Thin film transistor, method of manufacturing the same, and electronic device including the same

1. A thin film transistor comprising:

a gate electrode;

an organic semiconductor overlapping the gate electrode;

an insulator between the gate electrode and the organic semiconductor, the insulator including an inorganic insulating layer having a surface facing the organic semiconductor, the inorganic insulating layer entirely comprising an inorganic material;

a coating on the surface of the inorganic insulating layer that faces the organic semiconductor, the coating having a polysiloxane having an acrylic terminal group; and

a source electrode and a drain electrode electrically connected to the organic semiconductor, respectively,

wherein the organic semiconductor is represented by Chemical Formula 1,

wherein, in Chemical Formula 1,

Ar is a substituted or unsubstituted C 6 to C 30 aromatic cyclic group,

each of X 1 to X 4 are independently one of O, S, Se, Te, N—R a , and CR b , wherein each of R a and R b are independently one of hydrogen, a substituted or unsubstituted linear or branched C 1 to C 30 alkyl group, a substituted or unsubstituted C 7 to C 30 arylalkyl group, a substituted or unsubstituted C 6 to C 30 aryl group, a substituted or unsubstituted C 1 to C 30 alkoxy group, —OR 11 , wherein R 11 is a substituted or unsubstituted C 6 to C 30 aryl group, a substituted or unsubstituted C 4 to C 30 cycloalkyl group, —OR 12 , wherein R 12 is a substituted or unsubstituted C 4 to C 30 cycloalkyl group, a substituted or unsubstituted C 2 to C 30 heteroaryl group, —C(═O)R 13 , wherein R 13 is a substituted or unsubstituted C 1 to C 30 alkyl group, —S(═O) 2 R 14 , wherein R 14 is a substituted or unsubstituted C 1 to C 30 alkyl group, and —NHC(═O)OR 15 , wherein R 15 is a substituted or unsubstituted C 1 to C 30 alkyl group,

at least one of X 1 and X 2 is selected from O, S, Se, Te, and N—R a ,

at least one of X 3 and X 4 is selected from O, S, Se, Te, and N—R a ,

each of X 5 and X 6 are independently one of O, S, Se, Te, N—R a , and CR b R c , wherein each of R a to R c are independently one of hydrogen, a substituted or unsubstituted linear or branched C 1 to C 30 alkyl group, a substituted or unsubstituted C 7 to C 30 arylalkyl group, a substituted or unsubstituted C 6 to C 30 aryl group, a substituted or unsubstituted C 1 to C 30 alkoxy group, —OR 11 , wherein R 11 is a substituted or unsubstituted C 6 to C 30 aryl group, a substituted or unsubstituted C 4 to C 30 cycloalkyl group, —OR 12 , wherein R 12 is a substituted or unsubstituted C 4 to C 30 cycloalkyl group, a substituted or unsubstituted C 2 to C 30 heteroaryl group, —C(═O)R 13 , wherein R 13 is a substituted or unsubstituted C 1 to C 30 alkyl group, —S(═O) 2 R 14 , wherein R 14 is a substituted or unsubstituted C 1 to C 30 alkyl group, and —NHC(═O)OR 15 , wherein R 15 is a substituted or unsubstituted C 1 to C 30 alkyl group, and

each of R 1 to R 6 are independently one of hydrogen, —F, —Cl, —Br, —I, a substituted or unsubstituted linear or branched C 1 to C 30 alkyl group, a substituted or unsubstituted linear or branched C 2 to C 30 alkenyl group, a substituted or unsubstituted linear or branched C 2 to C 30 alkynyl group, a substituted or unsubstituted C 7 to C 30 arylalkyl group, a substituted or unsubstituted C 2 to C 30 heteroarylalkyl group, a substituted or unsubstituted C 2 to C 30 alkylheteroaryl group, a substituted or unsubstituted C 5 to C 30 cycloalkyl group, a substituted or unsubstituted C 2 to C 30 heterocycloalkyl group, a substituted or unsubstituted C 6 to C 30 aryl group, and a substituted or unsubstituted C 2 to C 30 heteroaryl group,

wherein the coating has a thickness of about 40 nanometers to about 50 manometers, and

wherein the polysiloxane having an acrylic terminal group is represented by Chemical Formula 2,

wherein, in Chemical Formula 2,

R 1 is hydrogen or a substituted or unsubstituted C 1 to C 20 alkyl group,

each of L 1 and L 3 are independently one of a substituted or unsubstituted C 1 to C 20 alkylene group, a substituted or unsubstituted C 6 to C 20 arylene group, a substituted or unsubstituted C 6 to C 20 cycloalkylene group, a substituted or unsubstituted C 2 to C 20 alkenylene group, a substituted or unsubstituted C 2 to C 20 alkynylene group, —R—O—R′—, —R—N—R′—, —R—(C═O)—R′— (wherein, each of R and R′ are independently C 1 to C 10 hydrocarbon radical), and a combination thereof,

