IP Library Granted Patent US 10,147,812
Granted Patent B2
US 10,147,812 · App. 15/342,858 · Granted Dec 4, 2018

Diode, semiconductor device, and MOSFET

Inventors: Yusuke Yamashita (Nagoya, JP); Satoru Machida (Nagakute, JP); Takahide Sugiyama (Nagakute, JP); Jun Saito (Nagoya, JP)
Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
H01L29/7813H01L27/0629H01L29/0619H01L29/0623H01L29/0642H01L29/0696H01L29/08H01L29/0847H01L29/0878H01L29/1095H01L29/1608H01L29/2003H01L29/36H01L29/407H01L29/7393H01L29/7397H01L29/7806H01L29/7839H01L29/8611H01L29/872H01L29/0692H01L29/0834H01L29/20H01L29/41766
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Quick Facts
Patent No.
US 10,147,812
App. No.
15/342,858
Granted
Dec 4, 2018
Kind
B2
Abstract

Disclosed is a technique capable of reducing loss at the time of switching in a diode. A diode disclosed in the present specification includes a cathode electrode, a cathode region made of a first conductivity type semiconductor, a drift region made of a low concentration first conductivity type semiconductor, an anode region made of a second conductivity type semiconductor, an anode electrode made of metal, a barrier region formed between the drift region and the anode region and made of a first conductivity type semiconductor having a concentration higher than that of the drift region, and a pillar region formed so as to connect the barrier region to the anode electrode and made of a first conductivity type semiconductor having a concentration higher than that of the barrier region. The pillar region and the anode are connected through a Schottky junction.

Claims (12)

1. A MOSFET comprising:

a drain electrode;

a drain region made of a first conductivity type semiconductor;

a drift region made of a low concentration first conductivity type semiconductor;

a body region made of a second conductivity type semiconductor;

a source region made of the first conductivity type semiconductor;

a source electrode made of metal;

a gate electrode opposite to the body region between the source region and the drift region via an insulating film;

a barrier region formed between the drift region and the body region and made of a first conductivity type semiconductor having a concentration higher than that of the drift region; and

a pillar region formed so as to connect the barrier region to the source electrode and made of a first conductivity type semiconductor having a concentration higher than that of the barrier region,

wherein the pillar region and the source electrode are connected through a Schottky junction.

2. The MOSFET according to claim 1 , further comprising an electric field progress preventing region formed between the barrier region and the drift region and made of the second conductivity type semiconductor.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 8, 2020
From: TOYOTA JIDOSHA KABUSHIKI KAISHA
To: DENSO CORPORATION
Reel/Frame 053727/0319 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 6, 2016
From: KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO
To: TOYOTA JIDOSHA KABUSHIKI KAISHA
Reel/Frame 040537/0639 →
Priority Claims (2)
JP 2011-164746 · Jul 27, 2011 · national
JP 2012-166576 · Jul 27, 2012 · national
Continuity (2)
Division 14113276
Related Publication 20170098700A1 · Apr 6, 2017