Tissue impedance measurement using a secondary frequency
A microwave ablation system includes a generator including a first energy source, a second energy source and a diplexer, the diplexer multiplexes a first energy from the first energy source and a second energy from the second energy source. The system also includes a cable including a center conductor and an outer sheath where the multiplexed energy is transmitted through the center conductor. In addition an antenna is provided that is operable to receive the multiplexed energy from the center conductor and to deliver the multiplexed energy to a region of tissue. The outer sheath acts as a return path of the second energy to the second energy source. A sensor is also provided that measures at least one parameter of the second energy generated by the second energy source and the second energy returned from the region of tissue.
1. An electrosurgical system comprising:
a first energy source configured to generate a first energy signal at a first frequency;
a second energy source configured to generate a second energy signal at a second frequency;
a diplexer coupled to the first energy source and the second energy source; and
an antenna coupled to the first energy source and the second energy source via the diplexer, the antenna including a first conductor configured to conduct a multiplexed energy signal and a second conductor configured to provide a return path to the second energy source for the second energy signal;
wherein the diplexer is configured to multiplex the first energy signal and the second energy signal and to transmit the first energy signal and the second energy signal simultaneously as the multiplexed energy signal through the antenna, while blocking the first energy signal from the second energy source and blocking the second energy signal from the first energy source.
2. The electrosurgical system according to claim 1 , further comprising:
a sensor coupled to the second energy source and configured to measure a property of the second energy signal.
3. The electrosurgical system according to claim 2 , further comprising:
a controller coupled to the first energy source, the second energy source, and the sensor, the controller configured to control the first energy source based on the property of the second energy signal.
4. The electrosurgical system according to claim 3 , wherein the controller is further configured to calculate an impedance based on the property of the second energy signal.
5. The electrosurgical system according to claim 1 , wherein the first frequency is higher than the second frequency.
6. The electrosurgical system according to claim 5 , wherein the first energy source is a microwave generator and the second energy source is a radio frequency generator.
7. An electrosurgical system comprising:
a first energy source configured to generate a first energy signal at a first frequency;
a second energy source configured to generate a second energy signal at a second frequency;
a diplexer coupled to the first energy source and the second energy source;
an antenna coupled to the first energy source and the second energy source via the diplexer, the antenna configured to transmit a multiplexed energy signal; and
a return electrode configured to provide a return path to the second energy source for the second energy signal;
wherein the diplexer is configured to multiplex the first energy signal and the second energy signal and to transmit the first energy signal and the second energy signal simultaneously as the multiplexed energy signal through the antenna, while blocking the first energy signal from the second energy source and blocking the second energy signal from the first energy source.
8. The electrosurgical system according to claim 7 , further comprising:
a sensor coupled to the second energy source and configured to measure a property of the second energy signal.
9. The electrosurgical system according to claim 8 , further comprising:
a controller coupled to the first energy source, the second energy source, and the sensor, the controller configured to control the first energy source based on the property of the second energy signal.
10. The electrosurgical system according to claim 9 , wherein the controller is further configured to calculate an impedance based on the property of the second energy signal.
11. The electrosurgical system according to claim 7 , wherein the first frequency is higher than the second frequency.
12. The electrosurgical system according to claim 11 , wherein the first energy source is a microwave generator and the second energy source is a radio frequency generator.