L 2 is one of —O—(C═O)—NR″—, —(C═O)—NR″— (wherein, R″ is one of hydrogen and a C 1 to C 6 hydrocarbon radical), —O—, —COO—, and —S—, and

* is a portion linked to an adjacent molecule.

2. The thin film transistor according to claim 1 , wherein the organic semiconductor is one of fused polycyclic heteroaromatic compounds represented by the following Chemical Formulae 1A to 10,

wherein, in the above Chemical Formulae 1A to 1G,

each of X 1 to X 4 are independently one of O, S, Se, Te, N—R a , and CR b , wherein each of R a and R b are independently one of hydrogen, a substituted or unsubstituted linear or branched C 1 to C 30 alkyl group, a substituted or unsubstituted C 7 to C 30 arylalkyl group, a substituted or unsubstituted C 6 to C 30 aryl group, a substituted or unsubstituted C 1 to C 30 alkoxy group, —OR 11 , wherein R 11 is a substituted or unsubstituted C 6 to C 30 aryl group, a substituted or unsubstituted C 4 to C 30 cycloalkyl group, —OR 12 , wherein R 12 is a substituted or unsubstituted C 4 to C 30 cycloalkyl group, a substituted or unsubstituted C 2 to C 30 heteroaryl group, —C(═O)R 13 , wherein R 13 is a substituted or unsubstituted C 1 to C 30 alkyl group, —S(═O) 2 R 14 , wherein R 14 is a substituted or unsubstituted C 1 to C 30 alkyl group, and —NHC(═O)OR 15 , wherein R 15 is a substituted or unsubstituted C 1 to C 30 alkyl group,

at least one of X 1 and X 2 is selected from O, S, Se, Te, and N—R a ,

at least one of X 3 and X 4 is selected from O, S, Se, Te, and N—R a ,

each of X 5 and X 6 are independently one of O, S, Se, Te, N—R a , and CR b R c wherein each of R a to R c are independently one of hydrogen, a substituted or unsubstituted linear or branched C 1 to C 30 alkyl group, a substituted or unsubstituted C 7 to C 30 arylalkyl group, a substituted or unsubstituted C 6 to C 30 aryl group, a substituted or unsubstituted C 1 to C 30 alkoxy group, —OR 11 , wherein R 11 is a substituted or unsubstituted C 6 to C 30 aryl group, a substituted or unsubstituted C 4 to C 30 cycloalkyl group, —OR 12 , wherein R 12 is a substituted or unsubstituted C 4 to C 30 cycloalkyl group, a substituted or unsubstituted C 2 to C 30 heteroaryl group, —C(═O)R 13 , wherein R 13 is a substituted or unsubstituted C 1 to C 30 alkyl group, —S(═O) 2 R 14 , wherein R 14 is a substituted or unsubstituted C 1 to C 30 alkyl group, and —NHC(═O)OR 11 , wherein R 15 is a substituted or unsubstituted C 1 to C 30 alkyl group,

each of R 1 to R 6 are independently one of hydrogen, —F, —Cl, —Br, —I, a substituted or unsubstituted linear or branched C 1 to C 30 alkyl group, a substituted or unsubstituted linear or branched C 2 to C 30 alkenyl group, a substituted or unsubstituted linear or branched C 2 to C 30 alkynyl group, a substituted or unsubstituted C 7 to C 30 arylalkyl group, a substituted or unsubstituted C 2 to C 30 heteroarylalkyl group, a substituted or unsubstituted C 2 to C 30 alkylheteroaryl group, a substituted or unsubstituted C 6 to C 30 cycloalkyl group, a substituted or unsubstituted C 2 to C 30 heterocycloalkyl group, a substituted or unsubstituted C 6 to C 30 aryl group, and a substituted or unsubstituted C 2 to C 30 heteroaryl group,

