IP Library › Granted Patent US 10,256,276
Granted Patent B2
US 10,256,276 · App. 15/333,171 · Granted Apr 9, 2019

Hybrid high electron mobility transistor and active matrix structure

Inventors: Ali Afzali-Ardakani (Ossining, NY); Bahman Hekmatshoartabari (White Plains, NY); Devendra K. Sadana (Pleasantville, NY); Davood Shahrjerdi (White Plains, NY)
Assignee: International Business Machines Corporation
H01L27/286H01L27/1214H01L27/1251H01L27/3274H01L29/408H01L29/435H01L29/66431H01L29/778H01L29/7786H01L51/0508H01L51/0529H01L51/0541H01L51/0558H01L51/0562H01L51/0587H01L51/105H01L51/107H05B33/0896H05B37/0209H01L27/1218H01L27/1225H01L27/3244H01L29/432H01L29/78603H01L29/78654
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Quick Facts
Patent No.
US 10,256,276
App. No.
15/333,171
Granted
Apr 9, 2019
Kind
B2
Abstract

Hybrid high electron mobility field-effect transistors including inorganic channels and organic gate barrier layers are used in some applications for forming high resolution active matrix displays. Arrays of such high electron mobility field-effect transistors are electrically connected to thin film switching transistors and provide high drive currents for passive devices such as organic light emitting diodes. The organic gate barrier layers are operative to suppress both electron and hole transport between the inorganic channel layer and the gate electrodes of the high electron mobility field-effect transistors.

Claims (13)

1. A structure comprising:

an array of high electron mobility field-effect transistors, each of the high electron mobility field-effect transistors including:

an inorganic semiconductor layer;

a gate electrode;

first and second ohmic contacts operatively associated with the inorganic semiconductor layer, and

a gate barrier layer operatively associated with the gate electrode, the gate barrier layer being positioned between the gate electrode and the inorganic semiconductor layer and operative to suppress electron and hole transport between the inorganic semiconductor layer and the gate electrode, the gate barrier layer including a first organic semiconductor layer comprising a first material for blocking holes and a second organic semiconductor layer comprised of a second material for blocking electrons, the first material being different from the second material;

an array of thin film switching transistors, each of the thin film switching transistors being electrically connected to one of the high electron mobility field-effect transistors, and

an array of electronic devices, each of the electronic devices being electrically connected to one of the high electron mobility field-effect transistors.

2. The structure of claim 1 , wherein the first organic semiconductor layer is positioned between the gate electrode and the second organic semiconductor layer.

3. The structure of claim 2 , further including an organic passivation layer between the inorganic semiconductor layer and the gate barrier layer.

4. The structure of claim 2 , wherein the array of electronic devices includes organic light emitting diodes.

5. The structure of claim 1 , wherein each of the high electron mobility field-effect transistors is configured as an inversion-type high electron mobility field-effect transistor.

6. The structure of claim 1 , wherein each of the high electron mobility field-effect transistors is configured as an accumulation-type high electron mobility field-effect transistor.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 24, 2016
From: AFZALI-ARDAKANI, ALI; HEKMATSHOARTABARI, BAHMAN; SADANA, DEVENDRA K.; SHAHRJERDI, DAVOOD
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 040107/0021 →
Continuity (2)
Division 14697596 · Apr 27, 2015
Related Publication 20170047378A1 · Feb 16, 2017