Integrated circuit design systems and methods
Methods for integrated circuit design are provided. In one embodiment, a method for determining a physical layout pattern includes accessing a layout pattern configuration graph. The graph includes layout pattern configurations meeting a circuit requirements. At least two of the layout pattern configurations are annotated with characteristics by analyzing sample layout patterns. An integrated circuit electrical design is partitioned into circuit design configurations. One of the circuit design configurations meets one of the circuit requirements. One of the layout pattern configurations is selected from the layout pattern configuration graph to meet the selected circuit requirements. In another embodiment, a method for determining a netlist for an integrated circuit electrical design is provided. In a further embodiment, a method for determining a tool configuration for a manufacturing process is provided.
1. A method, performed by one or more processors, for determining a physical layout pattern for an integrated circuit electrical design, the method comprising:
accessing a layout pattern configuration graph comprising a plurality of layout pattern configurations, wherein at least two of the plurality of layout pattern configurations of the layout pattern configuration graph are annotated with characteristics representing physical layout geometry;
partitioning the integrated circuit electrical design into a plurality of circuit design configurations including one specific circuit design configuration; and
selecting, based on the annotated characteristics of the physical layout geometry, one of the at least two of the plurality of layout pattern configurations from the layout pattern configuration graph, the selected one of the at least two of the plurality of layout configurations corresponding to the one specific circuit design configuration of the integrated circuit electrical design;
determining a manufacturing configuration for manufacturing an integrated circuit, the manufacturing configuration comprising the physical layout pattern of the integrated circuit electrical design including the selected one of the at least two of the plurality of layout pattern configurations; and
manufacturing the integrated circuit using the determined manufacturing configuration;
wherein the accessing comprises defining at least one of the plurality of layout pattern configurations as at least one two-dimensional grid with rows and columns, wherein grid cells of the two-dimensional grid are defined as completely filled or completely empty; and
wherein the at least two of the plurality of layout pattern configurations of the layout pattern configuration graph are annotated with the characteristics representing the physical layout geometry by:
identifying the at least one two-dimensional grid in at least one of the at least two of the plurality of layout pattern configurations of the layout pattern configuration graph; and
determining row-heights of the rows and column-widths of the columns of the two-dimensional grid.
2. The method of claim 1 , wherein the accessing comprises building the plurality of layout pattern configurations.
3. The method of claim 2 , wherein the building comprises associating one of the layout pattern configurations with a generalized layout pattern configuration and a specialized layout pattern configuration.
4. The method of claim 1 , wherein the selecting comprises:
choosing a first layout pattern configuration and a second layout pattern configuration from the plurality of layout pattern configurations of the layout pattern configuration graph; and
comparing first characteristics of the first annotated layout pattern configuration and second characteristics of the second layout pattern.
5. The method of claim 1 , wherein the at least two of the plurality of layout pattern configurations of the layout pattern configuration graph are annotated with the characteristics representing physical layout geometry by analyzing yield characteristics thereof.
6. The method of claim 1 , wherein the at least two of the plurality of layout pattern configurations of the layout pattern configuration graph are annotated with the characteristics representing physical layout geometry by analyzing performance characteristics thereof.
7. The method of claim 1 , wherein the annotated characteristics of the physical layout geometry include one or more of directionality, periodicity or run length.
8. The method of claim 1 , wherein the annotated characteristics of the physical layout geometry include lithography patterning characteristics.