each of R 100 to R 102 are independently one of hydrogen, —F, —Cl, —Br, —I, a substituted or unsubstituted linear or branched C 1 to C 30 alkyl group, a substituted or unsubstituted linear or branched C 2 to C 30 alkenyl group, a substituted or unsubstituted linear or branched C 2 to C 30 alkynyl group, a substituted or unsubstituted C 7 to C 30 arylalkyl group, a substituted or unsubstituted C 2 to C 30 heteroarylalkyl group, a substituted or unsubstituted C 2 to C 30 alkylheteroaryl group, a substituted or unsubstituted C 5 to C 30 cycloalkyl group, a substituted or unsubstituted C 2 to C 30 heterocycloalkyl group, a substituted or unsubstituted C 6 to C 30 aryl group, and a substituted or unsubstituted C 2 to C 30 heteroaryl group, and

each of x, y, and z are integers of 1 or 2.

3. The thin film transistor according to claim 1 , wherein

one of X 1 and X 2 and one of X 3 and X 4 are selenium (Se), and

one of X 5 and X 6 is sulfur (S).

4. The thin film transistor according to claim 1 , wherein

Ar is one of substituted or unsubstituted benzene, substituted or unsubstituted naphthalene, and substituted or unsubstituted anthracene, and

each of R 1 and R 2 are independently a C 1 to C 30 alkyl group.

5. The thin film transistor according to claim 1 , wherein the inorganic material includes one of SiO x , SiN x , AlO x , or a combination thereof.

6. The thin film transistor according to claim 1 , wherein the inorganic insulating layer has a thickness of about 100 nanometers to about 500 nanometers.

7. The thin film transistor according to claim 1 , wherein in Chemical Formula 2, R 1 is hydrogen or a methyl group, each of L 1 and L 3 are independently a C 1 to C 20 alkylene group, and L 2 is —(C═O)—NR″— (wherein, R″ is one of hydrogen and a C 1 to C 6 hydrocarbon radical).

8. The thin film transistor according to claim 1 , wherein in Chemical Formula 2, R 1 is hydrogen, L 2 is —(C═O)—NR″— (wherein, R″ is hydrogen), and each of L 1 and L 3 are independently a propylene group.

9. The thin film transistor according to claim 1 , wherein

the gate electrode is on a substrate, and

the substrate includes one of silica, glass, and plastic.

10. An electronic device comprising a thin film transistor according to claim 1 .

11. The electronic device according to claim 10 , wherein the electronic device is at least one of a liquid crystal display device, an organic light-emitting diode, an electrophoresis display device, a solar cell, an organic sensor, and a combination thereof.

12. A method of manufacturing a thin film transistor, the method comprising:

forming a gate electrode;

forming an insulator on the gate electrode including,

forming an inorganic insulating layer on the gate electrode, the inorganic insulating layer entirely comprising an inorganic material, and

coating a polysiloxane on a surface of the inorganic insulating layer, the polysiloxane having an acrylic terminal group represented by Chemical Formula 2 on a surface of the inorganic insulating layer;

forming an organic semiconductor on the insulator by coating the organic semiconductor on the coated surface of the inorganic insulating layer through a solution process; and

forming a source electrode and a drain electrode electrically connected to the organic semiconductor, respectively,

wherein, in Chemical Formula 2,

R 1 is hydrogen or a substituted or unsubstituted C 1 to C 20 alkyl group,

each of L 1 and L 3 are independently one of a substituted or unsubstituted C 1 to C 20 alkylene group, a substituted or unsubstituted C 6 to C 20 arylene group, a substituted or unsubstituted C 6 to C 20 cycloalkylene group, a substituted or unsubstituted C 2 to C 20 alkenylene group, a substituted or unsubstituted C 2 to C 20 alkynylene group, —R—O—R′—, —R—N—R′—, —R—(C═O)—R′— (wherein, each of R and R′ are independently C 1 to C 10 hydrocarbon radical), and a combination thereof,

L 2 is one of —O—(C═O)—NR″—, —(C═O)—NR″— (wherein, R″ is one of hydrogen and a C 1 to C 6 hydrocarbon radical), —O—, —COO—, and —S—, and

