Solid-state image sensing device and method of manufacturing the same
By selectively anisotropically etching a stack film formed to cover a plurality of photodiodes and a gate electrode layer of a MOS transistor, the stack film remains on each of the plurality of photodiodes to form a lower antireflection coating and the stack film remains on a sidewall of the gate electrode layer to form a sidewall Using the gate electrode layer and the sidewall as a mask, an impurity is introduced to form a source/drain region of the MOS transistor. After the impurity was introduced, an upper antireflection coating is formed at least on a lower antireflection coating At least any of the upper antireflection coating and the lower antireflection coating is etched such that the antireflection coatings on the two respective photodiodes are different in thickness from each other.
1. A method of manufacturing a solid-state image sensing device including a photoelectric conversion portion, a transfer transistor, and an antireflection coating, constituting a pixel region respectively, comprising steps of:
(a) forming a gate electrode for said transfer transistor on said pixel region via a gate insulating film;
(b) forming said photoelectric conversion portion on said pixel region adjacent to said gate electrode in a plan view;
(c) forming a stack film constituted of a plurality of insulating films so as to cover said pixel region;
(d) selectively anisotropically etching said stack film such that said stack film remains on said photoelectric conversion portion to form a lower film and such that said stack film remains on a sidewall of said gate electrode to form a sidewall insulating film;
(e) forming a drain region of said transfer transistor by introducing an impurity into a region not covered with said gate electrode and said sidewall insulating film; and
(f) forming an upper film on said lower film after introduction of said impurity,
wherein after the step (d) and prior to the step (f), said lower film is etched to partially remove said lower film to form said antireflection coating on said photoelectric conversion portion.
2. The method of manufacturing a solid-state image sensing device according to claim 1 , further comprising after said step of (f), the step of (g) etching said upper film.
3. The method of manufacturing a solid-state image sensing device according to claim 2 , wherein said step of (g) includes the step of (g1) exposing said lower film by etching said upper film and thereafter etching exposed said lower film.
4. The method of manufacturing a solid-state image sensing device according to claim 2 ,
wherein said pixel region include a first pixel, a second pixel and a third pixel for sensing images of light having colors different from one another,
wherein after the step (d) and prior to the step (f), respective said lower films on said photoelectric conversion portions of both of said second pixel and said third pixel are etched while leaving said lower film on said photoelectric conversion portion of said first pixel after said sidewall insulating film is formed and before said upper film is formed, and
wherein the step of (g) includes the step of (g2) etching said upper film on said photoelectric conversion portion of said third pixel after said upper film is formed.
5. The method of manufacturing a solid-state image sensing device according to claim 4 , wherein said step of (g2) includes the step of:
(g3) exposing said lower film by etching said upper film of said third pixel and thereafter etching exposed said lower film.
6. The method of manufacturing a solid-state image sensing device according to claim 1 , wherein said stack film is formed from an insulating film constituted of three or more layers.
7. The method of manufacturing a solid-state image sensing device according to claim 1 , wherein said upper film is formed from a single-layered silicon nitride film.
8. The method of manufacturing a solid-state image sensing device according to claim 1 , wherein said upper film is formed from a film constituted of two or more layers.
9. The method of manufacturing a solid-state image sensing device according to claim 8 , wherein said upper film is formed by stacking a silicon oxide film and a silicon nitride film.
10. The method of manufacturing a solid-state image sensing device according to claim 1 , wherein said upper film is formed through selective growth.
11. The method of manufacturing a solid-state image sensing device according to claim 2 , wherein
said step of (f) includes the step of:
(f1) forming said upper film so as to cover said gate electrode and said sidewall insulating film, and
said method further comprises the steps of:
(h) after said step of (g), forming an interlayer insulating film made of a material different from that for said upper film so as to cover said drain region and said upper film;
(i) forming a contact hole exposing a part of said upper film in said interlayer insulating film by etching said interlayer insulating film under a first condition; and
(j) removing said upper film exposed through said contact hole by etching said upper film under a second condition different from said first condition.
12. A method of manufacturing a solid-state image sensing device including a photoelectric conversion portion, a transfer transistor, and an antireflection coating, constituting a pixel region respectively, comprising steps of:
(a) forming a gate electrode for said transfer transistor on said pixel region via a gate insulating film;
(b) forming said photoelectric conversion portion on said pixel region adjacent to said gate electrode in a plan view;
(c) forming a stack film constituted of a plurality of insulating films so as to cover said pixel region;
(d) selectively anisotropically etching said stack film such that said stack film remains on said photoelectric conversion portion to form a lower film and such that said stack film remains on a sidewall of said gate electrode to form a sidewall insulating film;
(e) forming a drain region of said transfer transistor by introducing an impurity into a region not covered with said gate electrode and said sidewall insulating film;
(f) forming an upper film on said lower film after introduction of said impurity; and
(g) etching at least any of said upper film and said lower film to form said antireflection coating on said photoelectric conversion portion, wherein
said step of (f) includes the step of:
(f1) forming said upper film so as to cover said gate electrode and said sidewall insulating film,
said method further comprises the steps of:
(h) after said step of (g), forming an interlayer insulating film made of a material different from that for said upper film so as to cover said drain region and said upper film;
(i) forming a contact hole exposing a part of said upper film in said interlayer insulating film by etching said interlayer insulating film under a first condition; and
(j) removing said upper film exposed through said contact hole by etching said upper film under a second condition different from said first condition.