Vertical hall effect element with improved sensitivity

1. A method of fabricating a Hall element over a substrate, the method comprising:

depositing an N-type epitaxial layer disposed over the substrate, the N-type epitaxial layer having a top surface and a bottom surface, the bottom surface proximate to the substrate;

implanting and diffusing a plurality of pickups into the N-type epitaxial layer, each adjacent pair of the plurality of pickups separated by a respective separation region, each one of the plurality of pickups comprising a respective N+ type diffusion; and

implanting and diffusing a low-voltage P-well region into the N-type epitaxial layer, wherein the low-voltage P-well region extends into each one of the separation regions, wherein the low voltage P-well extends to a depth of about 0.4 micrometers under the top surface of the N-type epitaxial layer, wherein a peak doping concentration of the low-voltage P-well region is about 5×1017 atoms per cubic centimeter at a depth of about 0.1 micrometers under the top surface of the N-type epitaxial layer, wherein a spacing (Sp_pkpk) between centers of adjacent pairs of the plurality of pickups is within about +/−ten percent of 3.5 micrometers, wherein the low-voltage P-well region after diffusion does not reach the plurality of pickups, wherein the Hall element is configured to generate a Hall voltage between at least one pair of the plurality of pickups, and wherein the Hall voltage is most responsive to a magnetic field directed parallel to a major surface of the substrate;

implanting a P-type barrier structure into the substrate under the bottom surface of the N-type epitaxial layer, and surrounding the plurality of pickups;

diffusing the P-type barrier structure from the substrate and into the N-type epitaxial layer;

implanting a P-well region into the top surface of the N-type epitaxial layer; and

diffusing the P-Well region into the N-type epitaxial layer surrounding the plurality of pickups, wherein the P-type barrier structure and the P-well region become coupled in a direction vertical to the substrate so as to form a barrier to electrical charges within the N-type epitaxial layer.

2. The method of claim 1 , wherein the plurality of pickups is arranged in a straight line, forming a vertical Hall Effect element, or in a circle, forming a circular vertical Hall (CVH) sensing element.

3. The method of claim 1 , wherein the Hall element is configured to pass a drive current between at least two of the plurality of pickups, and wherein a depth of the low-voltage P-well region extending into the separation regions is selected to force the drive current deeper and more vertically into the N-type epitaxial layer in relation to the major surface of the substrate, resulting in a more sensitive Hall element.

4. The method of claim 1 , wherein a distance (Es_pkep) between an edge of one of the plurality of pickups and a closest edge of the P-well region is within about +/−ten percent of 5.5 micrometers.

5. The method of claim 4 , wherein a smallest distance (Sp_pklp) from an edge of one of the plurality of pickups and a closest edge of the low-voltage P-well region before it is diffused is within about +/−ten percent of 0.4 micrometers.

6. The method of claim 5 , wherein heights (PKH) of the plurality of pickups in a direction parallel to the major surface of the substrate are within about +/−ten percent of 9.0 micrometers.

7. The method of claim 6 , wherein widths (PKW) of the plurality of pickups in a direction parallel to the major surface of the substrate are within about +/−ten percent of 1.0 micrometers.

8. The method of claim 7 , wherein a smallest distance (SP_eppb) from an outer edge of the N-type epitaxial layer and a closest edge of the P-type barrier structure in a direction parallel to the major surface of the substrate before it is diffused is within about +/−ten percent of 5.0 micrometers.

9. The method of claim 8 , wherein a width (EP_width) of the N-type epitaxial layer defined by a distance between opposite edges of the P-well region, is within about +/−ten percent of 20.0 micrometers.

10. The method of claim 9 , wherein the plurality of pickups is arranged in a straight line, forming a vertical Hall Effect element.

11. The method of claim 9 , wherein the plurality of pickups is arranged in a circle, forming a circular vertical Hall (CVH) sensing element.

12. The method of claim 1 wherein a diffusion depth and a doping concentration at the diffusion depth of the low voltage P-well region is less than a diffusion depth and a doping concentration at the diffusion depth of a P-well region in the same semiconductor process.

13. The method of claim 1 wherein the plurality of pickups comprises at least five pickups.