* is a portion linked to an adjacent molecule,

wherein the forming an organic semiconductor coats the organic semiconductor represented by Chemical Formula 1 on the coated surface of the inorganic insulating layer,

wherein, in Chemical Formula 1,

Ar is a substituted or unsubstituted C 6 to C 30 aromatic cyclic group,

each of X 1 to X 4 are independently one of O, S, Se, Te, N—R a , and CR b , wherein each of R a and R b are independently one of hydrogen, a substituted or unsubstituted linear or branched C 1 to C 30 alkyl group, a substituted or unsubstituted C 7 to C 30 arylalkyl group, a substituted or unsubstituted C 6 to C 30 aryl group, a substituted or unsubstituted C 1 to C 30 alkoxy group, —OR 11 , wherein R 11 is a substituted or unsubstituted C 6 to C 30 aryl group, a substituted or unsubstituted C 4 to C 30 cycloalkyl group, —OR 12 , wherein R 12 is a substituted or unsubstituted C 4 to C 30 cycloalkyl group, a substituted or unsubstituted C 2 to C 30 heteroaryl group, —C(═O)R 13 , wherein R 13 is a substituted or unsubstituted C 1 to C 30 alkyl group, —S(═O) 2 R 14 , wherein R 14 is a substituted or unsubstituted C 1 to C 30 alkyl group, and —NHC(═O)OR 15 , wherein R 15 is a substituted or unsubstituted C 1 to C 30 alkyl group,

at least one of X 1 and X 2 is selected from O, S, Se, Te, and N—R a ,

at least one of X 3 and X 4 is selected from O, S, Se, Te, and N—R a ,

each of X 5 and X 6 are independently one of O, S, Se, Te, N—R a , and CR b R c , wherein each of R a to R c are independently one of hydrogen, a substituted or unsubstituted linear or branched C 1 to C 30 alkyl group, a substituted or unsubstituted C 7 to C 30 arylalkyl group, a substituted or unsubstituted C 6 to C 30 aryl group, a substituted or unsubstituted C 1 to C 30 alkoxy group, —OR 11 , wherein R 11 is a substituted or unsubstituted C 6 to C 30 aryl group, a substituted or unsubstituted C 4 to C 30 cycloalkyl group, —OR 12 , wherein R 12 is a substituted or unsubstituted C 4 to C 30 cycloalkyl group, a substituted or unsubstituted C 2 to C 30 heteroaryl group, —C(═O)R 13 , wherein R 13 is a substituted or unsubstituted C 1 to C 30 alkyl group, —S(═O) 2 R 14 , wherein R 14 is a substituted or unsubstituted C 1 to C 30 alkyl group, and —NHC(═O)OR 15 , wherein R 15 is a substituted or unsubstituted C 1 to C 30 alkyl group, and

each of R 1 to R 6 are independently one of hydrogen, —F, —Cl, —Br, —I, a substituted or unsubstituted linear or branched C 1 to C 30 alkyl group, a substituted or unsubstituted linear or branched C 2 to C 30 alkenyl group, a substituted or unsubstituted linear or branched C 2 to C 30 alkynyl group, a substituted or unsubstituted C 7 to C 30 arylalkyl group, a substituted or unsubstituted C 2 to C 30 heteroarylalkyl group, a substituted or unsubstituted C 2 to C 30 alkylheteroaryl group, a substituted or unsubstituted C 5 to C 30 cycloalkyl group, a substituted or unsubstituted C 2 to C 30 heterocycloalkyl group, a substituted or unsubstituted C 6 to C 30 aryl group, and a substituted or unsubstituted C 2 to C 30 heteroaryl group, and

wherein the coating the polysiloxane coats the polysiloxane at a thickness of about 40 nanometers to about 50 nanometers.

13. The method according to claim 12 , wherein in Chemical Formula 2, R 1 is hydrogen or a methyl group, each of L 1 and L 3 are independently a C 1 to C 20 alkylene group, and L 2 is —(C═O)—NR″— (wherein, R″ is one of hydrogen and a C 1 to C 6 hydrocarbon radical).

