IP Library Granted Patent US 10,459,337
Granted Patent B2
US 10,459,337 · App. 15/377,578 · Granted Oct 29, 2019

Multicolor photolithography materials and methods

Inventors: John T. Fourkas (Bethesda, MD); Daniel E. Falvey (Takoma Park, MD); Zuleykhan Tomova (Greenbelt, MD); Steven Wolf (Riverdale, MD); Katie Brennan (College Park, MD)
Assignee: University of Maryland, College Park
G03F7/031G03F7/2022G03F7/70458G03F7/70466
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Quick Facts
Patent No.
US 10,459,337
App. No.
15/377,578
Granted
Oct 29, 2019
Kind
B2
Abstract

The present invention relates to photoresist compositions comprising a base resin such as a monomer capable of radical polymerization upon photoinitiation, and photoinitiator molecules such as a diketone, and multicolor photolithography methods. Photoresist compositions comprise photoinitiator molecules that are exposed to a first radiation source, thereby exciting the photoinitiator molecules from a ground state to a pre-activated state. The pre-activated state molecules are then exposed to a second radiation source in selected locations, thereby deactivating the pre-activated state molecules in the selected locations. Any remaining pre-activated state molecules are exposed to a third radiation source, exciting such remaining pre-activated state photoinitiator molecules to an activated state. Polymerization of the base resin is then initiated.

Claims (11)

1. A multicolor photolithography method, comprising the steps of:

providing a substrate at least partially coated with a layer of a photoresist composition comprising a reactive monomer and photoinitiator (PI) molecules;

exposing said PI molecules to a first radiation source, thereby exciting said PI molecules from a ground state to a pre-activated state;

exposing said pre-activated state PI molecules to a second radiation source in selected locations, thereby deactivating said pre-activated state PI molecules in said selected locations; and

exposing any of said pre-activated state PI molecules remaining to a third radiation source, thereby exciting said remaining pre-activated state PI molecules to an activated state, and initiating polymerization of said reactive monomer in said photoresist composition.

2. The method of claim 1 , wherein said first radiation source is a pulsed laser.

3. The method of claim 1 , wherein said second radiation source is a continuous-wave laser.

4. The method of claim 1 , wherein said third radiation source is a pulsed laser.

5. The method of claim 1 , wherein at least one of said first, second or third radiation source emits visible light.

6. The method of claim 1 , wherein said photoinitiator molecules are a diketone having substituent groups R 1 and R 2 , wherein at least one of R 1 or R 2 is selected from the group consisting of an alkyl substituent, an aryl substituent, a substituted aryl substituent, a heterocyclic aryl substituent, a cycloalkene substituent, and a heterocyclic cycloalkene substituent.

7. The method of claim 1 , wherein said photoinitiator molecules are selected from the group consisting of biacetyl (C 4 H 6 O 2 ), benzil (C 6 H 5 CO 2 ), 2.2′-pyridil (C 12 H 8 N 2 O 2 ), α-naphthil (C 22 H 14 O 2 ), β-naphthil (C 22 H 14 O 2 ), and furil (C 10 H 6 O 4 ).

Assignments (3)
CONFIRMATORY LICENSE Recorded Mar 31, 2025
From: UNIV OF MARYLAND, COLLEGE PARK
To: NATIONAL SCIENCE FOUNDATION
Reel/Frame 070690/0033 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 22, 2019
From: FOURKAS, JOHN T.; FALVEY, DANIEL E.; TOMOVA, ZULEYKHAN; WOLF, STEVEN; BRENNAN, KATIE
To: UNIVERSITY OF MARYLAND, COLLEGE PARK
Reel/Frame 048957/0460 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 15, 2017
From: BRENNAN, KATIE
To: UNIVERSITY OF MARYLAND
Reel/Frame 042378/0276 →
Continuity (2)
Provisional Application 62267127 · Dec 14, 2015
Related Publication 20170168392A1 · Jun 15, 2017