IP Library Granted Patent US 10,559,732
Granted Patent B2
US 10,559,732 · App. 15/368,599 · Granted Feb 11, 2020

Surface-mounted light-emitting device and fabrication method thereof

Inventors: Shaohua Huang (Xiamen, CN); Xiaoqiang Zeng (Xiamen, CN); Chih-Wei Chao (Xiamen, CN)
Assignee: XIAMEN SANAN OPTO ELECTRONICS TECHNOLOGY CO., LTD.
H01L33/62H01L33/0079H01L33/0095H01L33/38H01L33/486H01L2933/0016H01L2933/0033H01L2933/0066H01L2933/0091
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,559,732
App. No.
15/368,599
Granted
Feb 11, 2020
Kind
B2
Abstract

A surface-mounted light-emitting device is fabricated by epitaxial growth: forming the LED epitaxial structure over a growth substrate through epitaxial growth; chip fabrication: determining P and N electrode regions and an isolating region over the LED epitaxial structure surface and fabricating the P and N electrode pads and the insulator over the P and N electrode regions and the isolating region, wherein the P and N electrode pads have sufficient thicknesses to support the LED epitaxial structure, and the insulator is formed between the P and N electrode pads to prevent the P and N electrode pads from a short circuit; removing the growth substrate and unitizing the LED epitaxial structure to form the chip; and SMT packaging: providing the supporting substrate and directly mounting the P and N electrode pads of the chip over the supporting substrate through SMT packaging to thereby form the surface-mounted LED light-emitting device.

Claims (27)

1. A method of fabricating a surface-mounted light-emitting diode (LED) light-emitting device, the method comprising:

1) epitaxial growth: form an LED epitaxial structure over a growth substrate through epitaxial growth;

2) chip fabrication:

determine P and N electrode regions and an isolating region on a surface of the LED epitaxial structure; and

fabricate P and N electrode pads and an insulator over the P and N electrode regions and the isolating region, respectively on the surface of the LED epitaxial structure,

wherein the insulator fabricated on the surface of the LED epitaxial structure has opposite a first insulator surface and a second insulator surface,

wherein the first insulator surface is adjacent to the LED epitaxial structure and the second insulator surface extrudes beyond either of the second electrode surfaces of the P and N electrode pads to prevent the P and N electrode pads from short circuiting when directly applied in the SMT packaging;

wherein the P and N electrode pads have sufficient thicknesses to support the LED epitaxial structure, and the insulator is formed between the P and N electrode pads to prevent the P and N electrode pads from a short circuit;

remove the growth substrate and unitize the LED epitaxial structure to form a LED chip;

3) Surface-Mounted Technology (SMT) packaging:

provide a supporting substrate and directly mount the P and N electrode pads of the LED chip over the supporting substrate through SMT packaging to thereby form the surface-mounted LED light-emitting device;

wherein in step 2), after the growth substrate is removed, the method further comprising etching the LED epitaxial structure to form a cutting path, and physically cutting the electrode pads over the cutting path to ensure that edges of the P and N electrode pads are beyond an edge of the LED epitaxial structure with a specified distance, thereby forming a series of LED chips.

2. The method of claim 1 , wherein in step 2), a melting point or softening point of the insulator material is lower than melting points of the P and N electrode pads.

3. The method of claim 1 , wherein the insulator comprises a colloid material.

4. The method of claim 1 , wherein in step 3), the P and N electrode pads of the LED chip are connected to the supporting substrate through reflow soldering.

5. A method of fabricating a surface-mounted light-emitting diode (LED) light-emitting device, the method comprising:

1) epitaxial growth: form an LED epitaxial structure over a growth substrate through epitaxial growth;

2) chip fabrication:

determine P and N electrode regions and an isolating region on a surface of the LED epitaxial structure; and

fabricate P and N electrode pads and an insulator over the P and N electrode regions and the isolating region, respectively on the surface of the LED epitaxial structure,

wherein the insulator fabricated on the surface of the LED epitaxial structure has opposite a first insulator surface and a second insulator surface,

wherein the first insulator surface is adjacent to the LED epitaxial structure and the second insulator surface extrudes beyond either of the second electrode surfaces of the P and N electrode pads to prevent the P and N electrode pads from short circuiting when directly applied in the SMT packaging;

wherein the P and N electrode pads have sufficient thicknesses to support the LED epitaxial structure, and the insulator is formed between the P and N electrode pads to prevent the P and N electrode pads from a short circuit;

remove the growth substrate and unitize the LED epitaxial structure to form a LED chip;

3) Surface-Mounted Technology (SMT) packaging:

provide a supporting substrate and directly mount the P and N electrode pads of the LED chip over the supporting substrate through SMT packaging to thereby form the surface-mounted LED light-emitting device;

wherein in step 3), the supporting substrate has a surface coated with a solder layer with a thickness smaller than or equal to a height difference between the second insulator surface and either of the second electrode surfaces of the P and N electrode pads, wherein the insulator extends through the solder layer and is in contact with the solder layer and the supporting substrate, wherein a distance between edges of the P and N electrode pads beyond that of the LED epitaxial structure is D, a minimum thickness of the P and N electrode pads is T, and wherein D/T is 0.5-2.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 20, 2023
From: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
To: QUANZHOU SANAN SEMICONDUCTOR TECHNOLOGY CO., LTD.
Reel/Frame 065302/0223 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 3, 2016
From: HUANG, SHAOHUA; ZENG, XIAOQIANG; CHAO, CHIH-WEI
To: XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
Reel/Frame 040510/0653 →
Priority Claims (1)
CN 2013 1 0195976 · May 24, 2013 · national
Continuity (3)
Continuation 14748701 · Jun 24, 2015
Continuation PCTCN2014071079 · Jan 22, 2014
Related Publication 20170084808A1 · Mar 23, 2017