9. A method, performed by one or more processors, for determining a physical layout pattern for an integrated circuit electrical design, the method comprising:
accessing a layout pattern configuration graph comprising a plurality of layout pattern configurations, wherein at least two of the plurality of layout pattern configurations of the layout pattern configuration graph are annotated with characteristics representing physical layout geometry;
partitioning the integrated circuit electrical design into a plurality of circuit design configurations including one specific circuit design configuration; and
selecting, based on the annotated characteristics of the physical layout geometry, one of the at least two of the plurality of layout pattern configurations from the layout pattern configuration graph, the selected one of the at least two of the plurality of layout configurations corresponding to the one specific circuit design configuration of the integrated circuit electrical design;
determining a manufacturing configuration for manufacturing an integrated circuit, the manufacturing configuration comprising the physical layout pattern of the integrated circuit electrical design including the selected one of the at least two of the plurality of layout pattern configurations; and
manufacturing the integrated circuit using the determined manufacturing configuration;
wherein the accessing comprises defining at least one of the plurality of layout pattern configurations as at least one two-dimensional grid with rows and columns, wherein grid cells of the two-dimensional grid are defined as completely filled or completely empty; and
wherein the at least two of the plurality of layout pattern configurations of the layout pattern configuration graph are annotated with the characteristics representing the physical layout geometry by:
identifying the two-dimensional grid in at least one of the at least two of the plurality of layout pattern configurations of the layout pattern configuration graph; and
computing one or more geometric properties from the identified two-dimensional grid.
10. The method of claim 9 , wherein the one or more geometric properties comprise at least one of a density measure, width measure, or height measure.
11. The method of claim 9 , wherein the accessing comprises building the plurality of layout pattern configurations.
12. The method of claim 11 , wherein the building comprises associating one of the layout pattern configurations with a generalized layout pattern configuration and a specialized layout pattern configuration.
13. The method of claim 9 , wherein the selecting comprises:
choosing a first layout pattern configuration and a second layout pattern configuration from the plurality of layout pattern configurations of the layout pattern configuration graph; and
comparing first characteristics of the first annotated layout pattern configuration and second characteristics of the second layout pattern.
14. The method of claim 9 , wherein the at least two of the plurality of layout pattern configurations of the layout pattern configuration graph are annotated with the characteristics representing physical layout geometry by analyzing yield characteristics thereof.
15. The method of claim 9 , wherein the at least two of the plurality of layout pattern configurations of the layout pattern configuration graph are annotated with the characteristics representing physical layout geometry by analyzing performance characteristics thereof.
16. The method of claim 9 , wherein the annotated characteristics of the physical layout geometry include one or more of directionality, periodicity or run length.
17. The method of claim 9 , wherein the annotated characteristics of the physical layout geometry include lithography patterning characteristics.
18. A method, performed by one or more processors, for determining a physical layout pattern for an integrated circuit electrical design, the method comprising:
accessing a layout pattern configuration graph comprising a plurality of layout pattern configurations, wherein at least two of the plurality of layout pattern configurations of the layout pattern configuration graph are annotated with characteristics;
partitioning the integrated circuit electrical design into a plurality of circuit design configurations including one specific circuit design configuration; and
selecting, based on the annotated characteristics of the physical layout geometry, one of the at least two of the plurality of layout pattern configurations from the layout pattern configuration graph, the selected one of the at least two of the plurality of layout configurations corresponding to the one specific circuit design configuration of the integrated circuit electrical design; and
determining a manufacturing configuration for manufacturing an integrated circuit, the manufacturing configuration comprising the physical layout pattern of the integrated circuit electrical design including the selected one of the at least two of the plurality of layout pattern configurations; and
manufacturing the integrated circuit using the determined manufacturing configuration;
wherein the accessing comprises defining at least one of the plurality of layout pattern configurations as at least one two-dimensional grid with rows and columns, wherein grid cells of the two-dimensional grid are defined as completely filled or completely empty; and
wherein the at least two of the plurality of layout pattern configurations of the layout pattern configuration graph are annotated with the characteristics representing physical layout geometry by: identifying the at least one two-dimensional grid in at least one of the at least two of the plurality of layout pattern configurations of the layout pattern configuration graph; and determining row-heights of the rows and column-widths of the columns of the two-dimensional grid.
19. The method of claim 18 , wherein the at least two of the plurality of layout pattern configurations of the layout pattern configuration graph are annotated with the characteristics representing physical layout geometry by:
computing one or more geometric properties from the identified two-dimensional grid.
20. The method of claim 19 , wherein the one or more geometric properties comprise at least one of a density measure, width measure, or height measure.