oxide comprising:
the first crystal phase of the pyrochlore-type crystal structure having a dielectric constant that decreases with increasing temperature of the oxide in a temperature range of 25° C. or more and 120° C. or less; and
the second crystal phase of the β-BiNbO 4 -type crystal structure having a dielectric constant that increases with increasing temperature of the oxide in a temperature range of 25° C. or more and 120° C. or less.
8. A method for manufacturing an oxide dielectric, the method comprising:
a heating step performed in such a manner that a content of a second crystal phase of a β-BiNbO 4 -type crystal structure is controlled to be 1.43 or more and 4.67 or less when a content of a first crystal phase of a pyrochlore-type crystal structure is assumed to be 1, by heating, in an oxygen-containing atmosphere, a precursor derived from a precursor solution, as a starting material, comprising a bismuth(Bi)-containing precursor and a niobium (Nb)-containing precursor as solutes, to form an oxide (possibly including inevitable impurities) consisting essentially of bismuth (Bi), niobium (Nb), and oxygen, the oxide comprising:
the first crystal phase of the pyrochlore-type crystal structure; and
the second crystal phase of the β-BiNbO 4 -type crystal structure.
9. The method according to claim 7 , wherein the oxide formed by the heating step further comprises a third crystal phase of a Bi 3 NbO 7 -type crystal structure and an amorphous phase, and
a sum of the contents of the first and second crystal phases is controlled to be more than 40% of a whole of the oxide.
10. The method according to claim 7 , further comprising a step of imprinting a layer of the precursor while heating the layer of the precursor in an oxygen-containing atmosphere at 80° C. or more and 150° C. or less so that an imprinted structure of the precursor is formed, before forming a layer of the oxide dielectric.
11. A method for manufacturing a solid state electronic device, the method comprising manufacturing a solid state electronic device comprising the oxide dielectric according to claim 7 .
12. The oxide dielectric according to claim 2 , further comprising: a third crystal phase of a Bi 3 NbO 7 -type crystal structure and an amorphous phase,
wherein a sum of the contents of the first and second crystal phases is more than 40% of a whole of the oxide.
13. The oxide dielectric according to claim 2 , which has a dielectric constant of 54 or more and 140 or less.
14. A solid state electronic device comprising the oxide dielectric according to claim 2 .
15. The solid state electronic device according to claim 14 , which is one selected from the group consisting of a capacitor, a semiconductor device, and a small electromechanical system.
16. The method according to claim 8 , wherein the oxide formed by the heating step further comprises a third crystal phase of a Bi 3 NbO 7 -type crystal structure and an amorphous phase, and
a sum of the contents of the first and second crystal phases is controlled to be more than 40% of a whole of the oxide.
17. The method according to claim 8 , further comprising a step of imprinting a layer of the precursor while heating the layer of the precursor in an oxygen-containing atmosphere at 80° C. or more and 150° C. or less so that an imprinted structure of the precursor is formed, before forming a layer of the oxide dielectric.
18. A method for manufacturing a solid state electronic device, the method comprising manufacturing a solid state electronic device comprising the oxide dielectric according to claim 8 .