IP Library Granted Patent US 9,823,438
Granted Patent B2
US 9,823,438 · App. 15/385,106 · Granted Nov 21, 2017

Electro-optical device, manufacturing method of electro-optical device, and electronic apparatus

Inventor: Manabu Kondo (Matsumoto, JP)
Assignee: SEIKO EPSON CORPORATION
G02B7/1815B81B7/008B81C1/00317G02B5/208G02B26/0841G03B21/008B81B2201/042B81B2207/012B81C2203/0118B81C2203/0785H01L2224/48227H01L2224/73265H01L2924/15174H01L2924/16195
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Quick Facts
Patent No.
US 9,823,438
App. No.
15/385,106
Granted
Nov 21, 2017
Kind
B2
Abstract

An electro-optical apparatus has an element substrate that is provided with a mirror and a sealing member which seals the mirror, and the sealing member includes a light-transmitting cover which faces the mirror opposite from the element substrate. An infrared cut filter is laminated on the light-transmitting cover.

Claims (9)

1. A method of manufacturing an electro-optical device, comprising:

preparing a first wafer that is provided with a mirror, a driving element that drives the mirror, and a terminal;

forming a translucent second wafer having a bottom section with a concave section provided thereon, the second wafer having an infrared cut filter that overlaps with the concave section;

adhering a face of the first wafer on a side on which the mirror is provided to a face of the second wafer on which the concave section is provided such that the mirror and the concave section overlap in planar view; and

splitting the first wafer and the second wafer.

2. The method of manufacturing an electro-optical device according to claim 1 , wherein the forming of the second wafer includes:

forming the infrared cut filter on a light-transmitting wafer;

forming a through hole in a spacer wafer; and

obtaining the second wafer by adhering the light-transmitting wafer with the spacer wafer so as to overlap each other.

Priority Claims (1)
JP 2015-063930 · Mar 26, 2015 · national
Continuity (2)
Division 15017964 · Feb 8, 2016
Related Publication 20170102516A1 · Apr 13, 2017