Hard surface cleaning composition and method of improving drying time using the same

1. A hard surface cleaning composition comprising:

0.03 wt. % to 0.06 wt. % amine oxide;

0.30 wt. % to 0.70 wt. % of a glycol ether having an HLB between 6.5 and 7.0; and

at least 97 wt. % water, by weight of the overall composition; and

from about 0.001 wt % to about 0.015 wt % of an esterified alkyl alkoxylated nonionic surfactant.

2. The composition of claim 1 , wherein the glycol ether having an HLB between 6.5 and 7.0 is selected from the group consisting of: propylene glycol n-butyl ether, dipropylene glycol n-butyl ether, and combinations thereof.

3. The composition of claim 1 comprising less than 0.5 wt. % ethanol.

4. The composition of claim 1 , wherein the composition further comprises 0.001 wt % to about 0.015 wt % of an ethoxylated alkoxylated nonionic surfactant or 0.001 wt % to about 0.015 wt % of a copolymer, wherein the copolymer comprises:

i. from 60 to 99% by weight of at least one monoethylenically unsaturated polyalkylene oxide monomer of the formula III (monomer A)

in which the variables have the following meanings:

X is —CH 2 — or —CO—, if Y is —O—;

is —CO—, if Y is —NH—;

Y is —O— or —NH—;

R 1 is hydrogen or methyl;

R 2 are identical or different C2-C6-alkylene radicals;

R 3 is H or C1-C4 alkyl;

n is an integer from 5 to 100,

ii. from 1 to 40% by weight of at least one quaternized nitrogen-containing monomer, selected from the group consisting of at least one of the monomers of the formula IVa to IVd (monomer B)

in which the variables have the following meanings:

R is C1-C4 alkyl or benzyl;

R′ is hydrogen or methyl;

Y is —O— or —NH—;

A is C1-C6 alkylene;

X is halide, C1-C4-alkyl sulfate, C1-C4-alkylsulfonate and C1-C4-alkyl carbonate,

iii. from 0 to 15% by weight of at least one anionic monoethylenically unsaturated monomer (monomer C), and

iv. from 0 to 30% by weight of at least one other non-ionic monoethylenically unsaturated monomer (monomer D),

wherein:

if monomer C is present, the molar ratio of monomer B to monomer C is greater than 1, and the copolymer has a weight average molecular weight (Mw) from 20,000 g/mol to 500,000 g/mol.

5. The composition of claim 1 , wherein the composition further comprises from about 0.01 wt % to about 0.08 wt % of a quaternary compound selected from the group consisting of a C6-C18 alkyltrimethylammonium chloride, a C6-C18 dialkyldimethylammonium chloride, and mixtures thereof.

6. The composition of claim 1 , wherein the composition has a pH in the range of 6 to 8.

7. A method of cleaning a hard surface with a low dry time, the method comprising the steps of:

wetting the hard surface with a cleaning composition, the cleaning composition comprising:

0.03 wt. % to 0.06 wt. % amine oxide;

0.30 wt. % to 0.70 wt. % of a glycol ether having an HLB between 6.5 and 7.0;

from about 0.001 wt. % to about 0.015 wt. % of an esterified alkyl alkoxylated nonionic surfactant; and

at least 97 wt. % water, by weight of the overall composition; and

removing the cleaning composition from the hard surface with a dry cleaning wipe or pad.

8. The method of claim 7 , wherein the glycol ether having an HLB between 6.5 and 7.0 is selected from the group consisting of: propylene glycol n-butyl ether, dipropylene glycol n-butyl ether, and combinations thereof.

9. The method of claim 7 comprising less than 0.5 wt. % ethanol.

10. The method of claim 7 , wherein the composition has a pH in the range of 6 to 8.

11. The method of claim 7 , wherein the composition further comprises 0.001 wt % to about 0.015 wt % of an ethoxylated alkoxylated nonionic surfactant or 0.001 wt % to about 0.015 wt % of a copolymer, wherein the copolymer comprises:

a. from 60 to 99% by weight of at least one monoethylenically unsaturated polyalkylene oxide monomer of the formula III (monomer A)

in which the variables have the following meanings:

X is —CH 2 — or —CO—, if Y is —O—;

is —CO—, if Y is —NH—;

Y is —O— or —NH—;

R 1 is hydrogen or methyl;

R 2 are identical or different C2-C6-alkylene radicals;

R 3 is H or C1-C4 alkyl;

n is an integer from 5 to 100,

b. from 1 to 40% by weight of at least one quaternized nitrogen-containing monomer, selected from the group consisting of at least one of the monomers of the formula IVa to IVd (monomer B)

in which the variables have the following meanings:

R is C1-C4 alkyl or benzyl;

R′ is hydrogen or methyl;

Y is —O— or —NH—;

A is C1-C6 alkylene;

X − is halide, C1-C4-alkyl sulfate, C1-C4-alkylsulfonate and C1-C4-alkyl carbonate,

c. from 0 to 15% by weight of at least one anionic monoethylenically unsaturated monomer (monomer C), and

d. from 0 to 30% by weight of at least one other non-ionic monoethylenically unsaturated monomer (monomer D),

wherein:

if monomer C is present, the molar ratio of monomer B to monomer C is greater than 1, and the copolymer has a weight average molecular weight (Mw) from 20,000 g/mol to 500,000 g/mol.

12. The method of claim 7 , wherein the composition further comprises from about 0.01 wt % to about 0.08 wt % of a quaternary compound selected from the group consisting of a C6-C18 alkyltrimethylammonium chloride, a C6-C18dialkyldimethylammonium chloride, and mixtures thereof.

13. A cleaning implement comprising:

a handle;

a plastic head;

a cleaning pad removably connectable with the plastic head;

a reservoir connected with or separated from the handle; and

a cleaning composition disposed in the reservoir, wherein the cleaning composition comprises: 0.03 wt. % to 0.06 wt. % amine oxide; 0.30 wt. % to 0.70 wt. % of a glycol ether having an HLB between 6.5 and 7.0; from about 0.001 wt % to about 0.015 wt % of an esterified alkyl alkoxylated nonionic surfactant; and at least 97 wt. % water, by weight of the overall composition.

14. The implement of claim 13 , wherein the glycol ether having an HLB between 6.5 and 7.0 is selected from the group consisting of: propylene glycol n-butyl ether, dipropylene glycol n-butyl ether, and combinations thereof.

15. The implement of claim 13 comprising less than 0.5 wt. % ethanol.

16. The implement of claim 13 , wherein the composition has a pH in the range of 6 to 8.