14. The method according to claim 12 , wherein the forming an organic semiconductor coats at least one of fused polycyclic heteroaromatic compounds represented by the following Chemical Formulae 1A to 1G on the coated surface of the inorganic insulating layer,

wherein, in the above Chemical Formulae 1A to 1G,

each of X 1 to X 4 are independently one of O, S, Se, Te, N—R e , and CR b , wherein each of R a and R b are independently one of hydrogen, a substituted or unsubstituted linear or branched C 1 to C 30 alkyl group, a substituted or unsubstituted C 7 to C 30 arylalkyl group, a substituted or unsubstituted C 6 to C 30 aryl group, a substituted or unsubstituted C 1 to C 30 alkoxy group, —OR 11 , wherein R 11 is a substituted or unsubstituted C 6 to C 30 aryl group, a substituted or unsubstituted C 4 to C 30 cycloalkyl group, —OR 12 , wherein R 12 is a substituted or unsubstituted C 4 to C 30 cycloalkyl group, a substituted or unsubstituted C 2 to C 30 heteroaryl group, —C(═O)R 13 , wherein R 13 is a substituted or unsubstituted C 1 to C 30 alkyl group, —S(═O) 2 R 14 , wherein R 14 is a substituted or unsubstituted C 1 to C 30 alkyl group, and —NHC(═O)OR 15 , wherein R 15 is a substituted or unsubstituted C 1 to C 30 alkyl group,

at least one of X 1 and X 2 is selected from O, S, Se, Te, and N—R a ,

at least one of X 3 and X 4 is selected from O, S, Sc, Te, and N—R a ,

each of X 5 and X 6 are independently one of O, S, Se, Te, N—R a , and CR b R c wherein each of R a to R c are independently one of hydrogen, a substituted or unsubstituted linear or branched C 1 to C 30 alkyl group, a substituted or unsubstituted C 7 to C 30 arylalkyl group, a substituted or unsubstituted C 6 to C 30 aryl group, a substituted or unsubstituted C 1 to C 30 alkoxy group, —OR 11 , wherein R 11 is a substituted or unsubstituted C 6 to C 30 aryl group, a substituted or unsubstituted C 4 to C 30 cycloalkyl group, —OR 12 , wherein R 12 is a substituted or unsubstituted C 4 to C 30 cycloalkyl group, a substituted or unsubstituted C 2 to C 30 heteroaryl group, —C(═O)R 13 , wherein R 13 is a substituted or unsubstituted C 1 to C 30 alkyl group, —S(═O) 2 R 14 , wherein R 14 is a substituted or unsubstituted C 1 to C 30 alkyl group, and —NHC(═O)OR 15 , wherein R 15 is a substituted or unsubstituted C 1 to C 30 alkyl group,

each of R 1 to R 6 are independently one of hydrogen, —F, —Cl, —Br, —I, a substituted or unsubstituted linear or branched C 1 to C 30 alkyl group, a substituted or unsubstituted linear or branched C 2 to C 30 alkenyl group, a substituted or unsubstituted linear or branched C 2 to C 30 alkynyl group, a substituted or unsubstituted C 7 to C 30 arylalkyl group, a substituted or unsubstituted C 2 to C 30 heteroarylalkyl group, a substituted or unsubstituted C 2 to C 30 alkylheteroaryl group, a substituted or unsubstituted C 5 to C 30 cycloalkyl group, a substituted or unsubstituted C 2 to C 30 heterocycloalkyl group, a substituted or unsubstituted C 6 to C 30 aryl group, and a substituted or unsubstituted C 2 to C 30 heteroaryl group,

each of R 100 to R 102 are independently one of hydrogen, —F, —Cl, —Br, —I, a substituted or unsubstituted linear or branched C 1 to C 30 alkyl group, a substituted or unsubstituted linear or branched C 2 to C 30 alkenyl group, a substituted or unsubstituted linear or branched C 2 to C 30 alkynyl group, a substituted or unsubstituted C 7 to C 30 arylalkyl group, a substituted or unsubstituted C 2 to C 30 heteroarylalkyl group, a substituted or unsubstituted C 2 to C 30 alkylheteroaryl group, a substituted or unsubstituted C 5 to C 30 cycloalkyl group, a substituted or unsubstituted C 2 to C 30 heterocycloalkyl group, a substituted or unsubstituted C 6 to C 30 aryl group, and a substituted or unsubstituted C 2 to C 30 heteroaryl group, and

each of x, y, and z are integers of 1 or 2.

15. The method according to claim 12 , wherein the forming an inorganic insulating layer deposits one of SiO x , SiN x , AlO x , and a combination thereof at a thickness of about 100 nanometers to about 500 nanometers using a plasma-enhanced chemical vapor deposition (PECVD) method or an atomic layer deposition (ALD) method.