IP Library › Granted Patent US 9,859,683
Granted Patent B2
US 9,859,683 · App. 15/397,868 · Granted Jan 2, 2018

Distributed feedback semiconductor laser element

Inventors: Masahiro Hitaka (Hamamatsu, JP); Yutaka Takagi (Hamamatsu, JP); Takahiro Sugiyama (Hamamatsu, JP)
Assignee: HAMAMATSU PHOTONICS K.K.
H01S5/12H01S5/06804H01S5/2009H01S5/34H01S5/3407H01S5/3408H01S5/34313H01S5/34353
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Quick Facts
Patent No.
US 9,859,683
App. No.
15/397,868
Granted
Jan 2, 2018
Kind
B2
Abstract

A DFB laser element includes an active layer 4 having a multiple quantum well structure including a plurality of well layers 4 B having different thicknesses, a diffraction grating layer 6 that is optically coupled to the active layer 4 , and a pair of cladding layers with the active layer 4 and the diffraction grating layer 6 interposed therebetween. An effective refractive index of the diffraction grating layer 6 is high, and a thickness of the well layer 4 B increases as a distance from the diffraction grating layer 6 increases. In this structure, it is possible to reduce dependence on temperature when the DFB semiconductor laser element is miniaturized.

Claims (39)

1. A distributed feedback semiconductor laser element, comprising:

an active layer having a multiple quantum well structure including a plurality of well layers having different thicknesses;

a diffraction grating layer that is optically coupled to the active layer; and

a pair of cladding layers with the active layer and the diffraction grating layer interposed therebetween,

wherein when a region that is interposed between the cladding layers is defined as a core layer,

the diffraction grating layer includes a layer having a refractive index higher than an average refractive index of the core layer, and

a thickness of the well layer increases as a distance from the diffraction grating layer increases.

2. The distributed feedback semiconductor laser element according to claim 1 , comprising:

one or more layers having a higher refractive index than a mode equivalent refractive index with respect to light propagating through the core layer between the diffraction grating layer and the well layers.

3. The distributed feedback semiconductor laser element according to claim 1 ,

wherein the number of well layers is two or more.

4. The distributed feedback semiconductor laser element according to claim 1 ,

wherein when N is a natural number, a thickness of an N-th well layer from the diffraction grating layer among the plurality of well layers is d(N), and the optical confinement factor of the N-th well layer is Γ(N), a relative change in F(N) is 10% or less.

5. The distributed feedback semiconductor laser element according to claim 1 ,

wherein when the diffraction grating layer is one-dimensional, a coupling coefficient κ of the diffraction grating layer satisfies the following relationship expression:

20 cm −1 ≦κ≦1000 cm −1 .

6. The distributed feedback semiconductor laser element according to claim 1 ,

wherein the diffraction grating layer is a two-dimensional diffraction grating layer.

7. The distributed feedback semiconductor laser element according to claim 6 ,

wherein the diffraction grating layer comprises:

a base layer; and

a plurality of different-refractive-index regions having a refractive index different from that of the base layer,

wherein the different-refractive-index region is arranged at a grating point position on a square grating including horizontal lines connecting angular positions of 0° and 180° and vertical lines connecting angular positions of 90° and 270° in a plan view as viewed in a direction perpendicular to the base layer, the diffraction grating layer constitutes a two-dimensional square grating diffraction grating layer, and

a coupling coefficient κ1 in a 90° direction and a coupling coefficient κ3 in a 180° direction satisfy the following relationship expression:

100 cm −1 ≦κ1≦5000 cm −1 , and

50 cm −1 ≦κ3≦5000 cm −1 .

8. The distributed feedback semiconductor laser element according to claim 7 ,

wherein the active layer includes a barrier layer between the well layers,

band gap energy of the barrier layer is set to be lower than band gap energy of the cladding layer, and

band gap energy of the well layer is set to be lower than the band gap energy of the barrier layer.

9. The distributed feedback semiconductor laser element according to claim 1 , comprising:

between the active layer and the diffraction grating layer, a carrier barrier layer that suppresses movement of carriers between the active layer and the diffraction grating layer.

10. A distributed feedback semiconductor laser element, comprising:

an active layer having a multiple quantum well structure including a plurality of well layers having different materials;

a diffraction grating layer that is optically coupled to the active layer; and

a pair of cladding layers with the active layer and the diffraction grating layer interposed therebetween,

wherein when a region that is interposed between the cladding layers is defined as a core layer,

the diffraction grating layer includes a layer having a refractive index higher than an average refractive index of the core layer, and

a band gap energy that is defined by a material of the well layers decreases as a distance from the diffraction grating layer increases.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 4, 2017
From: HITAKA, MASAHIRO; TAKAGI, YUTAKA; SUGIYAMA, TAKAHIRO
To: HAMAMATSU PHOTONICS K.K.
Reel/Frame 040838/0058 →
Priority Claims (1)
JP 2016-002923 · Jan 8, 2016 · national
Continuity (1)
Related Publication 20170201069A1 · Jul 13, 2017