IP Library Granted Patent US 10,084,138
Granted Patent B2
US 10,084,138 · App. 15/357,003 · Granted Sep 25, 2018

Methods for forming nanotube fabric layers with increased density

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,084,138
App. No.
15/357,003
Granted
Sep 25, 2018
Kind
B2
Abstract

Methods for passivating a nanotube fabric layer within a nanotube switching device to prevent or otherwise limit the encroachment of an adjacent material layer are disclosed. In some embodiments, a sacrificial material is implanted within a porous nanotube fabric layer to fill in the voids within the porous nanotube fabric layer while one or more other material layers are applied adjacent to the nanotube fabric layer. Once the other material layers are in place, the sacrificial material is removed. In other embodiments, a non-sacrificial filler material (selected and deposited in such a way as to not impair the switching function of the nanotube fabric layer) is used to form a barrier layer within a nanotube fabric layer. In other embodiments, individual nanotube elements are combined with and nanoscopic particles to limit the porosity of a nanotube fabric layer.

Claims (16)

1. A method for forming a multilayer nanotube fabric, comprising:

forming a first nanotube application solution, said first nanotube application solution comprising a first plurality of nanotube elements suspended in a solvent;

depositing said first nanotube application solution over a material layer to form a first nanotube fabric layer having a first density;

selecting a second plurality of nanotube elements, said second plurality of nanotube elements having a length below a selected limit;

forming a second nanotube application solution, said second nanotube application solution comprising said selected second plurality of nanotube elements suspended in a solvent;

depositing said second nanotube application solution over said first nanotube fabric layer to form a second nanotube fabric layer with a selected second density,

wherein said first nanotube fabric layer and said second nanotube fabric layer form a multilayer nanotube fabric; and

wherein said second density is selected by selecting the length of said second plurality of nanotube elements, and said second density of said second nanotube fabric layer is sufficient to passivate said multilayer nanotube fabric.

2. The method of claim 1 wherein said selected density limits the encroachment of a second material layer formed over or adjacent to said multilayer nanotube fabric into said multilayer nanotube fabric.

3. The method of claim 1 wherein said length of second plurality of nanotube elements is limited to less than about 500 nm.

4. The method of claim 1 wherein said length of second plurality of nanotube elements is limited to less than about 100 nm.

5. The method of claim 1 wherein said first nanotube application solution and said second nanotube application solutions are deposited using one of a spin coating process, a spray coating process, or a dip coating process.

6. The method of claim 1 wherein said nanotube elements are carbon nanotubes.

7. The method of claim 1 wherein said solvent is one of dimethylformamide, n-methylpyrollidinone, n-methyl formamide, ethyl lactate, alcohol, or water.

8. The method of claim 1 wherein said second nanotube fabric layer has a substantially uniform density.

9. The method of claim 1 wherein said first density is selected to increase the switching function of said first nanotube fabric layer.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 8, 2021
From: NANTERO, INC.
To: ZEON CORPORATION
Reel/Frame 056789/0932 →
RELEASE OF SECURITY INTEREST IN PATENTS Recorded Jul 8, 2021
From: SILICON VALLEY BANK
To: NANTERO, INC.
Reel/Frame 056790/0001 →
CONFIRMATORY LICENSE Recorded Apr 23, 2021
From: NANTERO, INC.
To: ZEON CORPORATION
Reel/Frame 056032/0549 →
INTELLECTUAL PROPERTY SECURITY AGREEMENT Recorded Nov 11, 2020
From: NANTERO, INC.
To: SILICON VALLEY BANK
Reel/Frame 054383/0632 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 22, 2018
From: RUECKES, THOMAS; MANNING, H. MONTGOMERY; SEN, RAHUL
To: NANTERO, INC.
Reel/Frame 046663/0137 →